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公开(公告)号：US5977288A
公开(公告)日：1999-11-02
申请号：US128900
申请日：1998-08-04
申请人： M. Dalil Rahman , Ping-Hung Lu
发明人： M. Dalil Rahman , Ping-Hung Lu
CPC分类号： C08G8/08 , C08G16/0293 , G03F7/0236
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
摘要翻译： 本发明提供一种通过在不进行高温蒸馏的情况下分离这些酚醛清漆树脂部分来制备具有一致的分子量和光致抗蚀剂组合物性能优异的成膜分级酚醛清漆树脂的方法。 还提供了一种从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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公开(公告)号：US5863700A
公开(公告)日：1999-01-26
申请号：US939253
申请日：1997-09-29
申请人： M. Dalil Rahman , Ping-Hung Lu
发明人： M. Dalil Rahman , Ping-Hung Lu
IPC分类号： G03F7/004 , C08G8/00 , C08G8/08 , C08G8/10 , C08G8/20 , C08L61/08 , G03F7/023 , G03F7/039 , G03C5/00
CPC分类号： G03F7/0236 , C08G8/08 , C08G8/10 , C08G8/20
摘要： The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin without high temperature distillation. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.
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公开(公告)号：US20100151392A1
公开(公告)日：2010-06-17
申请号：US12332501
申请日：2008-12-11
申请人： M. Dalil Rahman , Yi Yi , Douglas McKenzie , Clement Anyadiegwu , Ping-Hung Lu
发明人： M. Dalil Rahman , Yi Yi , Douglas McKenzie , Clement Anyadiegwu , Ping-Hung Lu
CPC分类号： G03F7/091 , C08G61/02 , C08G2261/342 , C08L83/04 , C09D165/00
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer, a linking component, a crosslinker, and an acid generator. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及包含聚合物，连接组分，交联剂和酸产生剂的有机旋涂可涂抗反射涂料组合物。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US5910559A
公开(公告)日：1999-06-08
申请号：US768541
申请日：1996-12-18
申请人： M. Dalil Rahman , Ping-Hung Lu , Michelle Cook
发明人： M. Dalil Rahman , Ping-Hung Lu , Michelle Cook
CPC分类号： G03F7/0236 , C08G8/08 , C08G8/12
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
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5.发明授权Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom 失效来自甲酚 - 甲醛反应混合物的分馏酚醛清漆树脂及其光致抗蚀剂组合物
公开(公告)号：US6096477A
公开(公告)日：2000-08-01
申请号：US251900
申请日：1999-02-19
申请人： M. Dalil Rahman , Ping-Hung Lu , Michelle Cook
发明人： M. Dalil Rahman , Ping-Hung Lu , Michelle Cook
CPC分类号： G03F7/0236 , C08G8/08 , C08G8/12
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
摘要翻译： 本发明提供了一种通过在不进行高温蒸馏的情况下分离这些酚醛清漆树脂部分来制备具有一致分子量和光致抗蚀剂组合物性能优异的成膜分级酚醛清漆树脂的方法。 还提供了一种从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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6.发明授权Antireflective coating compositions for photoresist compositions and use thereof 失效用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
公开(公告)号：US5994430A
公开(公告)日：1999-11-30
申请号：US841750
申请日：1997-04-30
申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
发明人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
IPC分类号： G03F7/11 , C08F8/30 , C08F212/14 , C08L25/18 , C09B69/10 , G03F7/09 , H01L21/027 , C08K5/00
CPC分类号： C09B69/106 , G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含溶剂组合物中的新型聚合物。 本发明还包括在光刻中使用抗反射涂料组合物的方法。 抗反射涂料组合物包含新型聚合物和溶剂组合物，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香族官能团的单元。 溶剂可以是有机的，优选地是低毒性的溶剂，或者它可以是水，其可另外含有其它与水可混溶的有机溶剂。
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7.发明授权Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists 失效原料中的金属离子还原，并使用路易斯碱控制用于阳性光致抗蚀剂中的酚醛清漆树脂的分子量
公开(公告)号：US5476750A
公开(公告)日：1995-12-19
申请号：US999500
申请日：1992-12-29
CPC分类号： C08G8/08 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了生产具有非常低水平的金属离子和基本上一致的分子量的水不溶性的碱溶性酚醛清漆树脂的方法。 还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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公开(公告)号：US6045966A
公开(公告)日：2000-04-04
申请号：US991034
申请日：1997-12-15
申请人： M. Dalil Rahman , Michelle Cook , Ping-Hung Lu
发明人： M. Dalil Rahman , Michelle Cook , Ping-Hung Lu
CPC分类号： G03F7/0236 , C08G8/00 , C08G8/08
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such a novolak resin fraction. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
摘要翻译： 本发明提供通过分离这种酚醛清漆树脂级分来制备具有一致的分子量和光致抗蚀剂组合物性能优异的成膜分级酚醛清漆树脂的方法。 还提供了一种从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。
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公开(公告)号：US5853954A
公开(公告)日：1998-12-29
申请号：US768539
申请日：1996-12-18
申请人： M. Dalil Rahman , Ping-Hung Lu
发明人： M. Dalil Rahman , Ping-Hung Lu
CPC分类号： C08G8/08 , C08G16/0293 , G03F7/0236
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
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公开(公告)号：US08017296B2
公开(公告)日：2011-09-13
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
IPC分类号： G03F7/04
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及一种有机可旋涂的抗反射涂料组合物，其包含聚合物，该聚合物包含至少一个在聚合物主链中具有3个或更多个稠合芳环的单元和至少一个在聚合物主链中具有脂族摩尔的单元。 本发明还涉及用于对本发明组合物进行成像的方法。
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