公开(公告)号：US20170146465A1

公开(公告)日：2017-05-25

申请号：US15319830

申请日：2015-06-18

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Oded COHEN ,  Igor TUROVETS

IPC: G01N21/956 ,  G01N21/88 ,  H01L21/66 ,  G01N21/95

CPC classification number: G01N21/95607 ,  G01B2210/56 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  H01L22/30

Abstract: A test structure is presented for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis. The test structure comprises a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some features of the main pattern, parameters of which are to be controlled during metrology measurements.

公开(公告)号：US20170227474A1

公开(公告)日：2017-08-10

申请号：US15502329

申请日：2015-08-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Oded COHEN

IPC: G01N21/956 ,  G01R31/309 ,  H01L23/544 ,  G01B11/14 ,  H01L21/66

CPC classification number: G01N21/956 ,  G01B11/14 ,  G01B2210/56 ,  G01R31/309 ,  H01L22/30 ,  H01L23/544

Abstract: A test structure is presented for use in metrology measurements of a sample pattern. The test structure comprises a main pattern, and one or more auxiliary patterns. The main pattern is formed by a plurality of main features extending along a first longitudinal axis and being spaced from one another along a second lateral axis. The one or more auxiliary patterns are formed by a plurality of auxiliary features associated with at least some of the main features such that a dimension of the auxiliary feature is in a predetermined relation with a dimension of the respective main feature. This provides that a change in a dimension of the auxiliary feature from a nominal value affects a change in non-zero order diffraction response from the test structure in a predetermined optical measurement scheme, and this change is indicative of a deviation in one or more parameters of the main pattern from nominal value thereof.

公开(公告)号：US20170363970A1

公开(公告)日：2017-12-21

申请号：US15534187

申请日：2015-12-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Oded COHEN ,  Gilad BARAK ,  Igor TUROVETS

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70625 ,  G03F7/70466 ,  G03F7/70683 ,  H01L22/30 ,  H01L22/34

Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region