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公开(公告)号：US09721763B2
公开(公告)日：2017-08-01
申请号：US14753738
申请日：2015-06-29
IPC分类号： F16K11/16 , H01J37/32 , G05D11/13 , G05D7/06 , C23C16/455 , C23C16/513 , H01L21/67
CPC分类号： H01J37/32449 , C23C16/45561 , C23C16/513 , G05D7/06 , G05D7/0658 , G05D11/132 , H01J2237/332 , H01J2237/334 , H01L21/67069 , Y10T137/0324 , Y10T137/7722
摘要： A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.
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2.发明申请GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL 审中-公开气体输送装置，包括用于气体流量控制的气体分离器公开(公告)号：US20160111258A1
公开(公告)日：2016-04-21
申请号：US14886458
申请日：2015-10-19
发明人： Mark Taskar , Iqbal Shareef , Anthony Zemlock , Ryan Bise , Nathan Kugland
IPC分类号： H01J37/32 , H01L21/67 , C23C14/22 , C23C16/50 , C23C16/455
CPC分类号： H01J37/3244 , C23C14/22 , C23C16/45544 , C23C16/45561 , C23C16/45565 , C23C16/50 , C23C16/52 , H01J37/32009 , H01J37/32449 , H01L21/31116 , H01L21/67069
摘要： A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.
摘要翻译： 用于通过至少第一，第二和第三气体注入区域引入的气体处理衬底的等离子体处理系统的气体供应输送装置包括工艺气体供应入口和调节气体入口。 混合歧管包括与工艺气体供应流体连通的气棒和与调节气体供应流体连通的调节气棒。 第一气体出口将气体输送到第一气体注入区域，第二气体出口将气体输送到第二气体注入区域，而第三气体出口将气体输送到第三气体注入区域。 气体分配器与混合歧管流体连通，并且包括第一阀装置，其将离开混合歧管的混合气体分解成供应到第一气体出口的第一混合气体和供应到第二气体出口的第二混合气体，和/或 第三个出口。
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3.发明授权公开(公告)号：US09090972B2
公开(公告)日：2015-07-28
申请号：US13732054
申请日：2012-12-31
IPC分类号： F16K11/16 , C23C16/455 , G05D11/13 , G05D7/06
CPC分类号： H01J37/32449 , C23C16/45561 , C23C16/513 , G05D7/06 , G05D7/0658 , G05D11/132 , H01J2237/332 , H01J2237/334 , H01L21/67069 , Y10T137/0324 , Y10T137/7722
摘要： A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers.
摘要翻译： 一种用于向衬底处理室提供一组工艺气体的气体供应子系统，该组工艺气体是可用于衬底处理室的多个工艺气体的子集。 气体供应子系统具有比可用的工艺气体的数量少的多气体质量流量控制器，其中多个处理气体在多个气体质量流量控制器的一个或多个的输入处被多路复用。 可以采用泵清洗来提高多气体质量流量控制器的气体切换速度。
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公开(公告)号：US10943769B2
公开(公告)日：2021-03-09
申请号：US16040326
申请日：2018-07-19
发明人： Mark Taskar , Iqbal A. Shareef
摘要： Apparatus and methods for distributing and mixing gas are provided. In one example, a gas distributor comprises a body, a gas inlet for admitting gas to the body, an orbital array of gas outlets for distributing the gas to an external component, and a central gas distribution point disposed within the body at a center of the orbital array of gas outlets and in fluid communication with the orbital array of gas outlets.
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公开(公告)号：US10431431B2
公开(公告)日：2019-10-01
申请号：US14886458
申请日：2015-10-19
发明人： Mark Taskar , Iqbal Shareef , Anthony Zemlock , Ryan Bise , Nathan Kugland
IPC分类号： H01J37/32 , C23C16/455 , C23C16/52 , C23C14/22 , H01L21/67 , C23C16/50 , H01L21/311
摘要： A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.
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公开(公告)号：US09704761B2
公开(公告)日：2017-07-11
申请号：US14489148
申请日：2014-09-17
发明人： Mark Taskar , Iqbal Shareef , Anthony Zemlock
CPC分类号： H01L22/10 , H01L21/67017
摘要： A corrosion sensor retainer assembly and method for predicting and detecting corrosion within a gas delivery system of a semiconductor substrate processing apparatus. The corrosion sensor retainer assembly comprises a laminate that includes a first insulating layer with a first port and a second insulating layer with a second port, wherein the first port and the second port are configured to retain a seal. The corrosion sensor retainer assembly includes a conductor housed within the laminate. The conductor forms a path that extends around the first port and the second port. At least a portion of the conductor has an exposed surface with a property that changes in the presence of corrosive gas or acid.
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7.发明授权Cluster mass flow devices and multi-line mass flow devices incorporating the same 有权集群质量流量装置和结合其的多线质量流量装置公开(公告)号：US09335768B2
公开(公告)日：2016-05-10
申请号：US14025162
申请日：2013-09-12
发明人： Mark Taskar , Iqbal Shareef
CPC分类号： G05D7/0641 , F16K27/003 , G05D7/0652 , Y10T137/2499
摘要： A multi-line mass flow device configured for controlled delivery of two or more fluids into a process chamber. The multi-line mass flow device comprises a cluster mass flow control manifold and a multi-inlet manifold. The cluster mass flow control manifold comprises a controller, a gas manifold mounting block, and two or more gas flow control stations. The multi-inlet manifold comprises a multi-inlet mounting block, and two or more isolation valves mounted on the multi-inlet mounting block.
摘要翻译： 多线质量流量装置，被配置为将两种或多种流体控制输送到处理室中。 多线质量流量装置包括集束质量流量控制歧管和多入口歧管。 集群质量流量控制歧管包括控制器，气体歧管安装块和两个或更多个气体流量控制站。 多入口歧管包括多入口安装块和安装在多入口安装块上的两个或更多隔离阀。
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公开(公告)号：US11532460B2
公开(公告)日：2022-12-20
申请号：US17165923
申请日：2021-02-02
发明人： Mark Taskar , Iqbal A. Shareef
摘要： In some examples, a gas mixer comprises a body and an orbital array of gas inlets for receiving one or more constituents of a mixed gas. A mixed gas outlet emits a mixed gas from the body and is disposed at a center of the orbital array of gas inlets. A central gas mixing point, separate from the mixed gas outlet, comprises an internal volume disposed within the body and is surrounded by the orbital array of gas inlet. The internal volume is in fluid communication with the orbital array of gas inlets via a corresponding array of gas pathways extending from the internal volume to each of the gas inlets. Each gas path length of the respective gas pathways is the same. Control circuitry is configured to control gas flow rate within each of the gas pathways individually.
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公开(公告)号：US10128087B2
公开(公告)日：2018-11-13
申请号：US14680244
申请日：2015-04-07
发明人： Mark Taskar , Iqbal Shareef
摘要： A gas delivery apparatus for supplying process gas to a processing chamber of a plasma processing apparatus includes a mixing manifold having a plurality of gas inlets on a surface thereof, the gas inlets being equally spaced from a center mixing point of the mixing manifold; and optionally a plurality of gas supplies in communication with the plurality of gas inlets on the surface of the mixing manifold. A method of supplying gas to a processing chamber of a plasma processing apparatus using such a gas delivery apparatus involves providing a plurality of gas supplies in communication with a plurality of gas inlets on a surface of a mixing manifold; flowing at least two different gases from the plurality of gas supplies to the mixing manifold to create a first mixed gas; and supplying the first mixed gas to a plasma processing chamber coupled downstream of the mixing manifold.
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公开(公告)号：US20200027702A1
公开(公告)日：2020-01-23
申请号：US16040326
申请日：2018-07-19
发明人： Mark Taskar , Iqbal A. Shareef
IPC分类号： H01J37/32
摘要： Apparatus and methods for distributing and mixing gas are provided. In one example, a gas distributor comprises a body, a gas inlet for admitting gas to the body, an orbital array of gas outlets for distributing the gas to an external component, and a central gas distribution point disposed within the body at a center of the orbital array of gas outlets and in fluid communication with the orbital array of gas outlets.
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