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公开(公告)号：US20190115190A1
公开(公告)日：2019-04-18
申请号：US15786497
申请日：2017-10-17
摘要： Methods and systems for controlling glow discharge in a plasma chamber are disclosed. An example apparatus includes a chamber having chamber walls connected to ground and a radio frequency (RF) power supply. A top electrode is connected to the RF power supply and a bottom electrode connected to the RF power supply. A phase change control is connected to an output of the RF power supply for controlling a first phase of an RF signal supplied by the RF power supply to the top electrode and a second phase of the RF signal supplied by the RF power supply to the bottom electrode. A controller is in communication with the phase change control for adjusting a phase difference between the first phase and the second phase to adjust a position of a plasma glow discharge within the chamber.
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公开(公告)号：US20180350643A1
公开(公告)日：2018-12-06
申请号：US16057705
申请日：2018-08-07
发明人： Sunil Kapoor , Yaswanth Rangineni , Aaron Bingham , Tuan Nguyen
IPC分类号： H01L21/67 , H01J37/32 , H01L21/02 , H01L21/3065
CPC分类号： H01L21/67253 , H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/3244 , H01J37/32568 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H01L21/02274 , H01L21/3065
摘要： A plasma processing system having a plurality of stations is provided. Each station has a substrate support and a showerhead for supplying process gases. A radio frequency (RF) power supply and a distribution system is provided, where the distribution system is coupled to the RF power supply. A plurality of voltage probes is provided. Each of the plurality of voltage probes is connected in-line between the distribution system and each showerhead of each of the stations. A controller is configured to receive sensed voltage values from each of the plurality of voltage probes and compare the sensed voltage values against a plurality of voltage check bands. Each voltage check band is predefined for a process operation, and the controller is configured to generate an alert when the comparing detects that a sensed voltage value is outside of a voltage check band. The alert is configured to identify a type of fault based on the voltage check band and identify a specific one of the plurality of stations having said type of fault.
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公开(公告)号：US10777386B2
公开(公告)日：2020-09-15
申请号：US15786497
申请日：2017-10-17
摘要： Methods for controlling glow discharge in a plasma chamber are disclosed. One method includes connecting a radio frequency (RF) generator to a top electrode of a chamber, the chamber having chamber walls coupled to ground and connecting the RF generator to a bottom electrode of the chamber. Identifying a process operation of deposition to be performed in the chamber and setting an RF signal from the RF generator to be supplied to the top electrode at a first phase. And, setting the RF signal from the RF generator to be supplied to the bottom electrode at a second phase. The first phase and the second phase being adjustable to a phase difference to cause the plasma glow discharge to be controllably positioned within the chamber based on the phase difference.
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公开(公告)号：US20160293385A1
公开(公告)日：2016-10-06
申请号：US15077850
申请日：2016-03-22
发明人： Sunil Kapoor , Yaswanth Rangineni , Aaron Bingham , Tuan Nguyen
IPC分类号： H01J37/32
CPC分类号： H01L21/67253 , H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/3244 , H01J37/32568 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H01L21/02274 , H01L21/3065
摘要： Methods and systems for detecting processing conditions of a plasma processing system are provided. One method includes providing radio frequency (RF) power from an RF power supply to a showerhead of the plasma processing system and running a process operation on a substrate disposed in the plasma processing system. The method further includes sensing a voltage the showerhead using a voltage probe that is connected in-line between the RF power supply and the showerhead. The sensing of the voltage produces voltage values during the running of the process operation. The method includes comparing the voltage values against a voltage check band that is predefined for the process operation being run. The comparing is configured to detect when the voltage values are outside of the voltage check band. The method also includes generating an alert when the comparing detects that the voltage values are outside of the voltage check band. The alert further configured to identify a type of fault based on the voltage check band that was predefined for the process operation.
摘要翻译： 提供了一种用于检测等离子体处理系统的处理条件的方法和系统。 一种方法包括从RF电源向等离子体处理系统的喷头提供射频（RF）功率，并且在布置在等离子体处理系统中的衬底上运行处理操作。 该方法还包括使用在RF电源和喷头之间在线连接的电压探头感测喷头的电压。 电压检测在工艺运行过程中产生电压值。 该方法包括将电压值与为运行的过程操作预定义的电压检查带进行比较。 该比较被配置为检测电压值何时在电压检查带之外。 该方法还包括当比较检测到电压值在电压检查带之外时产生警报。 该警报还被配置为基于为处理操作预定义的电压检查频带来识别故障类型。
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5.发明公开公开(公告)号：US20230245853A1
公开(公告)日：2023-08-03
申请号：US18174585
申请日：2023-02-24
发明人： Eller Y. Juco , Karl Frederick Leeser , David French , Sunil Kapoor , Aaron Bingham , David Alan Metz , Brett Herzig , Jacob L. Hiester , Brian Knight
IPC分类号： H01J37/32 , H01L21/687
CPC分类号： H01J37/32091 , H01L21/68785 , H01J37/32183 , H01J37/321
摘要： A circuit tuning radio frequency (RF) power. The circuit includes a low to mid frequency (LF/HF) tuning circuit including a variable LF/MF capacitor coupled in series with an LF/MF inductor. The LF/MF tuning circuit is coupled between ground and a common node configured to receive an RF input. The circuit includes a high frequency (HF) tuning circuit coupled in parallel to the LF/MF tuning circuit between ground and the common node. The HF tuning circuit includes a variable HF capacitor coupled in series with an HF inductor. Cross parallel isolation occurs between the LF/MF inductor of the LF/MF tuning circuit and the HF inductor of the HF tuning circuit when adjusting the variable LF/MF capacitor or variable HF capacitor.
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公开(公告)号：US10991550B2
公开(公告)日：2021-04-27
申请号：US16121408
申请日：2018-09-04
发明人： Eller Y. Juco , Karl Frederick Leeser , David French , Sunil Kapoor , Aaron Bingham , David Alan Metz , Brett Herzig , Jacob L. Hiester , Brian Knight
IPC分类号： H01J37/32 , H01L21/687
摘要： A circuit tuning radio frequency (RF) power. The circuit includes a low to mid frequency (LF/HF) tuning circuit including a variable LF/MF capacitor coupled in series with an LF/MF inductor. The LF/MF tuning circuit is coupled between ground and a common node configured to receive an RF input. The circuit includes a high frequency (HF) tuning circuit coupled in parallel to the LF/MF tuning circuit between ground and the common node. The HF tuning circuit includes a variable HF capacitor coupled in series with an HF inductor. Cross parallel isolation occurs between the LF/MF inductor of the LF/MF tuning circuit and the HF inductor of the HF tuning circuit when adjusting the variable LF/MF capacitor or variable HF capacitor.
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公开(公告)号：US10043690B2
公开(公告)日：2018-08-07
申请号：US15077850
申请日：2016-03-22
发明人： Sunil Kapoor , Yaswanth Rangineni , Aaron Bingham , Tuan Nguyen
IPC分类号： H01L21/67 , H01J37/32 , H01L21/02 , H01L21/3065
摘要： A method includes providing radio frequency (RF) power from an RF power supply to a showerhead of a plasma processing system running a process operation on a substrate disposed in the plasma processing system. The method senses a voltage the showerhead using a voltage probe that is connected in-line between the RF power supply and the showerhead. The sensing of the voltage produces voltage values during the running of the process operation. The method includes comparing the voltage values against a voltage check band that is predefined for the process operation being run. The comparing is configured to detect when the voltage values are outside of the voltage check band. The method generates an alert when the comparing detects that the voltage values are outside of the voltage check band. The alert identifies a type of fault based on the voltage check band that was predefined for the process operation.
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公开(公告)号：US11594397B2
公开(公告)日：2023-02-28
申请号：US17204876
申请日：2021-03-17
发明人： Eller Y. Juco , Karl Frederick Leeser , David French , Sunil Kapoor , Aaron Bingham , David Alan Metz , Brett Herzig , Jacob L. Hiester , Brian Knight
IPC分类号： H01J37/32 , H01L21/687
摘要： A circuit tuning radio frequency (RF) power. The circuit includes a low to mid frequency (LF/HF) tuning circuit including a variable LF/MF capacitor coupled in series with an LF/MF inductor. The LF/MF tuning circuit is coupled between ground and a common node configured to receive an RF input. The circuit includes a high frequency (HF) tuning circuit coupled in parallel to the LF/MF tuning circuit between ground and the common node. The HF tuning circuit includes a variable HF capacitor coupled in series with an HF inductor. Cross parallel isolation occurs between the LF/MF inductor of the LF/MF tuning circuit and the HF inductor of the HF tuning circuit when adjusting the variable LF/MF capacitor or variable HF capacitor.
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公开(公告)号：US11236422B2
公开(公告)日：2022-02-01
申请号：US16192425
申请日：2018-11-15
发明人： Michael Philip Roberts , Ramesh Chandrasekharan , Pulkit Agarwal , Aaron Bingham , Ashish Saurabh , Ravi Kumar , Jennifer Leigh Petraglia
IPC分类号： C23C16/455 , H01L21/67 , C23C16/52 , C23C16/46 , C23C16/458
摘要： A substrate processing system configured to perform a deposition process on a substrate includes a substrate support including a plurality of zones and a plurality of resistive heaters arranged throughout the plurality of zones. The plurality of resistive heaters includes separately-controllable resistive heaters arranged in respective ones of the plurality of zones. A controller is configured to, during the deposition process, control the plurality of resistive heaters to selectively adjust temperatures within the plurality of zones.
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10.发明申请公开(公告)号：US20210202208A1
公开(公告)日：2021-07-01
申请号：US17204876
申请日：2021-03-17
发明人： Eller Y. Juco , Karl Frederick Leeser , David French , Sunil Kapoor , Aaron Bingham , David Alan Metz , Brett Herzig , Jacob L. Hiester , Brian Knight
IPC分类号： H01J37/32 , H01L21/687
摘要： A circuit tuning radio frequency (RF) power. The circuit includes a low to mid frequency (LF/HF) tuning circuit including a variable LF/MF capacitor coupled in series with an LF/MF inductor. The LF/MF tuning circuit is coupled between ground and a common node configured to receive an RF input. The circuit includes a high frequency (HF) tuning circuit coupled in parallel to the LF/MF tuning circuit between ground and the common node. The HF tuning circuit includes a variable HF capacitor coupled in series with an HF inductor. Cross parallel isolation occurs between the LF/MF inductor of the LF/MF tuning circuit and the HF inductor of the HF tuning circuit when adjusting the variable LF/MF capacitor or variable HF capacitor.
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