公开(公告)号：US20170287754A1

公开(公告)日：2017-10-05

申请号：US15451038

申请日：2017-03-06

Applicant: KLA-Tencor Corporation

Inventor： Jeremy Nabeth ,  Onur N. Demirer ,  Ramkumar Karur-Shanmugam ,  Choon George Hoong Hoo ,  Christian Sparka ,  Hoyoung Heo ,  Stuart Sherwin ,  Fatima Anis ,  Mark D. Smith ,  William Pierson

IPC: H01L21/67 ,  G06F17/50 ,  G01B11/27

CPC classification number: H01L21/67259 ,  G01B11/002 ,  G01B11/272 ,  G01B2210/56 ,  G03F7/70633 ,  G03F9/7046 ,  G06F17/5009

Abstract: A semiconductor tool includes an illumination source to generate an illumination beam, one or more illumination optical elements to direct a portion of the illumination beam to a sample, a detector, one or more collection optical elements to direct radiation emanating from the sample to the detector, and a controller communicatively coupled to the detector. The controller is configured to measure alignment at a plurality of locations across the sample to generate alignment data, select an analysis area for alignment zone determination, divide the analysis area into two or more alignment zones having different alignment signatures; model the alignment data of at least a first alignment zone of the two or more alignment zones using a first alignment model, and model the alignment data of at least a second alignment zone of the two or more alignment zones using a second alignment model different than the first alignment model.

公开(公告)号：US09291920B2

公开(公告)日：2016-03-22

申请号：US14015155

申请日：2013-08-30

Applicant: KLA-Tencor Corporation

Inventor： James Manka ,  David Tien ,  Christian Sparka

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F9/7026 ,  G03F7/70641 ,  G03F9/7019

Abstract: The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. An optical signal including at least a first variable and a second variable is detected by an optical analysis system from at least one test sample for a plurality of programmed focus error values. A first variable value showing sensitivity to focus is selected based upon a corresponding responsiveness of the second variable to change of focus and/or a corresponding linearity of raw focus with respect to the programmed focus error. At least one focus value for the lithographic scanner is determined based upon at least one determined raw focus value corresponding to the selected first variable value.

Abstract translation: 本公开涉及一种确定光刻扫描仪的一个或多个焦点值的方法。 包括至少第一变量和第二变量的光学信号由光学分析系统从至少一个测试样本检测用于多个编程的聚焦误差值。 基于第二变量对焦点的相应响应性和/或相对于编程的聚焦误差的原始焦点的对应线性度，选择显示对焦点的灵敏度的第一变量值。 基于与所选择的第一可变值对应的至少一个确定的原始焦点值来确定光刻扫描器的至少一个焦点值。

公开(公告)号：US10340165B2

公开(公告)日：2019-07-02

申请号：US15451038

申请日：2017-03-06

Applicant: KLA-Tencor Corporation

Inventor： Jeremy Nabeth ,  Onur N. Demirer ,  Ramkumar Karur-Shanmugam ,  Choon (George) Hoong Hoo ,  Christian Sparka ,  Hoyoung Heo ,  Stuart Sherwin ,  Fatima Anis ,  Mark D. Smith ,  William Pierson

IPC: G01C1/06 ,  H01L21/67 ,  G01B11/27 ,  G06F17/50 ,  G01B11/00 ,  G03F7/20 ,  G03F9/00

Abstract: A semiconductor tool includes an illumination source to generate an illumination beam, one or more illumination optical elements to direct a portion of the illumination beam to a sample, a detector, one or more collection optical elements to direct radiation emanating from the sample to the detector, and a controller communicatively coupled to the detector. The controller is configured to measure alignment at a plurality of locations across the sample to generate alignment data, select an analysis area for alignment zone determination, divide the analysis area into two or more alignment zones having different alignment signatures; model the alignment data of at least a first alignment zone of the two or more alignment zones using a first alignment model, and model the alignment data of at least a second alignment zone of the two or more alignment zones using a second alignment model different than the first alignment model.

公开(公告)号：US20140063478A1

公开(公告)日：2014-03-06

申请号：US14015155

申请日：2013-08-30

Applicant: KLA-Tencor Corporation

Inventor： James Manka ,  David Tien ,  Christian Sparka

IPC: G03F7/20

CPC classification number: G03F9/7026 ,  G03F7/70641 ,  G03F9/7019

Abstract: The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. According to an embodiment, an optical signal including at least a first variable and a second variable is detected by a optical analysis system from at least one test sample for a plurality of programmed focus error values. A first variable value showing sensitivity to focus is selected based upon a corresponding responsiveness of the second variable to change of focus and/or a corresponding linearity of raw focus with respect to the programmed focus error. At least one focus value for the lithographic scanner is determined based upon at least one determined raw focus value corresponding to the selected first variable value.

Abstract translation: 本公开涉及一种确定光刻扫描仪的一个或多个焦点值的方法。 根据实施例，包括至少第一变量和第二变量的光学信号由用于多个编程的聚焦误差值的至少一个测试样本由光学分析系统检测。 基于第二变量对焦点的相应响应性和/或相对于编程的聚焦误差的原始焦点的对应线性度，选择显示对焦点的灵敏度的第一变量值。 基于与所选择的第一可变值对应的至少一个确定的原始焦点值来确定光刻扫描器的至少一个焦点值。