公开(公告)号：US10790169B2

公开(公告)日：2020-09-29

申请号：US15866576

申请日：2018-01-10

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Naoyuki Osada ,  Koji Hashimoto

IPC: H01L21/67 ,  B08B1/04 ,  H01L21/306 ,  H01L21/304 ,  H01L21/027

Abstract: A discharge port 31 is arranged inside a chamber 9. A circulation flow passage 50 circulates a processing liquid, while maintaining the processing liquid at a predetermined temperature. A discharge flow passage 32 is branched from a circulation flow passage 50 to guide the processing liquid to the discharge port 31. A return flow passage 33 is connected to the discharge flow passage 32 inside the chamber 9 and allows the processing liquid running through the discharge flowpassage 32 to flow back to the circulation flow passage 50.

公开(公告)号：US10115588B2

公开(公告)日：2018-10-30

申请号：US15515768

申请日：2015-07-06

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Koji Hashimoto ,  Akito Hatano

IPC: H01L21/677 ,  H01L21/02 ,  C03C15/00 ,  C23C16/458 ,  H01L21/67 ,  H01L27/12 ,  H01L29/66 ,  B65G49/06

Abstract: A substrate treating apparatus including an unloading order changing unit. The unloading order changing unit reverses an order, in regard to unloading of substrates in a carrier from the top, between a poor inclined substrate and a substrate at least immediately above the poor inclined substrate when the poor inclined substrate is present whose inclination is determined larger than a pre-set threshold by a poor inclination determining unit. That is, the order is reversed such that the poor inclined substrate whose surface may be possibly be scratched with a hand is unloaded prior to the substrate immediately above the poor inclined substrate. Accordingly, this inhibits damages on the substrate caused by scratching a substrate surface with the hand of a substrate transport mechanism.

公开(公告)号：US12045037B2

公开(公告)日：2024-07-23

申请号：US18463210

申请日：2023-09-07

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Koji Hashimoto ,  Shinji Shimizu ,  Hiroshi Horiguchi ,  Masahiro Yamamoto

IPC: G05B19/418 ,  H01L21/02 ,  H01L21/306

CPC classification number: G05B19/418 ,  G05B2219/45031 ,  G05B2219/45212 ,  H01L21/02057 ,  H01L21/30604

Abstract: It is an object of the present invention to reduce the amount of data used in an apparatus, a system, and a method for performing a substrate processing. In order to achieve this object, a substrate processing apparatus includes one or more processing units each for performing a processing on a substrate and one or more arithmetic processing parts. One or more arithmetic processing parts generate a flow recipe defining a flow of a series of processings for a substrate by combining two or more processing recipes among a plurality of processing recipes each defining a processing condition relating to a processing to be performed on a substrate in the one or more processing units. The plurality of processing recipes include a plurality of liquid processing recipes each defining a condition of a processing to be performed on a substrate by using a processing liquid.

公开(公告)号：US11961744B2

公开(公告)日：2024-04-16

申请号：US16978221

申请日：2019-02-01

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Eiji Fukatsu ,  Koji Hashimoto ,  Hiroyuki Fujiki ,  Masafumi Inoue

IPC: H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67051 ,  H01L21/67248 ,  H01L21/67766

Abstract: In a chamber, first processing is performed as preliminary processing. After the first processing has been finished, the temperature in a predetermined target region in the chamber is measured with a thermographic camera. Then, whether or not to start second processing on a substrate is determined in accordance with the acquired measured temperature information. If it is determined as a result that the second processing can be started, the second processing is performed. In this case, the second processing on the substrate can be started, with the temperature of the target region in the chamber having reached its stability. Accordingly, the second processing can be performed uniformly on a plurality of substrates. That is, it is possible to reduce variations in processing caused by temperature environments in the chamber.

公开(公告)号：US11410865B2

公开(公告)日：2022-08-09

申请号：US15931559

申请日：2020-05-13

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hiroyuki Kawahara ,  Koji Hashimoto ,  Noriyuki Kikumoto ,  Noritake Sumi

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  B08B7/00 ,  H01L21/02 ,  B08B3/08

Abstract: A substrate processing apparatus includes a base portion 1541 that is disposed in a manner of being adjacent to a chamber; a hand 155 that holds a substrate S; an arm 1542 that is attached to the base portion 1541, supports the hand, and moves the hand forward and rearward by horizontally moving the hand with respect to the base portion; and a cover portion 156 that accommodates the hand in an internal space. The cover portion has a cover main body 1561 forming the internal space and an extending member 1562 having a hollow structure which penetrates the cover portion in a horizontal direction and of which one end serves as an opening 1562a and being engaged with the cover main body in a state of being movable in the horizontal direction while the opening communicates with the internal space.

公开(公告)号：US11081376B2

公开(公告)日：2021-08-03

申请号：US16684865

申请日：2019-11-15

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Yuichi Takayama ,  Koji Hashimoto ,  Noriyuki Kikumoto

IPC: H01L21/67 ,  B65G47/90 ,  H01L21/687

Abstract: A first processing module includes a first specified processing unit and a first delivery part. A substrate supply part is on a first direction side of the first processing module. A transfer module is on a second direction side on the opposite of the first processing module from the first direction. The transfer module includes a frame, a first floor, a second floor, and a gateway. The frame defines a placement space in which a first transfer apparatus of the transfer module is placed. A first transfer apparatus is installed on the first floor. The second floor is on a third direction side, which is a horizontal direction orthogonal to the first direction, with respect to the first floor inside the placement space. The gateway is provided on the third direction side with respect to the second floor and communicates the placement space to the outside of the frame.

公开(公告)号：US10910247B2

公开(公告)日：2021-02-02

申请号：US15508688

申请日：2015-07-28

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Kazuhiro Honsho ,  Mitsukazu Takahashi ,  Akito Hatano ,  Koji Hashimoto

IPC: H01L21/673 ,  H01L21/677 ,  B65D43/02 ,  B65D85/30

Abstract: A substrate container including a casing, a rack, a casing holder, a casing lifting mechanism, a lid, and a lid holder. When holding of substrates with the rack shifts to holding of the substrates with the casing holder and the lid holder, the casing lifting mechanism moves the casing holder upward, whereby the casing holder moves the substrates upward. When the holding of the substrates with the casing holder and the lid holder shifts to the holding of the substrates with the rack, the casing lifting mechanism moves the casing holder downward, whereby the casing holder moves the substrates downward.

公开(公告)号：US10395952B2

公开(公告)日：2019-08-27

申请号：US15901955

申请日：2018-02-22

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Koji Hashimoto ,  Naoyuki Osada

IPC: H01L21/67 ,  H01L21/306

Abstract: A substrate processing apparatus includes a processing liquid distributing member that partitions, by an inner wall surface, at least part of a processing liquid distribution passage communicating with a discharge port, a processing liquid supplying unit that supplies the high-temperature processing liquid having a higher temperature than a room temperature to the processing liquid distribution passage, a temperature changing unit arranged to heat or cool an outer wall surface of the processing liquid distributing member from the outside to change a temperature of the processing liquid distributing member, and a controller that executes an equilibrium temperature maintaining step of maintaining the inner wall surface of the processing liquid distributing member at a thermal equilibrium temperature by controlling the temperature changing unit in a state where no processing liquid is supplied from the processing liquid supplying unit to the processing liquid distribution passage.

公开(公告)号：US10964558B2

公开(公告)日：2021-03-30

申请号：US16072017

申请日：2017-02-23

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Koji Hashimoto

IPC: H01L21/67 ,  H01L21/02 ,  B08B3/02

Abstract: A low surface tension liquid supply unit supplies a low surface tension liquid onto the upper surface of a substrate to form a liquid film of the low surface tension liquid on the substrate. An opening is formed in a central region of the liquid film of an organic solvent. The liquid film is removed from the upper surface of the substrate by expanding the opening. While a low surface tension liquid is supplied from the low surface tension liquid supply unit, to the liquid film, toward a liquid landing point set outside the opening, the liquid landing point is moved so as to follow the expansion of the opening. While an facing surface of a drying head faces a dry region set inside the opening to form a low-humidity space between the facing surface and the dry region, with the low-humidity space having a humidity lower than that outside the space, the dry region and the facing surface are moved so as to follow the expansion of the opening.

公开(公告)号：US09810532B2

公开(公告)日：2017-11-07

申请号：US14855846

申请日：2015-09-16

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Koji Hashimoto ,  Akito Hatano ,  Toyohide Hayashi ,  Keiichi Tsuchiya

IPC: G06F7/00 ,  G01B11/26 ,  G01B11/06 ,  G01V8/20 ,  B25J11/00 ,  H01L21/67 ,  H01L21/677

CPC classification number: G01B11/26 ,  B25J11/0095 ,  G01B11/0608 ,  G01V8/20 ,  H01L21/67259 ,  H01L21/67778

Abstract: In a state of mapping sensors having been advanced into a carrier by a sensor advance/withdraw mover, a sensor lifting and lowering device moves the mapping sensors up and down. With this movement, the mapping sensors detect presence or absence of substrates in a horizontal direction crossing a fore-and-aft direction in which the substrates are moved into and out of the carrier, and a height sensor detects heights of the mapping sensors. Consequently, substrate heights are detected in two different locations in the fore-and-aft direction. Based on the substrate heights, a substrate condition acquiring unit acquires a tilt of each substrate relative to the horizontal in the fore-and-aft direction. The tilt of each substrate inside the carrier is acquired in advance, thereby to be able to prevent substrate damage due to contact between a hand of a substrate transport mechanism and the substrates.