公开(公告)号：US11852985B2

公开(公告)日：2023-12-26

申请号：US17466259

申请日：2021-09-03

申请人： Kioxia Corporation

发明人： Takeshi Higuchi ,  Anupam Mitra ,  Takahiro Iwasaki

IPC分类号： G03F9/00 ,  G03F7/00 ,  G03F7/16 ,  G03F7/09 ,  G03F7/004 ,  G03F7/20 ,  G03F7/038

CPC分类号： G03F9/7042 ,  G03F7/0042 ,  G03F7/0382 ,  G03F7/094 ,  G03F7/161 ,  G03F7/162 ,  G03F7/2018 ,  G03F7/70208

摘要： An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.