公开(公告)号：US20140166869A1

公开(公告)日：2014-06-19

申请号：US14090041

申请日：2013-11-26

Applicant: NuFlare Technology, Inc.

Inventor： Sumito NAKADA ,  Hikaru Yamamura ,  Osamu IIzuka ,  Hideyuki Tsurumaki

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3002 ,  H01J37/3174 ,  H01J37/3177

Abstract: A charged particle beam writing method according to embodiments of the present disclosure includes: storing in a charged particle beam writing apparatus a position coordinate at which a drift amount is diagnosed; storing in the charged particle beam writing apparatus first and second time interval patterns which define time intervals to diagnose the drift amount of the charged particle beam; performing first writing of irradiating a target object with the charged particle beam, and writing a writing pattern on the target object while diagnosing the drift amount based on the first time interval pattern during the writing; and performing second writing of writing a predetermined writing pattern while diagnosing the drift amount when the writing reaches the position coordinate and diagnosing the drift amount based on the second time interval pattern during the writing after the writing reaches the position coordinate.

Abstract translation: 根据本公开实施例的带电粒子束写入方法包括：在带电粒子束写入装置中存储测量漂移量的位置坐标; 存储在带电粒子束写入装置中的第一和第二时间间隔图案，其限定时间间隔以诊断带电粒子束的漂移量; 执行用带电粒子束照射目标物体的第一写入，并且在写入期间基于第一时间间隔图案来诊断漂移量，将目标对象写入写入模式; 以及在写入到达位置坐标时诊断漂移量并且在写入到达位置坐标之后在写入期间基于第二时间间隔图案来诊断漂移量，执行写入预定写入模式的第二写入。