公开(公告)号：US20140197068A1

公开(公告)日：2014-07-17

申请号：US14138281

申请日：2013-12-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun-Ho CHO ,  Hyeog-Ki KIM ,  Kwang-Shin LIM

IPC: H01L21/673

CPC classification number: H01L21/67383 ,  H01L21/67369

Abstract: A wafer holding apparatus including a container body having a space to receive a wafer and a front opening, a door disposed at the front opening, and a first supporting part disposed on an inner wall of the door may be provided. For example, the first supporting part may include a frame coupled to the inner wall of the door, a plurality of elastic ribs protruding from the frame, a support structure coupled to the plurality of elastic ribs and defining a plurality of grooves, which is spaced apart from the door by the elastic ribs and configured to receive a peripheral portion of the wafer.

Abstract translation: 可以提供一种晶片保持装置，其包括具有容纳晶片的空间的容器主体和前开口，设置在前开口的门和设置在门的内壁上的第一支撑部。 例如，第一支撑部分可以包括联接到门的内壁的框架，从框架突出的多个弹性肋，连接到多个弹性肋并且限定多个凹槽的支撑结构，其间隔开 除了通过弹性肋的门之外，并且构造成接收晶片的周边部分。

公开(公告)号：US20180045697A1

公开(公告)日：2018-02-15

申请号：US15458395

申请日：2017-03-14

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyung-Ju SUK ,  Eun-Hee PARK ,  Sang-Hwan KIM ,  Hye-Kyoung MOON ,  Jung-Dae PARK ,  Min-Soo SUH ,  Kwang-Shin LIM

IPC: G01N33/00 ,  G01N25/00 ,  G01N1/44

Abstract: A thermal desorption system including a chamber including a space in which a substrate is heated; a flow compartment within the chamber, the flow compartment providing a separate gas flow space within the chamber; a substrate support that supports the substrate within the flow compartment; a heater that heats the substrate within the flow compartment; and a gas pipe that introduces a carrier gas into the flow compartment and discharges the carrier gas from the flow compartment.

公开(公告)号：US20170089871A1

公开(公告)日：2017-03-30

申请号：US15242748

申请日：2016-08-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Min-Soo SUH ,  Hyun-Young PARK ,  Jung-Dae PARK ,  Ki-Hyun KIM ,  Kwang-Shin LIM

IPC: G01N30/88 ,  G01N5/04 ,  G01N30/74 ,  C08F297/02

CPC classification number: G01N30/88 ,  C08F297/026 ,  C08L53/00 ,  G01N5/04 ,  G01N30/74 ,  G01N33/442 ,  G01N2030/885 ,  G03F7/0002 ,  C08L25/06

Abstract: An evaluation system of block copolymer patterns includes a supplier, a plurality of analyzers, and a homopolymer interference remover. The supplier provides a sample including a block copolymer and a homopolymer. The analyzers measure a molecular weight of the block copolymer in the sample, measure a preliminary block ratio, the preliminary block ratio corresponding to a total ratio in the sample of each block in the block copolymer, and selectively measure a ratio of the homopolymer in the sample. The homopolymer interference remover subtracts the ratio of the homopolymer from the preliminary block ratio.