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公开(公告)号:US12159843B2
公开(公告)日:2024-12-03
申请号:US17472474
申请日:2021-09-10
Applicant: Kioxia Corporation
Inventor: Daisuke Kawamura
IPC: H01L23/00 , H01L23/48 , H01L23/528 , H10B41/10 , H10B41/27 , H10B41/40 , H10B43/10 , H10B43/27 , H10B43/40
Abstract: A semiconductor device according to an embodiment includes a lower layer wiring and a dummy wiring arranged in a first hierarchy, a contact arranged in a second hierarchy above the first hierarchy and connected to the lower layer wiring, and first and second plate-like portions arranged in the second hierarchy, extending in a stacking direction of each layer belonging to the second hierarchy and in a first direction intersecting with the stacking direction, and sandwiching the contact in a second direction intersecting with the stacking direction and the first direction at a position away from the contact, and the dummy wiring has at least three edges arranged at respective positions overlapping with one of the first and second plate-like portions in the stacking direction, and an orientation in which at least one of the three edges intersects with the first or second plate-like portion differs as viewed from the stacking direction from orientations in which the other edges intersect with the first or second plate-like portion.
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公开(公告)号:US11665898B2
公开(公告)日:2023-05-30
申请号:US17204487
申请日:2021-03-17
Applicant: Kioxia Corporation
Inventor: Daisuke Kawamura , Go Oike
IPC: H01L27/11578 , H01L27/11519 , H01L27/11526 , H01L27/11565 , H01L27/11573 , H01L27/11551
CPC classification number: H01L27/11578 , H01L27/11519 , H01L27/11526 , H01L27/11551 , H01L27/11565 , H01L27/11573
Abstract: A semiconductor device of an embodiment includes first and second structures arranged in a first hierarchy, in which the first and second structures are repeatedly arranged in a first direction along a plane of the first hierarchy, and a distance between geometric centers of the first and second structures in a minimum unit of repetition of the first and second structures differs between a first position and a second position in the first direction.
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