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公开(公告)号:US20170154860A1
公开(公告)日:2017-06-01
申请号:US15316217
申请日:2015-06-16
申请人: SONY CORPORATION
发明人: KOSUKE HAREYAMA
CPC分类号: H01L23/66 , H01L21/486 , H01L23/12 , H01L23/15 , H01L23/49827 , H01L23/49833 , H01L23/49838 , H01L23/49894 , H01L25/18 , H01L2223/6611 , H01L2223/6616 , H01L2223/6627 , H01L2924/0002 , H01P3/081 , H01P11/003 , H01L2924/00
摘要: The present technology relates to a semiconductor device and a method of manufacturing the semiconductor device capable of realizing impedance control of the semiconductor device.An input/output wiring line 23 and a ground wiring line 22 are such that through glass vias are provided so as to form a strip line structure by blasting or electric discharge machining and thereafter metal films are formed on a surface and a rear surface. It is possible to configure the semiconductor device with the impedance control by adjusting a conductor diameter of the input/output wiring line 23 and an insulating layer thickness between the input/output wiring line 23 and the ground wiring line 22. The present technology may be applied to the semiconductor device.
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公开(公告)号:US20170317127A1
公开(公告)日:2017-11-02
申请号:US15522001
申请日:2015-10-22
申请人: SONY CORPORATION
发明人: KOSUKE HAREYAMA
IPC分类号: H01L27/146 , H04N5/378
摘要: The present technology relates to a solid-state imaging device capable of preventing defects in the appearance thereof, a camera module, and an electronic apparatus. The solid-state imaging device to be provided includes: a semiconductor substrate having pixels formed therein, the pixels each including a photoelectric conversion element; and on-chip lenses formed above the semiconductor substrate, the on-chip lenses corresponding to the pixels. The area in which the on-chip lenses are formed is extended to a peripheral area outside an imaging area formed with the pixels. The present technology can be applied to solid-state imaging devices, such as CMOS image sensors.
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