SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20200098654A1

    公开(公告)日:2020-03-26

    申请号:US16136274

    申请日:2018-09-20

    摘要: A method includes forming a transistor over a substrate; forming a conductive structure over the substrate, such that a first end of the conductive structure is electrically coupled to a gate of the transistor, and a second end of the conductive structure is electrically coupled to the substrate; applying biases to the gate of the transistor and source/drain structures of the transistor; determining whether the first end and the second end of the conductive structure are electrically connected; generating, based on the determination, a first result indicating that the first end and the second end of the conductive structure are electrically connected; and qualifying the conductive structure as an antenna in response to the first result.

    Fuse elements and semiconductor devices

    公开(公告)号:US11843030B2

    公开(公告)日:2023-12-12

    申请号:US17691264

    申请日:2022-03-10

    摘要: A fuse element, a semiconductor device, and a method for activating a backup unit are provided. The fuse element includes an active area, which includes a source region and a drain region beside the source region, a gate region disposed on the active area, and a shallow trench isolation (STI) structure surrounding the active area. In addition, the drain region includes a terminal configured to receive a stress voltage, such that a conductive path is established through the drain region to the source region.

    Semiconductor structure with test structure

    公开(公告)号:US11456224B2

    公开(公告)日:2022-09-27

    申请号:US16990654

    申请日:2020-08-11

    IPC分类号: H01L21/66 H01L27/108

    摘要: The present disclosure provides a semiconductor structure having a test structure. The semiconductor structure includes a semiconductor substrate, a memory device and a test structure. The memory device is disposed on the semiconductor substrate, and includes a device area and an edge area. The edge area surrounds the device area. The test structure is disposed on the semiconductor substrate, and includes a dummy area, a test edge area and a plurality of unit cells. The test edge area surrounds the dummy area. The unit cells have a first group disposed in the dummy area and a second group disposed in the test edge area. The second group of unit cells includes the outermost unit cells of the plurality of unit cells. A shape surrounded by the edge area in a top view is different from a shape surrounded by the test edge area in the top view.

    Testing fixture and testing assembly

    公开(公告)号:US11262398B2

    公开(公告)日:2022-03-01

    申请号:US16670134

    申请日:2019-10-31

    摘要: The present disclosure provides a testing fixture. The testing fixture includes a carrier, a plurality of sets of electrical lines and a plurality of electrical lines. The carrier includes a base and a frame extending along an upper surface of the base. The base and the frame define a first recess, a second recess extending longitudinally from the first recess, and a third recess extending transversely from the first recess. The plurality of sets of electrical contacts are disposed on the base and arranged in a rotationally symmetrical manner, and the electrical lines are electrically connected to the plurality of sets of electrical contacts.

    Semiconductor structure and manufacturing method thereof

    公开(公告)号:US11024553B2

    公开(公告)日:2021-06-01

    申请号:US17031870

    申请日:2020-09-24

    摘要: A method includes forming a transistor over a substrate; forming a conductive structure over the substrate, such that a first end of the conductive structure is electrically coupled to a gate of the transistor, and a second end of the conductive structure is electrically coupled to the substrate; applying biases to the gate of the transistor and source/drain structures of the transistor; determining whether the first end and the second end of the conductive structure are electrically connected; generating, based on the determination, a first result indicating that the first end and the second end of the conductive structure are electrically connected; and qualifiying the conductive structure as an antenna in response to the first result.

    Semiconductor device and method for preparing the same

    公开(公告)号:US10985077B2

    公开(公告)日:2021-04-20

    申请号:US16459017

    申请日:2019-07-01

    IPC分类号: H01L21/8238 H01L21/66

    摘要: The present disclosure provides a semiconductor device and a method for preparing the same. The semiconductor device includes a substrate, a first type region, and a second type region. The first type region is disposed on the substrate and has a ring structure. The second type region is disposed on the substrate and disposed in the center of the first type region. The second type region has a square shape and includes a plurality of corners.

    Semiconductor structure and manufacturing method thereof

    公开(公告)号:US10825744B2

    公开(公告)日:2020-11-03

    申请号:US16136274

    申请日:2018-09-20

    摘要: A method includes forming a transistor over a substrate; forming a conductive structure over the substrate, such that a first end of the conductive structure is electrically coupled to a gate of the transistor, and a second end of the conductive structure is electrically coupled to the substrate; applying biases to the gate of the transistor and source/drain structures of the transistor; determining whether the first end and the second end of the conductive structure are electrically connected; generating, based on the determination, a first result indicating that the first end and the second end of the conductive structure are electrically connected; and qualifying the conductive structure as an antenna in response to the first result.

    Integrated circuit device
    9.
    发明授权

    公开(公告)号:US10756693B1

    公开(公告)日:2020-08-25

    申请号:US16596749

    申请日:2019-10-08

    IPC分类号: H03H7/00 H01L23/64

    摘要: An integrated circuit device is disclosed. The integrated circuit device includes a capacitor array, a decoder circuit, and an integrated circuit. The capacitor array includes a plurality of capacitor units. The decoder circuit is coupled to the capacitor array. The integrated circuit is coupled to the decoder circuit. The decoder circuit is configured to conduct part of the plurality of capacitor units, and to un-conduct part of the plurality of capacitor units, so as to adjust a capacitance value coupled to the integrated circuit.

    Anti-fuse structure
    10.
    发明授权

    公开(公告)号:US10720389B2

    公开(公告)日:2020-07-21

    申请号:US15802085

    申请日:2017-11-02

    IPC分类号: H01L23/525

    摘要: An anti-fuse structure includes an active area, a gate electrode over the active area, and a dielectric layer between the active area and the gate electrode. The active area and the gate electrode partially overlap in a vertical projection direction, forming a plurality of channels. One of the gate electrode and the active area includes a plurality of extending portions to form the plurality of channels.