公开(公告)号：US20110035165A1

公开(公告)日：2011-02-10

申请号：US12907716

申请日：2010-10-19

申请人： Noriaki KOYAMA ,  Minoru Obata ,  Wenling Wang

发明人： Noriaki KOYAMA ,  Minoru Obata ,  Wenling Wang

IPC分类号： G06F17/18 ,  G06F15/00 ,  G01F1/00 ,  G01K13/00 ,  G01L7/00

CPC分类号： G05B23/0221 ,  G05B2219/32184 ,  G05B2219/32192 ,  G05B2219/45031 ,  Y02P90/22

摘要： A information processing apparatus 100 for processing an acquired value, which is a value acquired in regard to a state during a treatment, performed by a semiconductor manufacturing apparatus 200 for performing a treatment on a treatment target containing a semiconductor according to a set value, which is a value for setting a condition of a treatment, includes: a set value receiving portion 101 for receiving the set value; a state value receiving portion 102 for receiving the acquired value; a correction amount calculating portion 103 for calculating a correction amount of the acquired value, using a correction function indicating a relationship between the set value and the acquired value; a correcting portion 104 for correcting the acquired value received by the state value receiving portion 102, using the correction amount calculated by the correction amount calculating portion 103; and an output portion 105 for outputting a result of correction performed by the correcting portion 104.

摘要翻译： 一种信息处理设备100，用于处理获取值，该获取值是由处理期间的状态获取的值，由半导体制造设备200执行，用于根据设定值对包含半导体的处理对象进行处理， 是用于设定治疗条件的值，包括：用于接收设定值的设定值接收部101; 用于接收所获取的值的状态值接收部分102; 校正量计算部分103，用于使用指示设定值和获取值之间的关系的校正函数来计算获取值的校正量; 校正部分104，用于使用由校正量计算部分103计算的校正量来校正由状态值接收部分102接收到的获取值; 以及输出部分105，用于输出校正部分104执行的校正结果。

公开(公告)号：US07869888B2

公开(公告)日：2011-01-11

申请号：US11754643

申请日：2007-05-29

申请人： Noriaki Koyama ,  Minoru Obata ,  Wenling Wang

发明人： Noriaki Koyama ,  Minoru Obata ,  Wenling Wang

IPC分类号： G05B13/02 ,  G06F19/00

CPC分类号： G05B23/0221 ,  G05B2219/32184 ,  G05B2219/32192 ,  G05B2219/45031 ,  Y02P90/22

摘要： A information processing apparatus 100 for processing an acquired value, which is a value acquired in regard to a state during a treatment, performed by a semiconductor manufacturing apparatus 200 for performing a treatment on a treatment target containing a semiconductor according to a set value, which is a value for setting a condition of a treatment, includes: a set value receiving portion 101 for receiving the set value; a state value receiving portion 102 for receiving the acquired value; a correction amount calculating portion 103 for calculating a correction amount of the acquired value, using a correction function indicating a relationship between the set value and the acquired value; a correcting portion 104 for correcting the acquired value received by the state value receiving portion 102, using the correction amount calculated by the correction amount calculating portion 103; and an output portion 105 for outputting a result of correction performed by the correcting portion 104.

摘要翻译： 一种信息处理设备100，用于处理获取值，该获取值是由处理期间的状态获取的值，由半导体制造设备200执行，用于根据设定值对包含半导体的处理对象进行处理， 是用于设定治疗条件的值，包括：用于接收设定值的设定值接收部101; 用于接收所获取的值的状态值接收部分102; 校正量计算部分103，用于使用指示设定值和获取值之间的关系的校正函数来计算获取值的校正量; 校正部分104，用于使用由校正量计算部分103计算的校正量来校正由状态值接收部分102接收到的获取值; 以及输出部分105，用于输出校正部分104执行的校正结果。

公开(公告)号：US20070282554A1

公开(公告)日：2007-12-06

申请号：US11754643

申请日：2007-05-29

申请人： Noriaki KOYAMA ,  Minoru Obata ,  Wenling Wang

发明人： Noriaki KOYAMA ,  Minoru Obata ,  Wenling Wang

IPC分类号： G06F19/00

CPC分类号： G05B23/0221 ,  G05B2219/32184 ,  G05B2219/32192 ,  G05B2219/45031 ,  Y02P90/22

摘要： A information processing apparatus 100 for processing an acquired value, which is a value acquired in regard to a state during a treatment, performed by a semiconductor manufacturing apparatus 200 for performing a treatment on a treatment target containing a semiconductor according to a set value, which is a value for setting a condition of a treatment, includes: a set value receiving portion 101 for receiving the set value; a state value receiving portion 102 for receiving the acquired value; a correction amount calculating portion 103 for calculating a correction amount of the acquired value, using a correction function indicating a relationship between the set value and the acquired value; a correcting portion 104 for correcting the acquired value received by the state value receiving portion 102, using the correction amount calculated by the correction amount calculating portion 103; and an output portion 105 for outputting a result of correction performed by the correcting portion 104.

摘要翻译： 一种信息处理设备100，用于处理获取值，该获取值是由处理期间的状态获取的值，由半导体制造设备200执行，用于根据设定值对包含半导体的处理对象进行处理， 是用于设定治疗条件的值，包括：用于接收设定值的设定值接收部101; 用于接收所获取的值的状态值接收部分102; 校正量计算部分103，用于使用指示设定值和获取值之间的关系的校正函数来计算获取值的校正量; 校正部分104，用于使用由校正量计算部分103计算的校正量来校正由状态值接收部分102接收到的获取值; 以及输出部分105，用于输出校正部分104执行的校正结果。

公开(公告)号：US20120169505A1

公开(公告)日：2012-07-05

申请号：US13350625

申请日：2012-01-13

申请人： Nobutoshi TERASAWA ,  Minoru Obata ,  Noriaki Koyama

发明人： Nobutoshi TERASAWA ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G08B21/00

CPC分类号： F27B17/0025

摘要： A life estimating method for a heater wire utilizes data obtained during a period (e.g., a temperature rising period), in which a sign of disconnection of the heater wire is likely to be seen. This method includes detecting a maximum magnitude value of electric power supplied to the heater wire during the temperature rising period for elevating the temperature to a heating temperature prior to providing a heating process to a wafer or wafers. The method further includes obtaining an index indicative of a magnitude of the amplitude of the electric power, and giving notice that the heater wire is approaching the end of its life when the indexes respectively indicate that the electric power magnitude and the amplitude magnitude exceed threshold values respectively.

摘要翻译： 加热丝的寿命估计方法利用在可能看到加热丝线的断开符号的期间（例如升温期间）中获得的数据。 该方法包括检测在升温期间提供给加热丝的电力的最大幅度值，以在将加热过程提供给晶片或晶片之前将温度升高至加热温度。 该方法还包括获得指示电力振幅大小的指标，并且当指标分别指示电力幅度和振幅幅度超过阈值时，注意到加热器线接近其寿命结束 分别。

公开(公告)号：US08055391B2

公开(公告)日：2011-11-08

申请号：US12375693

申请日：2007-07-09

申请人： Masashi Takahashi ,  Minoru Obata ,  Noriaki Koyama

发明人： Masashi Takahashi ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G06F11/00 ,  G06F19/00 ,  G05B11/01 ,  G05D5/00 ,  H03M13/00 ,  B29C45/00

CPC分类号： G05B21/02 ,  G05B23/0264 ,  H01L21/67757 ,  H01L21/67769 ,  H01L21/67772 ,  Y02P90/14 ,  Y02P90/18

摘要： A server device constituting a group management system includes one or more manufacturing apparatuses for performing a preset process on a target substrate, and the server device includes a measurement information storage unit for storing therein one or more measurement information; an instruction receiving unit for receiving an output instruction of the measurement information, which contains information specifying a predetermined start point and valid time information; a measurement information acquisition unit for acquiring, from the measurement information storage unit, measurement information ranging from the predetermined start point to a time point of the valid time; an output information composing unit for composing output information by using the acquired measurement information; and an output unit for outputting the output information composed by the output information composing unit.

摘要翻译： 构成组管理系统的服务器装置包括用于在目标基板上执行预设处理的一个或多个制造装置，并且所述服务器装置包括用于在其中存储一个或多个测量信息的测量信息存储单元; 指令接收单元，用于接收包含指定预定起点和有效时间信息的信息的测量信息的输出指令; 测量信息获取单元，用于从测量信息存储单元获取从预定开始点到有效时间的时间点的测量信息; 输出信息组合单元，用于通过使用获取的测量信息来组合输出信息; 以及输出单元，用于输出由输出信息组合单元组成的输出信息。

公开(公告)号：US07974729B2

公开(公告)日：2011-07-05

申请号：US12375590

申请日：2007-07-09

申请人： Masashi Takahashi ,  Minoru Obata ,  Noriaki Koyama

发明人： Masashi Takahashi ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G06F19/00

CPC分类号： G05B23/0213 ,  H01L21/67276

摘要： A server device is provided with a measurement information storage unit 1201 which can store plural measurement information, i.e., information having a measurement value and time information indicating time; an instruction receiving unit for receiving an output instruction of the measurement information; a measurement information acquisition unit for acquiring, from the measurement information storage unit, the measurement information designated by the output instruction; an output information composing unit for composing output information by using the acquired measurement information; and an output unit for outputting the output information composed by the output information composing unit. The output instruction includes an instruction for designating one or more desired number of times of execution of a sub-recipe among plural number of times of execution of the sub-recipe in the recipe and the measurement information acquisition unit acquires measurement information corresponding to the sub-recipe designated by the output instruction.

摘要翻译： 服务器装置设置有可以存储多个测量信息的测量信息存储单元1201，即具有测量值的信息和指示时间的时间信息; 指令接收单元，用于接收测量信息的输出指令; 测量信息获取单元，用于从测量信息存储单元获取由输出指令指定的测量信息; 输出信息组合单元，用于通过使用获取的测量信息来组合输出信息; 以及输出单元，用于输出由输出信息组合单元组成的输出信息。 输出指令包括用于在食谱中指定子数据的多次执行中的子分配的一次或多次所需次数的指示，并且测量信息获取单元获取与子配方对应的测量信息 由输出指令指定的-recipe。

公开(公告)号：US20080208385A1

公开(公告)日：2008-08-28

申请号：US11794374

申请日：2005-12-22

申请人： Koichi Sakamoto ,  Minoru Obata ,  Noriaki Koyama

发明人： Koichi Sakamoto ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G06F19/00 ,  H01L21/3065 ,  H01L21/02

CPC分类号： C23C16/4412 ,  C23C16/52 ,  G05B23/0235 ,  H01L21/67288

摘要： In order to detect an abnormality of semiconductor manufacturing apparatus, a biaxial coordinate system having first and second axes respectively assigned two different monitoring parameters selected from plural apparatus status parameters representing statuses of semiconductor manufacturing apparatus is prepared. As monitoring parameters, for example, a cumulative film thickness for deposition processes that have previously been performed in deposition apparatus and an opening of the pressure control valve located in a vacuum exhaust path to control the internal pressure of a reaction vessel are selected. Values of monitoring parameters obtained when the semiconductor manufacturing apparatus was normally operating are plotted on the biaxial coordinate system. A boundary between a normal condition and an abnormality status is set around a plot group. Values of monitoring parameters obtained during present operation of the semiconductor manufacturing apparatus are plotted on the biaxial coordinate system to determine whether or not there exists an abnormality and identify a type of abnormality based on a positional relation between the plots and the boundary.

摘要翻译： 为了检测半导体制造装置的异常，准备了具有第一和第二轴的双轴坐标系分别分配了从表示半导体制造装置的状态的多个装置状态参数中选择的两个不同的监视参数。 作为监测参数，例如，选择先前在沉积设备中执行的沉积工艺的累积膜厚度和位于真空排气路径中的压力控制阀的打开以控制反应容器的内部压力。 在半导体制造装置正常工作时获得的监视参数的值被绘制在双轴坐标系上。 围绕绘图组设定正常状态与异常状态之间的边界。 在双轴坐标系上绘制在半导体制造装置的当前操作期间获得的监视参数的值，以基于图和边界之间的位置关系确定是否存在异常并识别异常的类型。

公开(公告)号：US07751921B2

公开(公告)日：2010-07-06

申请号：US11794374

申请日：2005-12-22

申请人： Koichi Sakamoto ,  Minoru Obata ,  Noriaki Koyama

发明人： Koichi Sakamoto ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G06F19/00 ,  G06F11/30

CPC分类号： C23C16/4412 ,  C23C16/52 ,  G05B23/0235 ,  H01L21/67288

摘要： In order to detect an abnormality of semiconductor manufacturing apparatus, a biaxial coordinate system having first and second axes respectively assigned two different monitoring parameters selected from plural apparatus status parameters representing statuses of semiconductor manufacturing apparatus is prepared. As monitoring parameters, for example, a cumulative film thickness for deposition processes that have previously been performed in deposition apparatus and an opening of the pressure control valve located in a vacuum exhaust path to control the internal pressure of a reaction vessel are selected. Values of monitoring parameters obtained when the semiconductor manufacturing apparatus was normally operating are plotted on the biaxial coordinate system. A boundary between a normal condition and an abnormality status is set around a plot group. Values of monitoring parameters obtained during present operation of the semiconductor manufacturing apparatus are plotted on the biaxial coordinate system to determine whether or not there exists an abnormality and identify a type of abnormality based on a positional relation between the plots and the boundary.

摘要翻译： 为了检测半导体制造装置的异常，准备了具有第一和第二轴的双轴坐标系分别分配了从表示半导体制造装置的状态的多个装置状态参数中选择的两个不同的监视参数。 作为监测参数，例如，选择先前在沉积设备中执行的沉积工艺的累积膜厚度和位于真空排气路径中的压力控制阀的打开以控制反应容器的内部压力。 在半导体制造装置正常工作时获得的监视参数的值被绘制在双轴坐标系上。 围绕绘图组设定正常状态与异常状态之间的边界。 在双轴坐标系上绘制在半导体制造装置的当前操作期间获得的监视参数的值，以基于图和边界之间的位置关系确定是否存在异常并识别异常的类型。

公开(公告)号：US08121799B2

公开(公告)日：2012-02-21

申请号：US12081404

申请日：2008-04-15

申请人： Nobutoshi Terasawa ,  Minoru Obata ,  Noriaki Koyama

发明人： Nobutoshi Terasawa ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G01B3/44 ,  G01B3/52 ,  G01N37/00

CPC分类号： F27B17/0025

摘要： A method of estimating the life of a heater wire, including the steps of: detecting a maximum value of electric power supplied to the heater wire during a temperature rising period during which a temperature is elevated to a preset heating temperature, obtaining an index indicative of the amplitude of the electric power, and giving a notice that the heater wire is approaching the end of its life when the electric power and the index indicative of the of amplitude of the electric power exceed threshold values respectively provided thereto.

摘要翻译： 一种估计加热线寿命的方法，包括以下步骤：在温度升高到预设加热温度的升温期间，检测供应给加热丝的电力的最大值，得到指示 电功率的振幅，并且当电功率和表示电功率的幅度的指标分别提供给它们时，发出加热线接近寿命结束的通知。

公开(公告)号：US20090276076A1

公开(公告)日：2009-11-05

申请号：US12375590

申请日：2007-07-09

申请人： Masashi Takahashi ,  Minoru Obata ,  Noriaki Koyama

发明人： Masashi Takahashi ,  Minoru Obata ,  Noriaki Koyama

IPC分类号： G06F17/00

CPC分类号： G05B23/0213 ,  H01L21/67276

摘要： A server device is provided with a measurement information storage unit 1201 which can store plural measurement information, i.e., information having a measurement value and time information indicating time; an instruction receiving unit for receiving an output instruction of the measurement information; a measurement information acquisition unit for acquiring, from the measurement information storage unit, the measurement information designated by the output instruction; an output information composing unit for composing output information by using the acquired measurement information; and an output unit for outputting the output information composed by the output information composing unit. The output instruction includes an instruction for designating one or more desired number of times of execution of a sub-recipe among plural number of times of execution of the sub-recipe in the recipe and the measurement information acquisition unit acquires measurement information corresponding to the sub-recipe designated by the output instruction.

摘要翻译： 服务器装置设置有可以存储多个测量信息的测量信息存储单元1201，即具有测量值的信息和指示时间的时间信息; 指令接收单元，用于接收测量信息的输出指令; 测量信息获取单元，用于从测量信息存储单元获取由输出指令指定的测量信息; 输出信息组合单元，用于通过使用获取的测量信息来组合输出信息; 以及输出单元，用于输出由输出信息组合单元组成的输出信息。 输出指令包括用于在食谱中指定子数据的多次执行中的一个或多个期望次数的执行次数的指令，并且测量信息获取单元获取与子配方相对应的测量信息 由输出指令指定的-recipe。