公开(公告)号：US11237120B2

公开(公告)日：2022-02-01

申请号：US16934123

申请日：2020-07-21

Applicant: KLA-Tencor Corporation

Inventor： Vincent Immer ,  Tal Marciano ,  Etay Lavert

IPC: G01N21/45 ,  G01N21/95 ,  G01N21/956 ,  G01N21/55 ,  G03F7/20 ,  G01N21/31 ,  G02B21/00 ,  G02B21/08 ,  G01B11/06 ,  G01J3/453 ,  G02B21/06 ,  G02B21/18 ,  G02B21/36 ,  H01L21/67 ,  H01L21/66

Abstract: A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.

公开(公告)号：US10761034B2

公开(公告)日：2020-09-01

申请号：US15568958

申请日：2017-08-23

Applicant: KLA-Tencor Corporation

Inventor： Vincent Immer ,  Tal Marciano ,  Etay Lavert

IPC: G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  G01N21/31 ,  G02B21/00 ,  G02B21/08 ,  G01J3/453 ,  G02B21/06 ,  G02B21/18 ,  G02B21/36 ,  H01L21/67 ,  H01L21/66

Abstract: A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.

公开(公告)号：US20180372652A1

公开(公告)日：2018-12-27

申请号：US15568958

申请日：2017-08-23

Applicant: KLA-Tencor Corporation

Inventor： Vincent Immer ,  Tal Marciano ,  Etay Lavert

IPC: G01N21/95 ,  G02B21/00 ,  G02B21/06 ,  G02B21/18 ,  H01L21/67 ,  H01L21/66 ,  G02B21/36 ,  G01J3/453 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01J3/453 ,  G01N21/31 ,  G01N21/55 ,  G01N21/956 ,  G02B21/0016 ,  G02B21/0056 ,  G02B21/06 ,  G02B21/082 ,  G02B21/18 ,  G02B21/365 ,  G03F7/70633 ,  H01L21/67259 ,  H01L22/12

Abstract: A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.