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公开(公告)号：US09466100B2
公开(公告)日：2016-10-11
申请号：US13908623
申请日：2013-06-03
Applicant: KLA-Tencor Corporation
Inventor： DongSub Choi , Bill Pierson , David Tien , James Manka , Dongsuk Park
CPC classification number: G06T7/0004 , G03F1/00 , G03F7/70641 , G06T7/0002 , G06T2207/30148 , G06T2207/30168
Abstract: A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
Abstract translation: 用于监测掩模焦点的方法包括测量目标特征中的轮廓不对称性，包括子分辨率辅助特征，并且基于对应掩模的轮廓和焦点之间的已知相关性导出聚焦响应。 光刻工艺中的计算机系统可以基于这样的导出信息来调整掩模焦点以符合所需的制造工艺。
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公开(公告)号：US09291920B2
公开(公告)日：2016-03-22
申请号：US14015155
申请日：2013-08-30
Applicant: KLA-Tencor Corporation
Inventor： James Manka , David Tien , Christian Sparka
CPC classification number: G03F9/7026 , G03F7/70641 , G03F9/7019
Abstract: The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. An optical signal including at least a first variable and a second variable is detected by an optical analysis system from at least one test sample for a plurality of programmed focus error values. A first variable value showing sensitivity to focus is selected based upon a corresponding responsiveness of the second variable to change of focus and/or a corresponding linearity of raw focus with respect to the programmed focus error. At least one focus value for the lithographic scanner is determined based upon at least one determined raw focus value corresponding to the selected first variable value.
Abstract translation: 本公开涉及一种确定光刻扫描仪的一个或多个焦点值的方法。 包括至少第一变量和第二变量的光学信号由光学分析系统从至少一个测试样本检测用于多个编程的聚焦误差值。 基于第二变量对焦点的相应响应性和/或相对于编程的聚焦误差的原始焦点的对应线性度，选择显示对焦点的灵敏度的第一变量值。 基于与所选择的第一可变值对应的至少一个确定的原始焦点值来确定光刻扫描器的至少一个焦点值。
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公开(公告)号：US20140063478A1
公开(公告)日：2014-03-06
申请号：US14015155
申请日：2013-08-30
Applicant: KLA-Tencor Corporation
Inventor： James Manka , David Tien , Christian Sparka
IPC: G03F7/20
CPC classification number: G03F9/7026 , G03F7/70641 , G03F9/7019
Abstract: The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. According to an embodiment, an optical signal including at least a first variable and a second variable is detected by a optical analysis system from at least one test sample for a plurality of programmed focus error values. A first variable value showing sensitivity to focus is selected based upon a corresponding responsiveness of the second variable to change of focus and/or a corresponding linearity of raw focus with respect to the programmed focus error. At least one focus value for the lithographic scanner is determined based upon at least one determined raw focus value corresponding to the selected first variable value.
Abstract translation: 本公开涉及一种确定光刻扫描仪的一个或多个焦点值的方法。 根据实施例，包括至少第一变量和第二变量的光学信号由用于多个编程的聚焦误差值的至少一个测试样本由光学分析系统检测。 基于第二变量对焦点的相应响应性和/或相对于编程的聚焦误差的原始焦点的对应线性度，选择显示对焦点的灵敏度的第一变量值。 基于与所选择的第一可变值对应的至少一个确定的原始焦点值来确定光刻扫描器的至少一个焦点值。
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公开(公告)号：US20130336572A1
公开(公告)日：2013-12-19
申请号：US13908623
申请日：2013-06-03
Applicant: KLA-Tencor Corporation
Inventor： DongSub Choi , Bill Pierson , David Tien , James Manka , Dongsuk Park
CPC classification number: G06T7/0004 , G03F1/00 , G03F7/70641 , G06T7/0002 , G06T2207/30148 , G06T2207/30168
Abstract: A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
Abstract translation: 用于监测掩模焦点的方法包括测量目标特征中的轮廓不对称性，包括子分辨率辅助特征，并且基于对应掩模的轮廓和焦点之间的已知相关性导出聚焦响应。 光刻工艺中的计算机系统可以基于这样的导出信息来调整掩模焦点以符合所需的制造工艺。
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