- 专利标题: SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD
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申请号: US17269560申请日: 2019-09-06
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公开(公告)号: US20210325852A1公开(公告)日: 2021-10-21
- 发明人: Koji HASHIMOTO , Shinji SHIMIZU , Hiroshi HORIGUCHI , Masahiro YAMAMOTO
- 申请人: SCREEN Holdings Co., Ltd.
- 申请人地址: KR Kyoto
- 专利权人: SCREEN Holdings Co., Ltd.
- 当前专利权人: SCREEN Holdings Co., Ltd.
- 当前专利权人地址: KR Kyoto
- 优先权: JP2018-176482 20180920
- 国际申请: PCT/JP2019/035229 WO 20190906
- 主分类号: G05B19/418
- IPC分类号: G05B19/418
摘要:
It is an object of the present invention to reduce the amount of data used in an apparatus, a system, and a method for performing a substrate processing. In order to achieve this object, a substrate processing apparatus includes one or more processing units each for performing a processing on a substrate and one or more arithmetic processing parts. One or more arithmetic processing parts generate a flow recipe defining a flow of a series of processings for a substrate by combining two or more processing recipes among a plurality of processing recipes each defining a processing condition relating to a processing to be performed on a substrate in the one or more processing units. The plurality of processing recipes include a plurality of liquid processing recipes each defining a condition of a processing to be performed on a substrate by using a processing liquid.
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