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    Maleimide containing cycloolefinic polymers and applications thereof
    3.
    发明授权
    Maleimide containing cycloolefinic polymers and applications thereof 有权
    含有环烯烃聚合物的马来酰亚胺及其应用

    公开(公告)号：US09261782B2

    公开(公告)日：2016-02-16

    申请号：US14034682

    申请日：2013-09-24

    Applicant: Promerus, LLC

    Inventor： Pramod Kandanarachchi ,  Larry F. Rhodes

    IPC: G03F7/023 ,  G03F7/40 ,  C08F232/02 ,  C08F232/08 ,  C08F8/14 ,  G03F7/022

    CPC classification number: G03F7/0233 ,  C08F8/14 ,  C08F232/02 ,  C08F232/08 ,  G03F7/022 ,  G03F7/0226 ,  G03F7/40 ,  C08F222/06

    Abstract: Various cycloolefinic/maleic anhydride polymers containing maleimide pendant groups and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such polymers encompass norbornene-type repeating units containing maleimide groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

    Abstract translation: 公开了包含马来酰亚胺侧基的各种环烯烃/马来酸酐聚合物及其组合物，其用于形成包含这种共聚物的自显影膜。 这种聚合物包括含有马来酰亚胺基团和马来酸酐型重复单元的降冰片烯型重复单元，其中至少一些马来酸酐型重复单元已经开环。 由这种共聚物组合物形成的膜提供用于微电子和光电子器件的自成像，低k热稳定层。

    Positive tone photosensitive compositions containing amic acid as latent base catalyst
    4.
    发明授权
    Positive tone photosensitive compositions containing amic acid as latent base catalyst 有权

    公开(公告)号：US11061328B2

    公开(公告)日：2021-07-13

    申请号：US16874982

    申请日：2020-05-15

    Applicant: PROMERUS, LLC

    Inventor： Pramod Kandanarachchi

    IPC: G03F7/039 ,  C08K5/1515 ,  C08G69/28 ,  C08G69/40

    Abstract: Embodiments in accordance with the present invention encompass photosensitive compositions containing a base soluble polymer, a latent base catalyst, a photoactive compound and an epoxy crosslinking agent. The compositions are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. More specifically, the compositions exhibit increased photo speed, higher elongation to break, higher tensile strength and higher glass transitions temperatures than the conventional compositions, among other enhanced properties. Accordingly, the positive images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.

    Permanent dielectric compositions containing photoacid generator and base
    5.
    发明授权
    Permanent dielectric compositions containing photoacid generator and base 有权

    公开(公告)号：US11048168B2

    公开(公告)日：2021-06-29

    申请号：US16517911

    申请日：2019-07-22

    Applicant: PROMERUS, LLC

    Inventor： Pramod Kandanarachchi

    IPC: G03F7/039 ,  G03F7/38 ,  G03F7/40 ,  G03F7/004 ,  C08G61/08 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

    Abstract: Embodiments encompassing a series of compositions containing photoacid generator (PAG) and a base are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of copolymers of a variety of norbornene-type cycloolefinic monomers and maleic anhydride in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), PAG and a base, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses, are disclosed.

    Shelf life stable and improved mass polymerizable polycyclic-olefinic compositions
    7.
    发明授权
    Shelf life stable and improved mass polymerizable polycyclic-olefinic compositions 有权

    公开(公告)号：US12180385B2

    公开(公告)日：2024-12-31

    申请号：US17514579

    申请日：2021-10-29

    Applicant: PROMERUS, LLC

    Inventor： Pramod Kandanarachchi

    IPC: C09D165/00

    Abstract: Embodiments in accordance with the present invention encompass compositions containing one or more polycycloolefinic monomers, optionally at least one multifunctional olefinic monomer and a suitable solvent, which exhibits long shelf life stability and undergoes mass polymerization only when subjected to a suitable temperature to provide a three-dimensional insulating articles. Embodiments of this invention exhibit hitherto unattainable properties, such as for example, low dielectric constant and low loss properties, and very high thermal properties, among others. The compositions of this invention may additionally contain one or more organic or inorganic filler materials, which provide improved thermo-mechanical properties in addition to very low dielectric properties. In general the compositions are stable at room temperature for an extended period of time lasting up to a few weeks and undergo mass polymerization only when subjected to suitable higher temperatures generally above 100° C. The compositions of this invention are useful in various applications, including as insulating materials in millimeter wave radar antennas, among others.

    Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof
    8.
    发明授权
    Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof 有权

    公开(公告)号：US11535709B2

    公开(公告)日：2022-12-27

    申请号：US16809556

    申请日：2020-03-05

    Applicant: PROMERUS, LLC

    Inventor： Pramod Kandanarachchi ,  Cheryl Burns ,  Brian Knapp ,  Larry F Rhodes

    IPC: C08G73/10 ,  G03F7/038

    Abstract: Embodiments in accordance with the present invention encompass polyamic acid or polyimide polymers containing a reactive maleimide end group as well as photosensitive compositions made therefrom which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. The negative images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.

    POLYMER, PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE
    10.
    发明申请
    POLYMER, PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE 有权
    聚合物，感光树脂组合物和电子器件

    公开(公告)号：US20150252132A1

    公开(公告)日：2015-09-10

    申请号：US14640405

    申请日：2015-03-06

    Applicant: SUMITOMO BAKELITE CO., LTD. ,  PROMERUS, LLC

    Inventor： Osamu Onishi ,  Haruo Ikeda ,  Larry F. Rhodes ,  Pramod Kandanarachchi ,  Hugh Burgoon

    IPC: C08F222/40 ,  G03F7/004

    CPC classification number: C08F222/40 ,  C08G61/04 ,  C08G61/08 ,  G03F7/0233 ,  G03F7/038

    Abstract: There is provided a polymer including a structural unit represented by the following Formula (1a), a structural unit represented by the following Formula (1b) and a structural unit represented by the following Formula (1c) (In Formula (1a), n represents 0, 1 or 2. Each of R1, R2, R3 and R4 independently represents a hydrogen atom or an organic group having 1 to 10 carbon atoms. In Formula (1c), R5 represents an organic group having 1 to 10 carbon atoms.

    Abstract translation: 提供包含由下式（1a）表示的结构单元，由下式（1b）表示的结构单元和由下式（1c）表示的结构单元的聚合物（在式（1a）中，n表示 R 1，R 2，R 3和R 4各自独立地表示氢原子或碳原子数1〜10的有机基团，式（1c）中，R 5表示碳原子数1〜10的有机基团。

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