公开(公告)号：US08285025B2

公开(公告)日：2012-10-09

申请号：US12055052

申请日：2008-03-25

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: G06K9/03

CPC classification number: G01N21/8806 ,  G01B11/245 ,  G01B11/25 ,  G01N2021/887 ,  G06T7/0006 ,  G06T2207/10012 ,  G06T2207/30164

Abstract: An improved method and apparatus for detecting problems with fit and finish of manufactured articles is presented which uses structured light. Two or more structured light images acquired from opposing directions is used to measure the fit of mating surfaces while avoiding false positives caused by small defects near the seam.

Abstract translation: 提出了一种改进的用于检测制品的配合和完成问题的方法和装置，其使用结构化的光。 使用从相对方向获取的两个或多个结构化光图像来测量配合表面的配合，同时避免由接缝附近的小缺陷引起的误报。

公开(公告)号：US07725024B2

公开(公告)日：2010-05-25

申请号：US11483133

申请日：2006-07-07

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: G01N21/01

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8822 ,  G02B13/22

Abstract: Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

Abstract translation: 提供了用于对诸如半导体晶片的平面镜面物体进行成像的系统和方法。 在一个实施例中，用于对平面镜面物体上的缺陷进行成像的成像系统包括具有足够非球面的远心透镜，使得远心透镜基本上被校正为光学像差。 该成像系统还包括一个远心止动件，其中包括一个孔，以阻挡从该平面镜面物体反射的光，同时允许从该缺陷反射的光通过该孔。 成像系统还包括具有定位在远心止动件和透镜组之间的系统止动件的透镜组。 对于与远心透镜无关的光学像差，基本上校正了透镜组。

公开(公告)号：US20090245614A1

公开(公告)日：2009-10-01

申请号：US12055052

申请日：2008-03-25

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: G06K9/03

CPC classification number: G01N21/8806 ,  G01B11/245 ,  G01B11/25 ,  G01N2021/887 ,  G06T7/0006 ,  G06T2207/10012 ,  G06T2207/30164

Abstract: An improved method and apparatus for detecting problems with fit and finish of manufactured articles is presented which uses structured light. Two or more structured light images acquired from opposing directions is used to measure the fit of mating surfaces while avoiding false positives caused by small defects near the seam.

Abstract translation: 提出了一种改进的用于检测制品的配合和完成问题的方法和装置，其使用结构化的光。 使用从相对方向获取的两个或多个结构化光图像来测量配合表面的配合，同时避免由接缝附近的小缺陷引起的误报。

公开(公告)号：US07862207B2

公开(公告)日：2011-01-04

申请号：US12464320

申请日：2009-05-12

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: F21V21/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8822 ,  G02B13/22

Abstract: Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

Abstract translation: 提供了用于对诸如半导体晶片的平面镜面物体进行成像的系统和方法。 在一个实施例中，用于对平面镜面物体上的缺陷进行成像的成像系统包括具有足够非球面的远心透镜，使得远心透镜基本上被校正为光学像差。 该成像系统还包括一个远心止动件，其中包括一个孔，以阻挡从该平面镜面物体反射的光，同时允许从该缺陷反射的光通过该孔。 成像系统还包括具有定位在远心止动件和透镜组之间的系统止动件的透镜组。 对于与远心透镜无关的光学像差，基本上校正了透镜组。

公开(公告)号：US20090225539A1

公开(公告)日：2009-09-10

申请号：US12464320

申请日：2009-05-12

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: F21S2/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8822 ,  G02B13/22

Abstract: Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

Abstract translation: 提供了用于对诸如半导体晶片的平面镜面物体进行成像的系统和方法。 在一个实施例中，用于对平面镜面物体上的缺陷进行成像的成像系统包括具有足够非球面的远心透镜，使得远心透镜基本上被校正为光学像差。 该成像系统还包括一个远心止动件，其中包括一个孔，以阻挡从该平面镜面物体反射的光，同时允许从该缺陷反射的光通过该孔。 成像系统还包括具有定位在远心止动件和透镜组之间的系统止动件的透镜组。 对于与远心透镜无关的光学像差，基本上校正了透镜组。

公开(公告)号：US20090219518A1

公开(公告)日：2009-09-03

申请号：US12464475

申请日：2009-05-12

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: G01B11/26

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8822 ,  G02B13/22

Abstract: Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

公开(公告)号：US07929857B2

公开(公告)日：2011-04-19

申请号：US12464475

申请日：2009-05-12

Applicant: Leo Baldwin ,  Joseph J. Emery

Inventor： Leo Baldwin ,  Joseph J. Emery

IPC: G03B43/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8822 ,  G02B13/22

Abstract: Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

公开(公告)号：US08642918B2

公开(公告)日：2014-02-04

申请号：US13494839

申请日：2012-06-12

Applicant: Mark A. Unrath ,  Peter Pirogovsky ,  Leo Baldwin

Inventor： Mark A. Unrath ,  Peter Pirogovsky ,  Leo Baldwin

IPC: B23K26/06 ,  B23K26/073

CPC classification number: B23K26/0676 ,  B23K26/0613 ,  B23K26/066 ,  B23K26/705

Abstract: A laser processing system quickly and flexibly modifies a processing beam to determine and implement an improved or optimum beam profile for a particular application (or a subset of the application). The system reduces the sensitivity of beam shaping subsystems to variations in the laser processing system, including those due to manufacturing tolerances, thermal drift, variations in component performance, and other sources of system variation. Certain embodiments also manipulate lower quality laser beams (higher M2 values) to provide acceptable shaped beam profiles.

Abstract translation: 激光处理系统快速且灵活地修改处理光束，以确定并实现特定应用（或应用的子集）的改进或最佳光束简档。 该系统降低了光束成形子系统对激光加工系统变化的敏感性，包括由制造公差，热漂移，部件性能变化以及其他系统变化来源引起的偏差。 某些实施例还操纵较低质量的激光束（较高的M2值）以提供可接受的成形梁轮廓。

公开(公告)号：US08259203B2

公开(公告)日：2012-09-04

申请号：US12328881

申请日：2008-12-05

Applicant: Leo Baldwin

Inventor： Leo Baldwin

IPC: H04N9/083 ,  H04N3/14 ,  H04N5/335 ,  H04N9/04 ,  H04N9/73 ,  H04N9/68

CPC classification number: H04N9/045 ,  G03B17/00 ,  H04N5/332

Abstract: A method and apparatus for achieving monochromatic response from a low-cost color imager are presented. In this method and apparatus, the out-of-band response to infrared (IR) light by solid state sensors is exploited to produce a monochrome image. The monochrome image is produced by omitting the IR blocking filter from the sensor of the color imager and illuminating the scene to be imaged including IR radiation from an LED. The wavelength emitted from the LED is matched to the wavelength or wavelengths that correspond to a region where the sensor's response to IR light is relatively even, despite the color-mosaic filter permanently attached to the sensor.

Abstract translation: 提出了一种从低成本彩色成像仪获得单色响应的方法和装置。 在这种方法和装置中，利用固态传感器对红外（IR）光的带外响应来产生单色图像。 单色图像是通过从彩色成像器的传感器中省略IR阻挡滤光器并照射包括来自LED的IR辐射的待成像场景来产生的。 从LED发出的波长与对应于传感器对IR光的反应相对均匀的区域的波长或波长相匹配，尽管颜色马赛克滤光片永久地附着在传感器上。

公开(公告)号：US20090242526A1

公开(公告)日：2009-10-01

申请号：US12056154

申请日：2008-03-26

Applicant: Leo Baldwin

Inventor： Leo Baldwin

IPC: B23K26/38

CPC classification number: B23K26/0624 ,  B23K26/082 ,  B23K26/0861 ,  B23K26/361 ,  B23K26/364 ,  B23K26/40 ,  B23K26/60 ,  B23K37/06 ,  B23K2103/50

Abstract: A small feature at a target location on a working surface of a workpiece is laser machined. A laser beam propagating along a beam path is directed for incidence at the target location on the working surface to machine the small feature. A focusing lens sized to converge the laser beam on the working surface is set in the beam path at a short working distance from the working surface to laser machine the small feature and thereby eject target material from the workpiece back toward the focusing lens. A sacrificial protective member positioned between the focusing lens and the working surface transmits without appreciable distortion or adsorption the laser beam focused by the focusing lens and incident on the working surface. The sacrificial protective member intercepts the ejected target material to prevent a sufficient amount of it from reaching and thereby appreciably contaminating the focusing lens.

Abstract translation: 激光加工工件工作表面上目标位置的小特征。 沿着光束路径传播的激光束被引导以在工作表面上的目标位置入射以加工该小特征。 将激光束聚焦在工作表面上的聚焦透镜设置在光束路径上，距离工作表面到激光机的工作距离小，从而将目标材料从工件返回到聚焦透镜。 定位在聚焦透镜和工作表面之间的牺牲保护构件透过聚焦透镜聚焦的激光束并且入射到工作表面上而没有明显变形或吸附。 牺牲保护构件拦截喷射的目标材料，以防止其足够的量到达，从而明显地污染聚焦透镜。