公开(公告)号：US11158079B2

公开(公告)日：2021-10-26

申请号：US16685345

申请日：2019-11-15

申请人： Semes Co., Ltd

发明人： Ohyeol Kwon ,  Soo Young Park ,  Jihyun Lee ,  Young Ho Choo

IPC分类号： G06K9/00 ,  G06T7/64 ,  G06T7/13 ,  G06T7/00 ,  H01L21/687 ,  G06T7/11

摘要： Disclosed are a substrate treating apparatus, an eccentricity inspection apparatus, an eccentricity inspection method, and a recording medium for measuring the amount of eccentricity of a spin chuck. The substrate treating apparatus includes a process chamber, a support unit that supports a substrate and rotates the substrate about a support shaft of a spin chuck, and an eccentricity inspection device that inspects eccentricity of the support shaft. The eccentricity inspection device includes an image acquisition unit that obtains an image of the substrate supported on the support unit and an eccentricity measurement unit that obtains edge data of the substrate from the image of the substrate and measures an amount of eccentricity of the support shaft, based on the edge data.

公开(公告)号：US11869763B2

公开(公告)日：2024-01-09

申请号：US16861387

申请日：2020-04-29

申请人： SEMES CO., LTD.

发明人： Jun Keon Ahn ,  Soo Young Park ,  Ohyeol Kwon ,  Jung Hwan Lee ,  Seungtae Yang

IPC分类号： H01L21/02 ,  B23K26/40 ,  H01L21/67 ,  H01L21/687 ,  B08B7/00 ,  B23K26/08 ,  B23K26/0622 ,  B23K26/073 ,  B23K26/06 ,  B23K26/082 ,  B23K101/40

CPC分类号： H01L21/02098 ,  B08B7/0042 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/073 ,  B23K26/082 ,  B23K26/0823 ,  H01L21/02087 ,  H01L21/67115 ,  H01L21/68764 ,  B23K2101/40

摘要： An apparatus and system for treating a substrate includes a chamber having an inner space, a support unit in the inner space and configured to support and rotate the substrate, and first and second laser irradiation unit configured to irradiate first and second laser beams onto the substrate. The first laser irradiation unit includes a first laser light source configured to generate the first laser beam, and a first wavelength adjusting member configured to adjust a range of a wavelength of the first laser beam received from the first laser light source. The second laser beam, and a second wavelength adjusting member configured to adjust a range of a wavelength of the second laser beam received from the second laser light source.

公开(公告)号：US11679447B2

公开(公告)日：2023-06-20

申请号：US16861709

申请日：2020-04-29

申请人： SEMES CO., LTD.

发明人： Soo Young Park ,  Ohyeol Kwon ,  Jun Keon Ahn ,  Jung Hwan Lee

IPC分类号： B23K26/042 ,  B23K26/03 ,  B23K26/08 ,  H01L21/02 ,  H01L21/68 ,  H01L21/66

CPC分类号： B23K26/042 ,  B23K26/032 ,  B23K26/0823 ,  H01L21/02021 ,  H01L21/681 ,  H01L22/12

摘要： Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a chamber providing a space in which a substrate is treated, a support unit supporting the substrate inside the chamber, a laser unit irradiating laser to an edge region of the substrate, a vision unit capturing the edge region of the substrate to measure an offset value of the substrate, and an adjustment unit adjusting an irradiation location of the laser based on the offset value of the substrate.

公开(公告)号：US12112960B2

公开(公告)日：2024-10-08

申请号：US17474469

申请日：2021-09-14

申请人： SEMES CO., LTD.

发明人： Ohyeol Kwon ,  Soo Yeon Shin ,  Hyun Hoo Kim ,  Myung Chan Cho

IPC分类号： G06T7/00 ,  G06N3/045 ,  H01L21/67

CPC分类号： H01L21/67253 ,  G06N3/045 ,  G06T7/0004 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148

摘要： The inventive concept provides a method to determine whether a substrate treatment process is normal using a deep learning model. The method comprising receiving input on a substrate treatment process video, preprocessing the inputted video, using the deep learning model to study a preprocessed video, and determining whether the substrate treatment process is normal by comparing the trained model and a real time substrate treatment process video.

公开(公告)号：US11387127B2

公开(公告)日：2022-07-12

申请号：US16930660

申请日：2020-07-16

申请人： SEMES CO., LTD.

发明人： Ohyeol Kwon ,  Jung Hwan Lee ,  Soo Young Park

IPC分类号： H01L21/677 ,  H01L21/687

摘要： A substrate treating apparatus includes a plurality of load ports on which carriers having substrates received therein are placed, a plurality of process chambers that perform processes on the substrates, and a transfer robot that transfers the substrates between the load ports and the process chambers. The transfer robot is movable along a transfer passage having a lengthwise direction formed along a first direction, the load ports and the process chambers are arranged along the first direction on one side and an opposite side of the transfer passage, and the transfer robot transfers the substrates between the carriers placed on the load ports and the process chambers.

公开(公告)号：US11367634B2

公开(公告)日：2022-06-21

申请号：US16557790

申请日：2019-08-30

申请人： SEMES CO., LTD.

发明人： Ohyeol Kwon ,  Jihyun Lee ,  Young Ho Choo

IPC分类号： H01L21/67 ,  H01L21/687 ,  H01L21/68

摘要： The inventive concept relates to a substrate treating apparatus and method for removing various types of treating liquid or cleaning solution films on an edge region of a substrate without damage to a treated surface even though the substrate is rotated in an eccentric state.

公开(公告)号：US11972939B2

公开(公告)日：2024-04-30

申请号：US16901913

申请日：2020-06-15

申请人： SEMES CO., LTD.

发明人： Ohyeol Kwon ,  Jun Keon Ahn ,  Soo Young Park ,  Jung Hwan Lee

IPC分类号： H01L21/02 ,  B23K26/0622 ,  B23K26/36 ,  B23K26/362 ,  H01L21/66 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/02098 ,  B23K26/0624 ,  B23K26/36 ,  B23K26/362 ,  H01L21/02021 ,  H01L21/02087 ,  H01L21/67069 ,  H01L21/67242 ,  H01L21/67253 ,  H01L21/68764 ,  H01L22/12 ,  H01L22/20

摘要： The inventive concept provides a method for treating a substrate. The method includes removing a film on the substrate by applying a pulsed laser to the rotating substrate, in which thickness of the film to be removed is measured and pulse energy of the pulsed laser is selected based on the measured thickness of the film.

公开(公告)号：US11745291B2

公开(公告)日：2023-09-05

申请号：US16862086

申请日：2020-04-29

申请人： SEMES CO., LTD.

发明人： Ohyeol Kwon ,  Jun Keon Ahn ,  Byungsun Bang

IPC分类号： B23K26/362 ,  G02B27/14 ,  G02B27/09 ,  G02B26/10 ,  B23K26/06 ,  B23K26/082 ,  B23K26/402 ,  B23K26/0622 ,  B23K103/00

CPC分类号： B23K26/362 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0626 ,  B23K26/082 ,  B23K26/402 ,  G02B26/10 ,  G02B27/09 ,  G02B27/14 ,  B23K2103/42 ,  B23K2103/54

摘要： An apparatus includes a support unit supporting a substrate including a film, a laser generation unit that generates a laser beam to process the film, a beam splitter that splits the laser beam into a first laser beam travelling along a first path toward an upper edge of the substrate and a second laser beam travelling along a second path toward a lower edge of the substrate, a first beam shaping unit on the first path shaping the first laser beam, a second beam shaping unit on the second path shaping the second laser beam, a first beam scanning unit downstream of the first beam shaping unit that applies the first laser beam to the upper edge in the manner of scanning, and a second beam scanning unit downstream of the second beam shaping unit that applies the second laser beam to the lower edge in the manner of scanning.

公开(公告)号：US10757331B2

公开(公告)日：2020-08-25

申请号：US16437016

申请日：2019-06-11

申请人： SEMES CO., LTD.

发明人： Sungyong Chun ,  Ohyeol Kwon ,  Sung Wook Bae

IPC分类号： H04N5/232 ,  H04N5/225 ,  H01L21/67

摘要： A method for estimating a posture of a camera installed in a substrate processing apparatus to obliquely photograph an object includes removing the remaining background other than a substrate and performing ellipse fitting, adjusting a yaw direction of the camera by using a difference between the center of a camera image and the center of an elliptical substrate image obtained by performing the ellipse fitting, adjusting a roll direction of the camera by using a tilt angle of an ellipse in the elliptical substrate image obtained by performing the ellipse fitting, and adjusting a pitch direction of the camera by using a ratio of a minor axis to a major axis of the ellipse in the elliptical substrate image obtained by performing the ellipse fitting.