摘要:
A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.
摘要:
There is provided an imprint material that has sufficient adhesion to film substrates and excellent scratch resistance, and can be readily released from a mold at the time of mold release. An imprint material including: (A) a specific acrylamide such as N,N′-dimethylacrylamide; (B) a compound having alkylene oxide units and having 2 to 6 polymerizable groups at the ends of the compound, in which the alkylene oxide units are ethylene oxide units, propylene oxide units, or a combination thereof; and (C) a photopolymerization initiator.
摘要:
A novel imprint material including: (A) a compound of formula (1); (B) a compound of formula (2); (C) a compound of formula (3); (D) a compound of formula (4); and (E) a photopolymerization initiator: wherein each R1 is independently a hydrogen atom or methyl group; R2 is a divalent or trivalent hydrocarbon group; j is 0 or 1; k is 2 or 3; X is a divalent linking group having an ethylene oxide and/or a propylene oxide unit; R3 is a hydrogen atom or alkyl group; m is 1 or 2; R5 is a trivalent, tetravalent, pentavalent, or hexavalent organic group, which optionally has at least one hetero atom; n is an integer from 3 to 6; where m is 1, R4 is an alkyl group optionally substituted with at least one substituent; and where m is 2, R4 is an alkylene group optionally substituted with at least one substituent.
摘要:
A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D):(A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein R1 is C1-12 alkyl or C6-20 aryl, R2 is hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein R3 and R4 are each hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.
摘要:
A structure having dry-wiping off characteristic relative to dirt attached to a concave-convex shaped surface of the structure, and a method for producing the structure. A structure having a concave-convex shaped surface, fabricated from a composition containing at least one compound having in a molecule, one to ten polymerizable group(s) and a photopolymerization initiator, wherein the structure has a Martens hardness of 3 N/mm2 or more and 130 N/mm2 or less when the Martens hardness of the structure is measured under a condition under which a Martens hardness of a molten quartz is 4,100 N/mm2. The structure is produced by applying the composition onto a substrate; pressing a coating film on the substrate into a concave-convex shaped face of a mold; photocuring the coating film while it is pressed into the concave-convex shaped face of the mold; and peeling the cured film on the substrate from the mold.
摘要:
A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is C1-5 linear alkylene, R1 is H or CH3; each of R2, R3, and R4 is independently H, CH3, or C2H5; and the sum of the number of carbon atoms on R2, R3, and R4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of R6 and R7 is independently C1-3 alkyl; R5 is C1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.
摘要:
There is provided an imprint material that allows a resin film to be readily released from a mold at the time of mold release after curing, that is, an imprint material that forms a film having a low mold release property as well as high transparency, high scratch resistance, and a high fingerprint wiping-off property; and a film which is formed from the material and to which a pattern is transferred. An imprint material including: a (A) component: a compound having a propylene oxide unit and two polymerizable groups or a compound having a propylene oxide unit, an ethylene oxide unit, and two polymerizable groups; a (B) component: a silicone compound; and a (C) component: a photopolymerization initiator.
摘要:
A coating film-forming composition includes a hydrolysis-condensation product of a hydrolyzable silane and fine inorganic particles subjected to a special dispersion treatment, that can be formed into a highly heat-resistant, highly transparent coating film capable of exhibiting a high refractive index and having a large thickness and excellent storage stability as a coating composition; and a process for producing the coating film-forming composition.
摘要:
A novel imprint material including a component (A); a component (B); a component (C); and a component (D) below. (A): a compound of Formula (1) below, (B): a compound of Formula (2) below, (C): a compound of Formula (3) below, and (D): a photopolymerization initiator, wherein, each R1 is independently a hydrogen atom or a methyl group, R2 is a C1-5 hydrocarbon group that optionally has a hydroxy group as a substituent, m is 2 or 3, X is a divalent linking group having an ethylene oxide unit and/or a propylene oxide unit, R3 is a hydrogen atom or a C1-3 alkyl group, n is 1 or 2, and when n is 1, R4 is a C1-12 alkyl group that is optionally substituted with at least one substituent, and when n is 2, R4 is a C1-12 alkylene group that is optionally substituted with at least one substituent.