Abstract:
The present invention is a method and system for simulating the aging process of a circuit. A two-step process is employed whereby, in a first simulation step, a simulation is conducted to obtain node voltages for the original circuit and the node voltages are stored in a file. In the second step, a subsequent simulation is run after transistors of the circuit are replaced by aging subcircuits, which contain aging models, and initial node voltages are updated. A script is used to set the bias voltage inputs for the aging models using the node voltages stored in the file from the first step. With more accurate bias voltage inputs for the aging models, the aging simulations are conducted to compute the circuit degradation.
Abstract:
An integrated circuit system is provided that includes a circuit function in and on a surface of a semiconductor substrate. First and second portions of an inductor overlie the surface of the semiconductor substrate and each is coupled to the first circuit function. A third portion of the inductor is positioned on a second substrate. A first through substrate via (TSV) extends through the semiconductor substrate and electrically couples the first portion to the third portion and a second TSV extends through the semiconductor substrate and electrically couples the second portion to the third portion.
Abstract:
Multiple gate transistors are provided with a dual stress layer for increased channel mobility and enhanced effective and saturated drive currents. Embodiments include transistors comprising a first stress layer under the bottom gate and a second stress layer overlying the top gate. Embodiments further include transistors with the bottom gate within or through the first stress layer. Methodology includes sequentially depositing stressed silicon nitride, nitride, oxide, amorphous silicon, and oxide layers on a substrate having a bottom oxide layer thereon, patterning to define a channel length, depositing a top nitride layer, patterning stopping on the stressed silicon nitride layer, removing the amorphous silicon layer, epitaxially growing silicon through a window in the substrate to form source, drain, and channel regions, doping, removing the deposited nitride and oxide layers, growing gate oxides, depositing polysilicon to form gates, growing isolation oxides, and depositing the top stress layer.
Abstract:
An integrated circuit system is provided that includes a circuit function in and on a surface of a semiconductor substrate. First and second portions of an inductor overlie the surface of the semiconductor substrate and each is coupled to the first circuit function. A third portion of the inductor is positioned on a second substrate. A first through substrate via (TSV) extends through the semiconductor substrate and electrically couples the first portion to the third portion and a second TSV extends through the semiconductor substrate and electrically couples the second portion to the third portion.
Abstract:
A data processing device assigns tasks to processor cores in a more distributed fashion. In one embodiment, the data processing device can schedule tasks for execution amongst the processor cores in a pseudo-random fashion. In another embodiment, the processor core can schedule tasks for execution amongst the processor cores based on the relative amount of historical utilization of each processor core. In either case, the effects of bias temperature instability (BTI) resulting from task execution are distributed among the processor cores in a more equal fashion than if tasks are scheduled according to a fixed order. Accordingly, the useful lifetime of the processor unit can be extended.
Abstract:
A data processing device assigns tasks to processor cores in a more distributed fashion. In one embodiment, the data processing device can schedule tasks for execution amongst the processor cores in a pseudo-random fashion. In another embodiment, the processor core can schedule tasks for execution amongst the processor cores based on the relative amount of historical utilization of each processor core. In either case, the effects of bias temperature instability (BTI) resulting from task execution are distributed among the processor cores in a more equal fashion than if tasks are scheduled according to a fixed order. Accordingly, the useful lifetime of the processor unit can be extended.