知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

22 records (took 0.02 seconds)

    Block Copolymer Composition
    3.
    发明申请
    Block Copolymer Composition 有权

    公开(公告)号：US20210108066A1

    公开(公告)日：2021-04-15

    申请号：US16977347

    申请日：2019-03-29

    Applicant: LG Chem, Ltd.

    Inventor： Yoon Ki Hong ,  Seok Pil Sa ,  Hyun Mo Lee ,  Eun Ji Shin ,  Ki Soo Lee ,  Bun Yeoul Lee

    IPC: C08L53/00 ,  C08F212/08 ,  C08F210/14

    Abstract: A block copolymer composition is disclosed herein. In some embodiments, a block copolymer composition has a weight average molecular weight (Mw) of 70,000 g/mol to 120,000 g/mol, a polydispersity index (PDI) of 1.0 to 2.0, a glass transition temperature (Tg) of −55° C. to −30° C., and a melt index (MI), measured at 230° C. and a loading condition of 5 kg, of 0.2 g/10 minutes to 3.0 g/10 minutes. The block copolymer composition has excellent processability.

    Block Copolymer Composition
    5.
    发明申请
    Block Copolymer Composition 有权

    公开(公告)号：US20210017377A1

    公开(公告)日：2021-01-21

    申请号：US16976236

    申请日：2019-03-29

    Applicant: LG Chem, Ltd.

    Inventor： Eun Ji Shin ,  Ki Soo Lee ,  Seok Pil Sa ,  Yoon Ki Hong ,  Bun Yeoul Lee

    IPC: C08L53/00 ,  C08F10/14 ,  C08F4/44 ,  C08F297/02 ,  C08L25/06 ,  C08L25/08

    Abstract: A block copolymer composition is disclosed herein. In some embodiments, the block copolymer composition includes a diblock copolymer and a triblock copolymer which each include a polyolefin-based block and a polystyrene-based block. A content of the diblock copolymer is less than or equal to 19% by weight, based on the total weight of the block copolymer composition, the polyolefin-based block includes a repeating unit represented by Formula 1, and the polystyrene-based block includes one or more selected from the group consisting of Formulas 2 and 3.

    Method for Producing Block Copolymer Composition
    6.
    发明申请
    Method for Producing Block Copolymer Composition 有权

    公开(公告)号：US20210002303A1

    公开(公告)日：2021-01-07

    申请号：US16977180

    申请日：2019-03-29

    Applicant: LG Chem, Ltd.

    Inventor： Seok Pil Sa ,  Eun Ji Shin ,  Yoon Ki Hong ,  Hyun Mo Lee ,  Ki Soo Lee ,  Bun Yeoul Lee

    IPC: C07F3/06 ,  C08F293/00

    Abstract: A method for producing a block copolymer composition including a diblock copolymer and a triblock copolymer each containing a polyolefin-based block and a polystyrene-based block is disclosed herein. In some embodiments, the method includes reacting an organic zinc compound with one or more kinds of olefin-based monomers in the presence of a transition metal catalyst to form an intermediate having an olefin-based polymer block, reacting the intermediate styrene-based monomer in the presence of an alkyllithium compound to form a product having a styrene-based polymer block, and reacting the product with water, oxygen, or an organic acid to form a block copolymer wherein the number of moles of the alkyllithium compound used to form the product is larger than the number of moles of the organic zinc compound used to form the intermediate.

    Block copolymer composition
    9.
    发明授权
    Block copolymer composition 有权

    公开(公告)号：US11414541B2

    公开(公告)日：2022-08-16

    申请号：US16976236

    申请日：2019-03-29

    Applicant: LG Chem, Ltd.

    Inventor： Eun Ji Shin ,  Ki Soo Lee ,  Seok Pil Sa ,  Yoon Ki Hong ,  Bun Yeoul Lee

    IPC: C08L53/00 ,  C08F293/00 ,  C08F4/44 ,  C08F10/14 ,  C08L25/06 ,  C08L25/08 ,  C08F210/14 ,  C08F212/08 ,  C07F3/06 ,  C08F297/02

    Abstract: A block copolymer composition is disclosed herein. In some embodiments, the block copolymer composition includes a diblock copolymer and a triblock copolymer each including a polyolefin-based block and a polystyrene-based block. The diblock copolymer is present at less than or equal to 19% , based on total weight of the block copolymer composition, the polyolefin-based block includes a repeating unit represented by Formula 1, and the polystyrene-based block includes one or more of Formulas 2 and 3: wherein R1 is hydrogen, C3 to C20 alkyl, or C3 to C20 alkyl substituted with silyl, R2 and R3 are each independently C6 to C20 aryl, or C6 to C20 aryl substituted with halogen, C1 to C12 alkyl, or C3 to C12 cycloalkyl, n is an integer from 1 to 10,000, and l and m are each independently an integer from 10 to 1,000.

Patent Agency Ranking