Invention Application
- Patent Title: THERMAL DESORPTION SYSTEM AND METHOD OF ANALYZING A SUBSTRATE USING THE SAME
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Application No.: US15458395Application Date: 2017-03-14
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Publication No.: US20180045697A1Publication Date: 2018-02-15
- Inventor: Kyung-Ju SUK , Eun-Hee PARK , Sang-Hwan KIM , Hye-Kyoung MOON , Jung-Dae PARK , Min-Soo SUH , Kwang-Shin LIM
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Priority: KR10-2016-0101659 20160810
- Main IPC: G01N33/00
- IPC: G01N33/00 ; G01N25/00 ; G01N1/44

Abstract:
A thermal desorption system including a chamber including a space in which a substrate is heated; a flow compartment within the chamber, the flow compartment providing a separate gas flow space within the chamber; a substrate support that supports the substrate within the flow compartment; a heater that heats the substrate within the flow compartment; and a gas pipe that introduces a carrier gas into the flow compartment and discharges the carrier gas from the flow compartment.
Information query