MULTILAYER THERMAL BARRIER COATINGS
    3.
    发明申请
    MULTILAYER THERMAL BARRIER COATINGS 有权
    多层热障涂层

    公开(公告)号:US20100136349A1

    公开(公告)日:2010-06-03

    申请号:US12624894

    申请日:2009-11-24

    Applicant: Kang N. Lee

    Inventor: Kang N. Lee

    Abstract: A multilayer thermal barrier coating (TBC) may include a plurality of layers selected to provide properties to the multilayer TBC. For example, a multilayer TBC may include a first layer deposited over a substrate, a second layer deposited over the first layer and a third layer deposited over the second layer. The first layer may be selected to provide thermal cycling resistance, the second layer may be selected to provide low thermal conductivity and the third layer may be selected to provide at least one of erosion resistance and CMAS degradation resistance. The multilayer TBC may also include two layers, or more than three layers.

    Abstract translation: 多层热障涂层(TBC)可以包括多个选择层以提供多层TBC的性质的层。 例如,多层TBC可以包括沉积在衬底上的第一层,沉积在第一层上的第二层和沉积在第二层上的第三层。 可以选择第一层以提供热循环电阻,可以选择第二层以提供低热导率,并且可以选择第三层以提供耐腐蚀性和抗CMAS抗性的至少一种。 多层TBC还可以包括两层或三层以上。

    STATIC CHEMICAL VAPOR DEPOSITION OF y-Ni + y'-Ni3AI COATINGS
    7.
    发明申请
    STATIC CHEMICAL VAPOR DEPOSITION OF y-Ni + y'-Ni3AI COATINGS 审中-公开
    y-Ni + y'-Ni3AI涂料的静态化学气相沉积

    公开(公告)号:US20100159136A1

    公开(公告)日:2010-06-24

    申请号:US12641060

    申请日:2009-12-17

    CPC classification number: C23C10/14 C23C10/16

    Abstract: A static chemical vapor deposition (CVD) process may be used to deposit a coating including a γ-Ni+γ′-Ni3Al phase constitution over a substrate. A static CVD process is performed in a closed system that may include the substrate, and coating material and an activator. The γ-Ni+γ′-Ni3Al coating may be modified by one or more additional elements, including, for example, Hf, Y, Zr, Ce, La, Si, Cr, Pt, or additional elements present in the substrate. A static CVD process may include co-deposition of two or more elements, and may also include sequential static CVD steps, each of which is performed in a closed system.

    Abstract translation: 可以使用静电化学气相沉积(CVD)工艺在衬底上沉积包括γ-Ni +γ'-Ni3Al相构成的涂层。 在封闭系统中进行静电CVD工艺,其可以包括基底,涂层材料和活化剂。 γ-Ni +γ'-Ni3Al涂层可以被一种或多种附加元素改性,包括例如Hf,Y,Zr,Ce,La,Si,Cr,Pt或存在于底物中的附加元素。 静态CVD工艺可以包括两个或更多个元件的共沉积,并且还可以包括顺序静电CVD步骤,每个步骤在闭合系统中执行。

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