CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING

    公开(公告)号:US20220190854A1

    公开(公告)日:2022-06-16

    申请号:US17594906

    申请日:2020-04-30

    IPC分类号: H04B1/04 G01R27/06 H01J37/32

    摘要: An apparatus and method for performing closed-loop multiple-output control of radio frequency (RF) matching for a semiconductor wafer fabrication process is provided. An apparatus for providing signals to a station of a process chamber performs semiconductor fabrication processes. A plurality of signal generators generates signals having first and second frequencies. A measurement circuit measures a voltage standing wave ratio (VSWR). A match reflection optimizer has a reactive component configured to be adjusted responsive to an output signal from the measurement circuit.

    Radio frequency (RF) signal source supplying RF plasma generator and remote plasma generator

    公开(公告)号:US11557460B2

    公开(公告)日:2023-01-17

    申请号:US17258584

    申请日:2019-07-08

    IPC分类号: H01J37/32

    摘要: A multi-signal radio frequency (RF) source includes an RF source; and a switch including an input in communication with an output of the RF source, a first output and a second output. The switch is configured to selectively connect the input to one of the first output and the second output. An RF generator in communication with the first output of the multi-signal RF source is configured to generate plasma in a processing chamber. A remote plasma generator in communication with the second output of the multi-signal RF source is configured to supply remote plasma to the processing chamber.