公开(公告)号：US11769667B2

公开(公告)日：2023-09-26

申请号：US17009491

申请日：2020-09-01

申请人： KIOXIA CORPORATION

发明人： Takeshi Higuchi

IPC分类号： H01L21/027 ,  G03F7/00

CPC分类号： H01L21/0271 ,  G03F7/0002 ,  Y10T428/24628

摘要： According to one embodiment, a template for nanoimprint lithography includes a substrate having a main surface and a mesa structure on the main surface. The mesa structure has an upper surface that can be patterned with recesses or the like. A film containing a quantum dot or quantum dots is on the main surface other than the upper surface of the mesa structure. The quantum dot can absorb ultraviolet light and emit visible light.

公开(公告)号：US20230194406A1

公开(公告)日：2023-06-22

申请号：US17841819

申请日：2022-06-16

申请人： Kioxia Corporation

发明人： Kasumi OKABE ,  Takeshi Higuchi

IPC分类号： G01N15/08

CPC分类号： G01N15/082 ,  G01N15/0806 ,  G01N2015/0846

摘要： A measuring method includes: placing resist 20 on a surface of a test film; pressing a template 30 against the resist 20 placed on the surface of the test film; measuring a size of a void formed in the resist 20 after pressing the template 30 against the resist 20; and determining gas permeability of the test film based on the size of the void.

公开(公告)号：US11852985B2

公开(公告)日：2023-12-26

申请号：US17466259

申请日：2021-09-03

申请人： Kioxia Corporation

发明人： Takeshi Higuchi ,  Anupam Mitra ,  Takahiro Iwasaki

IPC分类号： G03F9/00 ,  G03F7/00 ,  G03F7/16 ,  G03F7/09 ,  G03F7/004 ,  G03F7/20 ,  G03F7/038

CPC分类号： G03F9/7042 ,  G03F7/0042 ,  G03F7/0382 ,  G03F7/094 ,  G03F7/161 ,  G03F7/162 ,  G03F7/2018 ,  G03F7/70208

摘要： An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.

公开(公告)号：US20210287899A1

公开(公告)日：2021-09-16

申请号：US17009491

申请日：2020-09-01

申请人： KIOXIA CORPORATION

发明人： Takeshi Higuchi

IPC分类号： H01L21/027 ,  G03F7/00

摘要： According to one embodiment, a template for nanoimprint lithography includes a substrate having a main surface and a mesa structure on the main surface. The mesa structure has an upper surface that can be patterned with recesses or the like. A film containing a quantum dot or quantum dots is on the main surface other than the upper surface of the mesa structure. The quantum dot can absorb ultraviolet light and emit visible light.

公开(公告)号：US12072273B2

公开(公告)日：2024-08-27

申请号：US17841819

申请日：2022-06-16

申请人： Kioxia Corporation

发明人： Kasumi Okabe ,  Takeshi Higuchi

IPC分类号： G01N15/08

CPC分类号： G01N15/082 ,  G01N15/0806 ,  G01N2015/0846

摘要： A measuring method includes: placing resist 20 on a surface of a test film; pressing a template 30 against the resist 20 placed on the surface of the test film; measuring a size of a void formed in the resist 20 after pressing the template 30 against the resist 20; and determining gas permeability of the test film based on the size of the void.

公开(公告)号：US11592741B2

公开(公告)日：2023-02-28

申请号：US17005266

申请日：2020-08-27

申请人： KIOXIA CORPORATION

发明人： Takeshi Higuchi ,  Hirokazu Kato ,  Kasumi Okabe

IPC分类号： G03F7/00 ,  H01L21/027 ,  G03F7/16

摘要： An imprinting method includes dispensing a first liquid on a first region of a substrate. The first liquid is a photocurable resist precursor. A second liquid is dispensed on a second region of the substrate. The second region is adjacent to and surrounding the first region. The second liquid is non-photocurable as dispensed. The first region is then irradiated with light while a patterned template is being pressed against the first liquid. The light cures the first liquid and forms a resist pattern corresponding to the patterned template. The patterned template and the substrate are then separated from each other. The second liquid is then selectively removed from the substrate while leaving the resist pattern on the substrate.