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发明申请
US20060177774A1 Process of imaging a photoresist with multiple antireflective coatings 失效
用多个抗反射涂层成像光致抗蚀剂的工艺

Process of imaging a photoresist with multiple antireflective coatings
摘要：
A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.
摘要（中）：

一种用于对光致抗蚀剂进行成像的方法，包括以下步骤：a）在衬底上形成多层有机抗反射涂层的叠层; b）在多层有机抗反射涂层的堆叠的上层上形成光致抗蚀剂的涂层; c）用曝光设备成像曝光光致抗蚀剂; 和d）用显影剂显影涂层。

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