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1.发明申请公开(公告)号：US20210325852A1
公开(公告)日：2021-10-21
申请号：US17269560
申请日：2019-09-06
IPC分类号： G05B19/418
摘要： It is an object of the present invention to reduce the amount of data used in an apparatus, a system, and a method for performing a substrate processing. In order to achieve this object, a substrate processing apparatus includes one or more processing units each for performing a processing on a substrate and one or more arithmetic processing parts. One or more arithmetic processing parts generate a flow recipe defining a flow of a series of processings for a substrate by combining two or more processing recipes among a plurality of processing recipes each defining a processing condition relating to a processing to be performed on a substrate in the one or more processing units. The plurality of processing recipes include a plurality of liquid processing recipes each defining a condition of a processing to be performed on a substrate by using a processing liquid.
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公开(公告)号：US20180277398A1
公开(公告)日：2018-09-27
申请号：US15866576
申请日：2018-01-10
发明人： Naoyuki OSADA , Koji HASHIMOTO
IPC分类号： H01L21/67 , H01L21/306 , B08B1/04 , H01L21/027 , H01L21/304
摘要： A discharge port 31 is arranged inside a chamber 9. A circulation flow passage 50 circulates a processing liquid, while maintaining the processing liquid at a predetermined temperature. A discharge flow passage 32 is branched from a circulation flow passage 50 to guide the processing liquid to the discharge port 31. A return flow passage 33 is connected to the discharge flow passage 32 inside the chamber 9 and allows the processing liquid running through the discharge flowpassage 32 to flow back to the circulation flow passage 50.
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公开(公告)号：US20170232485A1
公开(公告)日：2017-08-17
申请号：US15427445
申请日：2017-02-08
发明人： Koji HASHIMOTO
IPC分类号： B08B13/00 , H01L21/687 , H01L21/67 , B08B3/08 , B08B3/04
摘要： A substrate processing apparatus includes a chamber, a substrate holding unit, an elevated/lowered member, and an elevation/lowering driving unit. The chamber includes a base plate having an upper surface that defines a housing space. The substrate holding unit is housed in the housing space, is placed on the upper surface of the base plate, and holds a substrate. The elevated/lowered member is elevated and lowered inside the housing space. The elevation/lowering driving unit drives the elevation and lowering of the elevated/lowered member. The elevation/lowering driving unit includes a driving source, disposed higher than a lower surface of the base plate, and an elevating/lowering head, which is connected to a guard and is moved vertically by the driving source within a movable range in which an entirety of the head is positioned higher than the lower surface of the base plate.
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公开(公告)号：US20220165599A1
公开(公告)日：2022-05-26
申请号：US17440220
申请日：2020-02-26
IPC分类号： H01L21/677 , B08B3/08 , F26B5/00
摘要： In a substrate processing apparatus in which a substrate is transported into multiple chambers by using multiple transport mechanisms, while a first transport unit is responsible for the transport of the substrate into the first chamber and the transport of the substrate out from the second chamber, the second transport unit is responsible for the transfer of the substrate from the first chamber to the second chamber. With respect to a transfer zone which is a transport route of the substrate from the first chamber to the second chamber, the first transport unit is arranged above and the second transport unit is arranged below. Since entry into the transfer zone is exclusively allowed, the two transport units can operate individually while avoiding mutual interference.
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公开(公告)号：US20180151394A1
公开(公告)日：2018-05-31
申请号：US15576585
申请日：2016-04-26
IPC分类号： H01L21/67 , H01L21/687 , B08B3/02 , B08B5/02
CPC分类号： H01L21/67051 , B08B3/022 , B08B3/024 , B08B5/023 , H01L21/68764
摘要： A substrate processing apparatus includes a substrate rotating mechanism for rotating a substrate, a nozzle part for discharging droplets of a processing liquid toward a main surface of the substrate, and a nozzle moving mechanism for moving the nozzle part in a direction along the main surface. The nozzle part includes two guide surfaces (511), two gas ejection ports (512), and two processing liquid supply ports (513). The gas ejection port ejects gas along the guide surface, to thereby form a gas flow flowing along the guide surface. The processing liquid supply port is provided in the guide surface, for supplying the processing liquid to between the gas flow and the guide surface. In the nozzle part, assuming that one of the two gas ejection ports is regarded as a first gas ejection port for forming a gas flow which carries the processing liquid as a thin film flow to a lower end edge (516) of the guide surface, the other is a second gas ejection port for forming a gas flow which collides with the processing liquid spattering from the lower end edge. With this configuration, it is possible to discharge a lot of droplets having a uniform particle diameter and thereby appropriately process a substrate.
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6.发明申请SUBSTRATE CONTAINER, A LOAD PORT APPARATUS, AND A SUBSTRATE TREATING APPARATUS 有权基座容器，装载端口装置和底板处理装置公开(公告)号：US20160071753A1
公开(公告)日：2016-03-10
申请号：US14843144
申请日：2015-09-02
IPC分类号： H01L21/673 , B65G49/06
CPC分类号： H01L21/67383 , H01L21/67346 , H01L21/67369 , H01L21/67772
摘要： A substrate container includes a housing, rack members, housing-side support members for supporting ends of substrates, a moving mechanism for moving the substrates, a lid, and lid-side support members for supporting ends of the substrates. The housing-side support members have deepest portions for supporting the ends of the substrates to be immovable upward. In a state where the lid is attached to the housing, the housing-side support members and lid-side support members clamp the ends of the substrates in between, with lower surfaces of the substrates out of contact with the rack members, and the housing-side support members support the ends of the substrates in the deepest portions. When the lid detaches from the housing, the moving mechanism moves the substrates supported in the deepest portions to disengage the ends of the substrates from the deepest portions, and places the substrates in a substantially horizontal position on the rack members.
摘要翻译： 基板容器包括壳体，齿条构件，用于支撑基板端部的壳体侧支撑构件，用于移动基板的移动机构，用于支撑基板的端部的盖和盖侧支撑构件。 壳体侧支撑构件具有用于支撑基板的端部以使其不可向上移动的最深部分。 在盖附接到壳体的状态下，壳体侧支撑构件和盖侧支撑构件将基板的端部夹在其间，与基座的下表面不与齿条构件接触，并且壳体 侧支撑构件支撑最深部分中的基底的端部。 当盖从壳体脱离时，移动机构移动支撑在最深部分中的基板，使基板的端部从最深部分脱离，并将基板放置在搁架构件上的基本水平的位置。
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公开(公告)号：US20150068450A1
公开(公告)日：2015-03-12
申请号：US14539475
申请日：2014-11-12
发明人： Koji HASHIMOTO
IPC分类号： B05B13/02
CPC分类号： B05B13/0228 , B05C5/0208 , B05C11/023 , B05C11/044 , H01L21/67017 , H01L21/67051 , H01L21/6708 , H01L21/6715 , H01L21/68792
摘要： A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a substrate rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; a treatment liquid supplying unit which supplies a treatment liquid to an upper surface of the substrate held by the substrate holding unit; an opposing member to be located in opposed spaced relation to the upper surface of the substrate held by the substrate holding unit in contact with a film of the treatment liquid formed on the upper surface of the substrate so as to receive a lift force from the liquid film; a support member which supports the opposing member; and an opposing member holding mechanism which causes the support member to hold the opposing member in a vertically relatively movable manner.
摘要翻译： 基板处理装置包括：水平保持基板的基板保持单元; 基板旋转单元，其使由所述基板保持单元保持的所述基板绕垂直轴旋转; 处理液供给部，其将处理液供给到由所述基板保持单元保持的所述基板的上表面; 相对构件被定位成与由基板保持单元保持的基板的上表面相对的间隔开，与形成在基板的上表面上的处理液的膜接触，以便从液体接收提升力 电影; 支撑构件，其支撑相对构件; 以及相对构件保持机构，其使得支撑构件以相对于竖直方向相对移动的方式保持相对构件。
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公开(公告)号：US20210013059A1
公开(公告)日：2021-01-14
申请号：US16978221
申请日：2019-02-01
发明人： Eiji FUKATSU , Koji HASHIMOTO , Hiroyuki FUJIKI , Masafumi INOUE
IPC分类号： H01L21/67
摘要： In a chamber, first processing is performed as preliminary processing. After the first processing has been finished, the temperature in a predetermined target region in the chamber is measured with a thermographic camera. Then, whether or not to start second processing on a substrate is determined in accordance with the acquired measured temperature information. If it is determined as a result that the second processing can be started, the second processing is performed. In this case, the second processing on the substrate can be started, with the temperature of the target region in the chamber having reached its stability. Accordingly, the second processing can be performed uniformly on a plurality of substrates. That is, it is possible to reduce variations in processing caused by temperature environments in the chamber.
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公开(公告)号：US20200211870A1
公开(公告)日：2020-07-02
申请号：US16684865
申请日：2019-11-15
IPC分类号： H01L21/67 , H01L21/687 , B65G47/90
摘要： A first processing module includes a first specified processing unit and a first delivery part. A substrate supply part is on a first direction side of the first processing module. A transfer module is on a second direction side on the opposite of the first processing module from the first direction. The transfer module includes a frame, a first floor, a second floor, and a gateway. The frame defines a placement space in which a first transfer apparatus of the transfer module is placed. A first transfer apparatus is installed on the first floor. The second floor is on a third direction side, which is a horizontal direction orthogonal to the first direction, with respect to the first floor inside the placement space. The gateway is provided on the third direction side with respect to the second floor and communicates the placement space to the outside of the frame.
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公开(公告)号：US20170263479A1
公开(公告)日：2017-09-14
申请号：US15508688
申请日：2015-07-28
IPC分类号： H01L21/673 , B65D43/02 , B65D85/30
CPC分类号： H01L21/67309 , B65D43/0202 , B65D85/30 , H01L21/67369 , H01L21/67373 , H01L21/67383 , H01L21/67393 , H01L21/67772
摘要： A substrate container including a casing, a rack, a casing holder, a casing lifting mechanism, a lid, and a lid holder. When holding of substrates with the rack shifts to holding of the substrates with the casing holder and the lid holder, the casing lifting mechanism moves the casing holder upward, whereby the casing holder moves the substrates upward. When the holding of the substrates with the casing holder and the lid holder shifts to the holding of the substrates with the rack, the casing lifting mechanism moves the casing holder downward, whereby the casing holder moves the substrates downward.
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