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公开(公告)号：US10801107B2
公开(公告)日：2020-10-13
申请号：US16234372
申请日：2018-12-27
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Kyung Tae Kim , Myung Pil Han , Myoung Hoon Jung
Abstract: Disclosed is an apparatus for collecting a by-product in a semiconductor process, the apparatus including: a housing; a heater plate; a heater power supply unit; first and second upper horizontal brackets collecting a by-product; a by-product collecting tower allowing the exhaust gas to pass through an exhaust gas passing space and collecting the by-product; the lower horizontal bracket guiding the exhaust gas toward the window and collecting the by-product contained in the exhaust gas; the window blocking the powder form by-product from introducing to a gas collecting and discharging port and guiding the exhaust gas thereto; and the gas collecting and discharging port. Accordingly, the apparatus can increase capacity of collecting a by-product with a simple structure, thereby extending a replacement period of the apparatus. In addition, the apparatus can collect a large amount of by-products quickly and efficiently over a long period of time.
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公开(公告)号：US12104247B2
公开(公告)日：2024-10-01
申请号：US17377202
申请日：2021-07-15
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Yeon Ju Lee , Jin Woong Kim , Ji Eun Han
CPC classification number: C23C16/4412 , B01D45/04 , B01D45/08 , C23C16/4401 , C23C16/4411 , B01D2258/0216
Abstract: The present disclosure relates to an apparatus for trapping multiple reaction by-products for a semiconductor process, in which in order to separate, with the single trapping apparatus, reaction by-product mixtures contained in unreacted gases discharged after a process of depositing multiple different thin film layers is performed in a process chamber during a semiconductor manufacturing process, a trapping region division part is provided, which divides a heat distribution region into trapping regions for respective reaction by-products while controlling a flow in a movement direction of an introduced unreacted gas, thereby trapping a reaction by-product aggregated in the form of a thin film in a relatively high-temperature region by using a first internal trapping tower in a front region, and trapping a reaction by-product aggregated in the form of powder in a relatively low-temperature region by using a second internal trapping tower in a rear region.
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公开(公告)号：US12030007B2
公开(公告)日：2024-07-09
申请号：US17477831
申请日：2021-09-17
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Yeon Ju Lee , In Hwan Kim , Ji Eun Han , Sung Won Yoon
CPC classification number: B01D45/08 , B01D50/20 , B01D53/145 , H01L21/67069
Abstract: The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.
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公开(公告)号：US12195849B2
公开(公告)日：2025-01-14
申请号：US17377218
申请日：2021-07-15
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Yeon Ju Lee , Jin Woong Kim , Ji Eun Han
IPC: C23C16/44 , C23C16/455
Abstract: An apparatus is for trapping multiple reaction by-products for a semiconductor process, in which a trapping region is divided by a difference in vertical temperature distribution according to a distance spaced apart from a heater and by structures for switching flow path directions and generating multiple vortices using a trapping structure, and reaction by-product mixtures contained in a gas, which is discharged after a process of depositing multiple different thin film layers is performed in a process chamber during a semiconductor manufacturing process, is trapped by a single trapping apparatus, such that a reaction by-product, which is aggregated in the form of a thin film in a relatively high-temperature region, is trapped by a first trapping part in an upper region, and a reaction by-product, which is aggregated in the form of powder in a relatively low-temperature region, is trapped by a second trapping part in a lower region.
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5.发明授权公开(公告)号：US11173439B2
公开(公告)日：2021-11-16
申请号：US16677640
申请日：2019-11-07
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Jae Jun Lee , Myung Pil Han
Abstract: The flow path switching type collecting apparatus of by-products for a semiconductor manufacturing process of the present disclosure includes: a cylindrical housing that has a top plate having a gas inlet and a bottom plate having a gas outlet and fastening portions extending and protruding inside the housing, and receives and then discharges an exhaust gas flowing inside; and a flow path switching type disc collection tower that is installed vertically in the housing and includes an open edge-mesh center type collection disc, a mesh edge-open center type collection disc, a solid edge-open center type collection disc, and an open edge-solid center type collection disc that have different external shape to collect by-products of an exhaust gas flowing insides.
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Patent Agency Ranking
公开(公告)号：US11054174B2
公开(公告)日：2021-07-06
申请号：US16243570
申请日：2019-01-09
Applicant: MILAEBO CO., LTD.
Inventor： Kyu Hyun Hwang , Nak Jin Choi , Tae Yeon Kim , Kyung Tae Kim , Che Hoo Cho
Abstract: Disclosed is an apparatus for collecting a by-product in a semiconductor process, the apparatus including: a housing; a heater plate; a heater power supply unit; first and second upper horizontal brackets collecting a part of a by-product in a powder form; a by-product collecting tower allowing the exhaust gas to pass vertically and collecting a part of the by-product in a powder form; a lower horizontal bracket guiding the exhaust gas toward a window and collecting a part of the by-product in a powder form; the window blocking the powder form by-product from introducing toward a gas collecting and discharging port and guiding the exhaust gas thereto; and the gas collecting and discharging port. Accordingly, the apparatus can increase capacity of collecting by-products with a simple structure, thereby extending a replacement period of the apparatus and collect a large amount of by-products efficiently over a long period of time.
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公开(公告)号：US11872515B2
公开(公告)日：2024-01-16
申请号：US17832268
申请日：2022-06-03
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Yeon Ju Lee , In Hwan Kim , Jun Min Lee
CPC classification number: B01D50/20 , B01D45/08 , B01D45/16 , B01D46/12 , C23C16/4412
Abstract: The present disclosure relates to an apparatus for trapping of a reaction by-product capable of expanding the area for collection by inducing a gas flow, in which an internal trapping tower of the apparatus for trapping of a reaction by-product, which traps a reaction by-product contained in gas discharged from a process chamber during a semiconductor manufacturing process, is divided into multiple stages, the introduced gas is guided to a lower side of an inner region of an intermediate trapping unit provided as a space portion and discharged to an outer region while a trapping reaction occurs according to the reaction by-product trapping amount during a former part of a use duration time.
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公开(公告)号：US11623175B1
公开(公告)日：2023-04-11
申请号：US17698999
申请日：2022-03-18
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , In Mun Hwang , In Hwan Kim , Jun Min Lee
Abstract: The present disclosure provides an apparatus for trapping of a reaction by-product having a self regenerating function for a used inner collecting tower, and an object of the present disclosure is to provide the reaction by-product trapping apparatus configured such that the trapping apparatus positioned between a process chamber and a vacuum pump or between the vacuum pump and a scrubber stops operating during a semiconductor manufacturing process when a trapping reaction of trapping a reaction by-product reaches a saturated state during a trapping operation, and the trapping apparatus removes the reaction by-product produced in an inner collecting tower through a heating reaction, such that the inner collecting tower is regenerated to enable an additional trapping reaction to be performed.
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公开(公告)号：US10987619B2
公开(公告)日：2021-04-27
申请号：US16279385
申请日：2019-02-19
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Pyung Hee Son , Ye Jin Kim , Ji Su Kim
Abstract: Disclosed is an apparatus for collecting a by-product in a semiconductor manufacturing process. An objective of the present invention is to provide an apparatus for collecting a by-product such that exhaust gas having great amount of light gas is coagulated while having sufficient residence time in a long flow path, whereby the exhaust gas is collected as a high-density by-product. For this purpose, the apparatus includes: a housing receiving and discharging introduced exhaust gas and configured with a horizontal vortex plate; an upper plate covering an upper portion of the housing; an internal collecting tower provided with a collecting tower cover and a seed eliminating fin to extend a flow path and residence time of the exhaust gas; a heater having a heat conduction plate; and an extended discharging pipe configured to extend the flow path and residence time of the exhaust gas and discharge the exhaust gas.
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公开(公告)号：US20200321226A1
公开(公告)日：2020-10-08
申请号：US16433121
申请日：2019-06-06
Applicant: MILAEBO CO., LTD.
Inventor： Che Hoo Cho , Yeon Ju Lee , Ji Su Kim
Abstract: Disclosed is an apparatus for collecting a by-product in a semiconductor manufacturing process, the apparatus including: a heating jacket provided detachably along an outer circumference of a housing unit to provide a uniform temperature in a space into which exhaust gas containing tungsten hexafluoride (WF6) discharged after being used in a semiconductor manufacturing process flows; an upper internal collecting tower having first collecting plates and second collecting plates alternately arranged at regular intervals in a vertical direction to realize sufficient moving path and time in a narrow space; and a lower internal collection tower having third collecting plates arranged at regular intervals in the vertical direction, the third collecting plates having different regions on each surface thereof such that each of the third collecting plates is misaligned with a next third collecting plate to realize sufficient moving path and time in a narrow space.
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