-
公开(公告)号：US08568958B2
公开(公告)日：2013-10-29
申请号：US13164869
申请日：2011-06-21
申请人： Huirong Yao , Guanyang Lin , Zachary Bogusz , PingHung Lu , WooKyu Kim , Mark Neisser
发明人： Huirong Yao , Guanyang Lin , Zachary Bogusz , PingHung Lu , WooKyu Kim , Mark Neisser
CPC分类号： C08K5/0091 , G03F7/091 , G03F7/094 , C08L33/16 , C08L101/06
摘要： The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
摘要翻译： 本发明涉及包含聚合物，有机钛酸盐化合物和任选的热酸发生剂的底层组合物，其中聚合物包含至少一个氟代醇基团和至少一个环氧基团。 本发明还涉及使用该底层材料作为抗反射涂料组合物和/或用于图案转印的硬掩模的方法。
-
公开(公告)号：US20100092895A1
公开(公告)日：2010-04-15
申请号：US12449735
申请日：2008-02-25
申请人： Ruzhi Zhang , Wookyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neissor , Ralph R. Dammel , Ari Karkkainen
发明人： Ruzhi Zhang , Wookyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neissor , Ralph R. Dammel , Ari Karkkainen
CPC分类号： C08G77/045 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3124
摘要： A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.
摘要翻译： 包含具有至少一个Si-OH基团和至少一个Si-OR基团的硅氧烷聚合物的聚合物，其中R是任选具有反应性官能团的缩合稳定基团，其中所述硅氧烷聚合物在置于溶剂中时具有重量 提供了通过GPC测量的在40℃下老化1周后的平均分子量增加小于或等于50％。
-
公开(公告)号：US08026040B2
公开(公告)日：2011-09-27
申请号：US11676673
申请日：2007-02-20
申请人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
发明人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
CPC分类号： C09D183/04 , C08G77/06
摘要： The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
摘要翻译： 本发明涉及一种组合物，其包含：（a）具有至少一个下式的重复单元的聚合物，其中R 1是不可水解基团，n是1至3的整数; 和（b）交联催化剂。 该组合物可用于形成低k介电常数材料，以及具有用于光刻工业的抗反射特性的硬掩模和底层材料。
-
公开(公告)号：US20080196626A1
公开(公告)日：2008-08-21
申请号：US11676673
申请日：2007-02-20
申请人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
发明人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
CPC分类号： C09D183/04 , C08G77/06
摘要： The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
摘要翻译： 本发明涉及一种组合物，其包含：（a）具有至少一个下式的重复单元的聚合物，其中R 1是不可水解基团，n是1至3的整数; 和（b）交联催化剂。 该组合物可用于形成低k介电常数材料，以及具有用于光刻工业的抗反射特性的硬掩模和底层材料。
-
公开(公告)号：US20120328990A1
公开(公告)日：2012-12-27
申请号：US13164869
申请日：2011-06-21
申请人： Huirong YAO , Guanyang LIN , Zachary BOGUSZ , PingHung LU , WooKyu KIM , Mark NEISSER
发明人： Huirong YAO , Guanyang LIN , Zachary BOGUSZ , PingHung LU , WooKyu KIM , Mark NEISSER
CPC分类号： C08K5/0091 , G03F7/091 , G03F7/094 , C08L33/16 , C08L101/06
摘要： The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
摘要翻译： 本发明涉及包含聚合物，有机钛酸盐化合物和任选的热酸发生剂的底层组合物，其中聚合物包含至少一个氟代醇基团和至少一个环氧基团。 本发明还涉及使用该底层材料作为抗反射涂料组合物和/或用于图案转印的硬掩模的方法。
-
公开(公告)号：US08017296B2
公开(公告)日：2011-09-13
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
IPC分类号： G03F7/04
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及一种有机可旋涂的抗反射涂料组合物，其包含聚合物，该聚合物包含至少一个在聚合物主链中具有3个或更多个稠合芳环的单元和至少一个在聚合物主链中具有脂族摩尔的单元。 本发明还涉及用于对本发明组合物进行成像的方法。
-
公开(公告)号：US20080292995A1
公开(公告)日：2008-11-27
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
-
8.发明申请公开(公告)号：US20060177774A1
公开(公告)日：2006-08-10
申请号：US11338462
申请日：2006-01-24
申请人： David Abdallah , Mark Neisser , Ralph Dammel , Georg Pawlowski , John Biafore , Andrew Romano , WooKyu Kim
发明人： David Abdallah , Mark Neisser , Ralph Dammel , Georg Pawlowski , John Biafore , Andrew Romano , WooKyu Kim
IPC分类号： G03C5/00
CPC分类号： G03F7/091 , Y10S430/151
摘要： A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.
摘要翻译： 一种用于对光致抗蚀剂进行成像的方法，包括以下步骤：a）在衬底上形成多层有机抗反射涂层的叠层; b）在多层有机抗反射涂层的堆叠的上层上形成光致抗蚀剂的涂层; c）用曝光设备成像曝光光致抗蚀剂; 和d）用显影剂显影涂层。
-
公开(公告)号：US08524441B2
公开(公告)日：2013-09-03
申请号：US12449735
申请日：2008-02-25
申请人： Ruzhi Zhang , WooKyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neisser , Ralph R. Dammel , Ari Karkkainen
发明人： Ruzhi Zhang , WooKyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neisser , Ralph R. Dammel , Ari Karkkainen
IPC分类号： C09D183/04
CPC分类号： C08G77/045 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3124
摘要： A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.
摘要翻译： 包含具有至少一个Si-OH基团和至少一个Si-OR基团的硅氧烷聚合物的聚合物，其中R是任选具有反应性官能团的缩合稳定基团，其中所述硅氧烷聚合物在置于溶剂中时具有重量 提供了通过GPC测量的在40℃下老化1周后的平均分子量增加小于或等于50％。
-
-
-
-
-
-
-
-
搜索结果
9 条记录 (耗时 0.013 秒)
