DEGRADATION MONITOR FOR BOND WIRE TO BOND PAD INTERFACES

    公开(公告)号:US20230393192A1

    公开(公告)日:2023-12-07

    申请号:US17805555

    申请日:2022-06-06

    Applicant: NXP B.V.

    CPC classification number: G01R31/2889

    Abstract: A device comprises a substrate and a stacked bond ball structure. The substrate comprises a bond pad, and the stacked bond ball structure comprises a first and a second bond ball. The first bond ball is in contact with the bond pad, and the second bond ball is positioned on the first bond ball. The stacked bond ball structure is configured to be coupled to a resistance-sensing circuit, such that a resistance of an interface between the first bond ball and the bond pad can be measured to determine an amount of degradation of the interface between the first bond ball and the bond pad. In some implementations, the device further comprises a controller configured to obtain a measured resistance of the interface from the resistance-sensing circuit and determine the amount of degradation of the interface based at least in part on the measured resistance.

    Degradation monitor for bond wire to bond pad interfaces

    公开(公告)号:US12061228B2

    公开(公告)日:2024-08-13

    申请号:US17805555

    申请日:2022-06-06

    Applicant: NXP B.V.

    CPC classification number: G01R31/2889

    Abstract: A device comprises a substrate and a stacked bond ball structure. The substrate comprises a bond pad, and the stacked bond ball structure comprises a first and a second bond ball. The first bond ball is in contact with the bond pad, and the second bond ball is positioned on the first bond ball. The stacked bond ball structure is configured to be coupled to a resistance-sensing circuit, such that a resistance of an interface between the first bond ball and the bond pad can be measured to determine an amount of degradation of the interface between the first bond ball and the bond pad. In some implementations, the device further comprises a controller configured to obtain a measured resistance of the interface from the resistance-sensing circuit and determine the amount of degradation of the interface based at least in part on the measured resistance.

    ISOLATION STRUCTURE
    4.
    发明申请

    公开(公告)号:US20240413192A1

    公开(公告)日:2024-12-12

    申请号:US18329847

    申请日:2023-06-06

    Applicant: NXP B.V.

    Abstract: A semiconductor device may include a semiconductor substrate and an isolation structure including a first dielectric layer formed over the semiconductor substrate, the first dielectric layer including one or more air gaps, and a first conductive structure formed on the dielectric layer, the conductive structure having a lower surface that faces the semiconductor substrate. Respective air gaps of the one or more air gaps of the first dielectric layer each may be disposed directly between corners of the lower surface of the conductive structure and the semiconductor substrate.

Patent Agency Ranking