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1.
公开(公告)号:US20200233302A1
公开(公告)日:2020-07-23
申请号:US16488515
申请日:2018-09-14
Applicant: LG CHEM, LTD.
Inventor: Min Young LIM , Ji Hye KIM , Yongmi KIM
Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.
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公开(公告)号:US20180226590A1
公开(公告)日:2018-08-09
申请号:US15750983
申请日:2016-10-27
Applicant: LG CHEM, LTD.
Inventor: Ji Hye KIM , Sung-Ho CHUN , Jung Ha PARK , Chan Yeup CHUNG , Tae Seob LEE
CPC classification number: H01L51/0077 , C07F7/24 , H01L51/0007 , H01L51/0026 , H01L51/005 , H01L51/0056 , H01L51/006 , H01L51/422 , H01L51/4226 , H01L2031/0344 , Y02E10/549
Abstract: The present invention relates to a method for preparing a perovskite compound usable as a light absorber of a solar cell, and provides a method for preparing a light absorber of a solar cell in which the crystallinity of a perovskite compound is increased, resulting in an increase in the stability and efficiency of the solar cell.
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公开(公告)号:US20220093873A1
公开(公告)日:2022-03-24
申请号:US17420190
申请日:2020-01-31
Applicant: LG CHEM, LTD.
Inventor: Ji Hye KIM , Sung Kil HONG , Minseung CHUN , Dong Uk HEO , Yeon Hwan KIM , Sang Duk SUH
IPC: H01L51/00
Abstract: Provided is an organic light emitting device having an excellent balance between luminous efficiency and lifespan, the organic light emitting device including: an anode; a cathode positioned opposite to the anode; a light emitting layer positioned between the anode and the cathode; a hole transport layer positioned between the anode and the light emitting layer; and an electron transport layer positioned between the light emitting layer and the cathode, wherein the electron transport layer includes a metal complex compound and an electron transport material having a heterogeneous electron transfer rate constant (K) of 1.2 to 1.65, and the heterogeneous electron transfer rate constant (K) is calculated by the following Mathematical Equation 1: K = k d + k a 2 〈 Mathematical Equation 1 〉 wherein in Mathematical Equation 1: kd (donating k) is an electron donating rate constant and ka (accepting k) is an electron accepting rate constant.
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公开(公告)号:US20200209740A1
公开(公告)日:2020-07-02
申请号:US16626091
申请日:2018-11-05
Applicant: LG CHEM, LTD.
Inventor: Eun Seok PARK , Min Young LIM , Ji Hye KIM
IPC: G03F7/033 , G03F7/039 , C08F220/18
Abstract: The present invention relates to a photoresist composition capable of realizing excellent pattern performance during formation of fine patterns, and of preparing a photoresist film that is excellent in chemical stability of a plating solution, and a photoresist film using the same.
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5.
公开(公告)号:US20200033724A1
公开(公告)日:2020-01-30
申请号:US16337280
申请日:2018-04-03
Applicant: LG CHEM, LTD.
Inventor: Min Young LIM , Tae Seob LEE , Ji Hye KIM
IPC: G03F7/004 , G03F7/039 , C07D221/14
Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.
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公开(公告)号:US20220231281A1
公开(公告)日:2022-07-21
申请号:US17609555
申请日:2020-07-20
Applicant: LG Chem, Ltd.
Inventor: Jun Ho EOM , Dong Joon AHN , Chae Jin LIM , Ji Hye KIM , Byoung Hun JUNG
Abstract: A positive electrode material, a positive electrode including the same, a lithium battery including the same, and a method of preparing the same are disclosed herein. In some embodiments, a method of preparing a positive electrode active material including forming a first coating layer on a surface of a lithium transition metal oxide represented by Formula 1 using a basic aqueous solution containing a coating element M1 (where M1 includes at least one selected from sodium (Na) and aluminum (Al)), dry-mixing the lithium transition metal oxide having the first coating layer formed on a surface thereof, and a raw material containing a coating element M2 (where M2 includes boron (B)) and heat treating the mixture to form a second coating layer.
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公开(公告)号:US20210011379A1
公开(公告)日:2021-01-14
申请号:US16498829
申请日:2018-07-25
Applicant: LG CHEM, LTD.
Inventor: Min Young LIM , Tae Seob LEE , Ji Hye KIM
Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
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公开(公告)号:US20210363075A1
公开(公告)日:2021-11-25
申请号:US16625333
申请日:2018-07-20
Applicant: LG CHEM, LTD.
Inventor: Sung Kyun KIM , Sung Kyu LEE , Yong Mann BEYUN , Joon Ho SHIN , Ji Hye KIM
Abstract: A method for separating and refining 1-butene with a high purity and a high yield from a raffinate-2 stream. The method includes: feeding raffinate-2 to a first distillation column; obtaining heavy raffinate-3 from a lower part of the first distillation column; recovering an upper part fraction containing 1-butene from an upper part of the first distillation column; feeding the upper part fraction containing 1-butene to a second distillation column; recovering a first lower part fraction rich in 1-butene from a lower part of the second distillation column and light raffinate-3 from an upper part of the second distillation column. Heat of the upper part fraction recovered from the upper part of the first distillation column is fed to the lower part of the second distillation column through a first heat exchanger. Thus, 1-butene is obtained with high purity and high yield while maximizing an energy recovery amount by double-effect distillation.
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公开(公告)号:US20190384176A1
公开(公告)日:2019-12-19
申请号:US16480572
申请日:2018-10-25
Applicant: LG CHEM, LTD.
Inventor: Min Young LIM , Yongmi KIM , Ji Hye KIM
IPC: G03F7/039 , G03F7/033 , C07D249/04 , C08K5/3472
Abstract: A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.
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10.
公开(公告)号:US20190146338A1
公开(公告)日:2019-05-16
申请号:US16091263
申请日:2018-03-16
Applicant: LG CHEM, LTD.
Inventor: Min Young LIM , Tae Seob LEE , Ji Hye KIM
Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.
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