公开(公告)号：US20210151297A1

公开(公告)日：2021-05-20

申请号：US17162097

申请日：2021-01-29

Applicant: LAM RESEARCH CORPORATION

Inventor： Jack CHEN ,  Adam LIRON ,  Gregory SEXTON

IPC: H01J37/32 ,  H01L21/02 ,  H01L21/67

Abstract: A tunable upper plasma exclusion zone (PEZ) ring adjusts a distance of plasma during processing in a processing chamber and includes: a lower surface that includes: a horizontal portion; and an upwardly tapered outer portion that is conical and that extends outwardly and upwardly from the horizontal portion at an upward taper angle of about 5° to 50° with respect to the horizontal portion, where an outer diameter of the upwardly tapered outer portion is greater than 300 millimeters (mm), and where an inner diameter where the upwardly tapered outer portion begins to extend upwardly is less than 300 mm. A controller is to, during processing of a 300 mm circular substrate, adjust the distance of plasma for treatment of the 300 mm circular substrate at least one of radially inward and radially outward using the tunable upper PEZ ring.

公开(公告)号：US20230402257A1

公开(公告)日：2023-12-14

申请号：US18237856

申请日：2023-08-24

Applicant: LAM RESEARCH CORPORATION

Inventor： Jack CHEN ,  Adam LIRON ,  Gregory SEXTON

IPC: H01J37/32 ,  H01L21/02 ,  H01L21/67

CPC classification number: H01J37/32385 ,  H01L21/02087 ,  H01J37/32642 ,  H01L21/67069 ,  H01J37/32091 ,  Y10T29/49817

Abstract: A tunable upper plasma exclusion zone (PEZ) ring adjusts a distance of plasma during processing in a processing chamber and includes: a lower surface that includes: a horizontal portion; and an upwardly tapered outer portion that is conical and that extends outwardly and upwardly from the horizontal portion at an upward taper angle of about 5° to 50° with respect to the horizontal portion, where an outer diameter of the upwardly tapered outer portion is greater than 300 millimeters (mm), and where an inner diameter where the upwardly tapered outer portion begins to extend upwardly is less than 300 mm. A controller is to, during processing of a 300 mm circular substrate, adjust the distance of plasma for treatment of the 300 mm circular substrate at least one of radially inward and radially outward using the tunable upper PEZ ring.