Abstract:
A photoresist composition a photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.
Abstract:
A thin film transistor (TFT) array panel and a manufacturing method thereof are disclosed. A contact hole may be formed to expose a pad disposed on a substrate of the TFT array panel. A first layer of a connecting member is formed with the same layer as a first field generating electrode and is disposed in the contact hole. A second passivation layer is disposed in the TFT array panel, but is removed at a region where the contact hole is formed and portions of the second passivation layer that cover the first layer of the connecting member. A second layer of the connecting member is formed on the first layer of the connecting member.
Abstract:
An exemplary embodiment of the present inventive concept provides a display device including: a substrate; a semiconductor layer; a first inorganic insulating film disposed on the semiconductor layer and including a first opening; a first conductive film disposed on the first inorganic insulating film; a second inorganic insulating film disposed on the first inorganic insulating film to fill a concave portion on the first conductive film; a second conductive film disposed on the second inorganic insulating film; a third inorganic insulating film disposed on the second conductive film and including a second opening; and a third conductive film disposed on the third inorganic insulating film, and connected to the second conductive film, wherein the first opening and the second opening may overlap each other.
Abstract:
A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.
Abstract:
A display device and a manufacturing method thereof are disclosed. The display device may include a pixel circuit layer including a plurality of transistors, a first partition wall and a second partition wall on the pixel circuit layer, and each protruding in a thickness direction, a first electrode and a second electrode formed on the same layer, and on the first partition wall and the second partition wall, respectively; a light emitting element between the first electrode and the second electrode; and a first organic pattern directly on the light emitting element.
Abstract:
A display device includes: a pixel circuit layer including a plurality of transistors; first partition wall and a second partition wall on the pixel circuit layer, each of the first and second partition walls having a shape protruding in a thickness direction; a first electrode and a second electrode on the same layer and respectively on the first partition wall and the second partition wall; a light emitting element between the first electrode and the second electrode; and a semiconductor pattern directly on the first electrode.
Abstract:
An electronic device includes an electronic panel including an active area and a pad area and including an input sensing member and a circuit board overlapping at least a side of the pad area. The electronic panel includes a first conductive layer, a second conductive layer, a first organic insulation layer disposed between the first conductive layer and the second conductive layer, a pattern layer disposed on the second conductive layer, overlapping the plurality of second conductive patterns, and including a plurality of organic patterns, and a second organic insulation layer covering the pattern layer and the second conductive layer. The pattern layer covers an upper surface of the second conductive layer.
Abstract:
A wall structure, method of manufacturing the same, and display panel including the wall structure are disclosed. In one aspect, the wall structure includes a plurality of first walls each extending in a first direction and a plurality of second walls each extending in a second direction crossing the first direction so as to form an intersection region between the first and second walls. The first and second walls are configured to define and surround a plurality of pixel regions of the display device. Each of the first and second walls has a width greater at the intersection region than the remaining non-intersection region.
Abstract:
A photo mask includes a transparent substrate, a transflective member, and a light shielding member. The transparent substrate has a transflective region including a first region, a second region located in opposing lateral portions of the first region, and an edge region located adjacent to the first and second regions, and a light shielding region surrounding the transflective region. The transflective member is disposed in the first, second and edge regions under the transparent substrate, and has a different light transmittance in each of the first, second and edge regions. The light shielding member is disposed in the light shielding region under the transparent substrate, and defines an opening which exposes the transflective region. The light shielding member includes a long side extending in a first direction parallel to an upper surface of the transparent substrate and a short side extending in a second direction.
Abstract:
A thin film transistor array panel includes a substrate, a gate line and a gate pad disposed on the substrate, a gate insulating layer disposed on the gate line and the gate pad, a data line and a data pad disposed on the gate insulating layer, an organic layer disposed on the data line and the data pad, and a connecting member disposed on one of the gate pad and the data pad, in which the organic layer includes a first portion overlapping the connecting member and a second portion not overlapping the connecting member, and a height of the first portion of the organic layer is greater than a height of the second portion of the organic layer.