Abstract:
A vehicle power steering motor (31) provides a force to turn vehicle steerable wheels (14 and 16). A power steering control valve (22) includes first and second relatively rotatable valve members (40 and 42). The first and second valve members (40 and 42) port fluid to actuate the vehicle power steering motor (31) upon relative movement. A device (114) senses at least one vehicle operational characteristic and provides a signal indicative of the at least one vehicle operational characteristic. In a preferred embodiment, the at least one vehicle operational characteristic is vehicle lateral acceleration. A force transmitting device (116, 120, and 130) resists relative movement between the first and second valve members (40 and 42) with a force which varies as a function of the output signal. The force varies as a function of vehicle lateral acceleration.
Abstract:
The present invention provides methods for purifying nucleic acid molecules, wherein each method includes the steps of: (a) synthesizing nucleic acid molecules in a reaction mixture; (b) contacting the nucleic acid molecules with a proteinase for a period of time sufficient to degrade protein in the reaction mixture; (c) applying the nucleic acid molecules treated in accordance with step (b) to a size-limiting filter so that at least some of the nucleic acid molecules are trapped on the filter; and (d) washing the filter with a phosphate buffer having a pH in the range of from about 5.7 to about 8.5.
Abstract:
A semi-active suspension system having a linear actuator operatively connected between a sprung mass and an unsprung mass of the vehicle for each corner of the vehicle. An accumulator connected to the actuator through an electrically controlled valve. An actuatable fluid RAM is in fluid communication with the accumulator for controlling fluid pressure in the accumulator. A hydraulic ram driver is operatively connected to the RAM. A sensor senses force inputs to the vehicle. A controller controls (i) the ram driver for pressurizing the accumulator to a desired fluid pressure, and (ii) the electrically controlled valve in response to sensed force input so as to effect a fluid pressure change in the actuator. Each fluid RAM includes a hydraulic motor having a housing and a piston slidably mounted in the housing. The piston divides the housing into two variable volume fluid chambers, one fluid chamber in fluid communication with the accumulator and a second fluid chamber in communication with the second fluid chambers of each RAM of the other corners of the vehicle. This arrangement permits movement of the piston of the fluid RAM with reduced energy.
Abstract:
A process for creating bipolar and CMOS transistors on a p-type silicon substrate is disclosed. The silicon substrate has typical n+ buried wells and field oxide regions to isolate the individual transistor devices. In accordance with the process, stacks of material are created over the gate elements of the CMOS devices and over the emitter elements of the bipolar transistors. The stacks of material over the gate elements have a silicon dioxide gate layer in contact with the epitaxial layer of the substrate, and the stacks of material over the emitter elements have a polycrystalline silicon layer in contact with the epitaxial layer. Walls of silicon dioxide are created around the stacks in order to insulate the material within the stacks from the material deposited outside of the walls. Polycrystalline silicon in contact with the epitaxial layer is deposited outside the walls surrounding the stacks. All polycrystalline silicon layers in contact with the epitaxial layer are implanted with appropriate dopants such that these layers serve as reservoirs of dopant in order to simultaneously create the source and drain elements of the CMOS devices and the emitter elements of the bipolar devices during a heating step in the process. A tungsten layer is deposited over the polycrystalline layer in order to provide a conductive coupling to aluminum electrodes.
Abstract:
A process for creating bipolar and CMOS transistors on a p-type silicon substrate is disclosed. The silicon substrate has a typical n+ buried wells and field oxide regions to isolate the individual transistor devices. In accordance with the process, stacks of material are created over the gate elements of the CMOS devices and over the emitter elements of the bipolar transistors. The stacks of material over the gate elements have a silicon dioxide gate layer in contact with the epitaxial layer of the substrate, and the stacks of material over the emitter elements have a polycrystalline silicon layer in contact with the epitaxial layer. Walls of silicon dioxide are created around the stacks in order to insulate the material within the stacks from the material deposited outside of the walls. Polycrystalline silicon in contact with the epitaxial layer is deposited outside the walls surrounding the stacks. All polycrystalline silicon layers in contact with the epitaxial layer are implanted with appropriate dopants such that these layers serve as reservoirs of dopant in order to simultaneously create the source and drain elements of the CMOS devices and the emitter elements of the bipolar device during a heating step in the process. A tungsten layer is deposited over the polycrystalline layer in order to provide a conductive coupling to aluminum electrodes.