公开(公告)号：US20210358791A1

公开(公告)日：2021-11-18

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H01L21/683 ,  H02N13/00 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US11574833B2

公开(公告)日：2023-02-07

申请号：US17172056

申请日：2021-02-09

Applicant: Samsung Display Co., Ltd.

Inventor： Juhee Lee ,  Cheollae Roh ,  Soo Beom Jo ,  Myungsoo Huh ,  Voronov Alexander ,  Jiwon Yeon ,  Haeyoung Yoo ,  Yongmun Chang

IPC: H02N13/00 ,  H01L21/683 ,  B23Q3/15

Abstract: An electrostatic chuck fixes a substrate and includes a first area and a second area adjacent to the first area. The electrostatic chuck includes a first electrode portion disposed in the first area and a second electrode portion disposed in the second area. The first electrode portion has a first width, and the second electrode portion has a second width smaller than the first width.

公开(公告)号：US12161041B2

公开(公告)日：2024-12-03

申请号：US17308671

申请日：2021-05-05

Applicant: Samsung Display Co., LTD.

Inventor： Dae Soo Kim ,  Sang Gab Kim ,  Yun Jong Yeo ,  Ju Hee Lee ,  Soo Beom Jo ,  Dae Won Choi

IPC: H10K71/00 ,  H01J37/32 ,  H10K59/12 ,  H10K71/20

Abstract: An etching device includes a chamber; a stage disposed in the chamber and on which a target substrate is loaded; a gas distribution unit disposed to face the stage in the chamber; a plurality of plasma generation modules disposed above the chamber; a gas supply unit that supplies gas into the chamber; a gas line connecting the gas supply unit and the plurality of plasma generation modules; and a plurality of gas inlet pipes each including an end connected to the plasma generation module and another end connected to the gas distribution unit.

公开(公告)号：US10991555B2

公开(公告)日：2021-04-27

申请号：US16172863

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Soo Beom Jo ,  Hae Young Yoo ,  Ju Hee Lee ,  Yong Mun Chang ,  Myung Soo Huh

IPC: H01J37/32 ,  H01L21/3065

Abstract: A plasma processing device including a chamber, a plurality of dielectric windows covering a top portion of the chamber, a lid frame supporting the dielectric windows on a same plane, a plurality of supporting bars supporting a top portion of the lid frame, and a plurality of antennas positioned above the dielectric windows, in which the antennas include a first antenna positioned inside an area defined by the supporting bars and having a loop form, and a second antenna positioned outside the area defined by the supporting bars and having a loop form, and a first current direction in the first antenna and a second current direction in the second antenna are the same as each other.