公开(公告)号：US20210072640A1

公开(公告)日：2021-03-11

申请号：US17005266

申请日：2020-08-27

申请人： KIOXIA CORPORATION

发明人： Takeshi HIGUCHI ,  Hirokazu Kato ,  Kasumi Okabe

IPC分类号： G03F7/00 ,  G03F7/16 ,  H01L21/027

摘要： An imprinting method includes dispensing a first liquid on a first region of a substrate. The first liquid is a photocurable resist precursor. A second liquid is dispensed on a second region of the substrate. The second region is adjacent to and surrounding the first region. The second liquid is non-photocurable as dispensed. The first region is then irradiated with light while a patterned template is being pressed against the first liquid. The light cures the first liquid and forms a resist pattern corresponding to the patterned template. The patterned template and the substrate are then separated from each other. The second liquid is then selectively removed from the substrate while leaving the resist pattern on the substrate.

公开(公告)号：US11835854B2

公开(公告)日：2023-12-05

申请号：US16793797

申请日：2020-02-18

申请人： KIOXIA CORPORATION

发明人： Kasumi Okabe ,  Hirokazu Kato ,  Kei Kobayashi ,  Daizo Muto

IPC分类号： G03F7/00 ,  H01L21/027

CPC分类号： G03F7/0002 ,  H01L21/0271

摘要： An imprint device includes a load port for receiving a substrate to be processed, a sensor that acquires information from the substrate about a film on the substrate, and a primer forming unit configured to receive the substrate from the load port. A controller is configured to select primer process conditions corresponding to the film information. The primer forming unit receives primer process conditions from the controller and forms a primer layer on the substrate over the film. The primer layer is formed according to the selected process conditions. An imprinting unit of the imprint device is configured to receive the substrate from the primer forming unit and perform imprint lithography on the substrate.

公开(公告)号：US12072273B2

公开(公告)日：2024-08-27

申请号：US17841819

申请日：2022-06-16

申请人： Kioxia Corporation

发明人： Kasumi Okabe ,  Takeshi Higuchi

IPC分类号： G01N15/08

CPC分类号： G01N15/082 ,  G01N15/0806 ,  G01N2015/0846

摘要： A measuring method includes: placing resist 20 on a surface of a test film; pressing a template 30 against the resist 20 placed on the surface of the test film; measuring a size of a void formed in the resist 20 after pressing the template 30 against the resist 20; and determining gas permeability of the test film based on the size of the void.

公开(公告)号：US11592741B2

公开(公告)日：2023-02-28

申请号：US17005266

申请日：2020-08-27

申请人： KIOXIA CORPORATION

发明人： Takeshi Higuchi ,  Hirokazu Kato ,  Kasumi Okabe

IPC分类号： G03F7/00 ,  H01L21/027 ,  G03F7/16

摘要： An imprinting method includes dispensing a first liquid on a first region of a substrate. The first liquid is a photocurable resist precursor. A second liquid is dispensed on a second region of the substrate. The second region is adjacent to and surrounding the first region. The second liquid is non-photocurable as dispensed. The first region is then irradiated with light while a patterned template is being pressed against the first liquid. The light cures the first liquid and forms a resist pattern corresponding to the patterned template. The patterned template and the substrate are then separated from each other. The second liquid is then selectively removed from the substrate while leaving the resist pattern on the substrate.