公开(公告)号：US20210098223A1

公开(公告)日：2021-04-01

申请号：US17029501

申请日：2020-09-23

Applicant: KLA CORPORATION

Inventor： Sergei Belousov ,  Andrey Knizhnik ,  Inna M. Iskandarova ,  Boris Potapkin ,  Katerina Ioakeimidi ,  Gildardo R. Delgado ,  Frances Hill ,  Gary V. Lopez Lopez ,  Miguel Gonzalez

IPC: H01J1/34 ,  G02B5/00

Abstract: A photocathode emitter includes a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure array is configured to operate at a wavelength from 193 nm to 430 nm. The plasmonic structure array can be made of aluminum. An electron beam can be generated from a light beam directed at the plasmonic structure array of the photocathode emitter.

公开(公告)号：US20220316045A1

公开(公告)日：2022-10-06

申请号：US17696636

申请日：2022-03-16

Applicant: KLA Corporation

Inventor： Guorong Vera Zhuang ,  Gildardo Delgado ,  Evgeniia Butaeva ,  John Savee ,  Gary V. Lopez Lopez

IPC: C23C14/22 ,  H01J37/32 ,  H01J37/34 ,  C23C14/46 ,  C23C14/02 ,  C23C14/58

Abstract: A method for ion-assisted deposition of optical coatings. The method may include performing one or more pre-deposition processes. The method may include performing evaporation using an evaporation assembly of an ion-assisted deposition system during ion-assisted deposition using a low energy ion beam source of the ion-assisted deposition system. The method may further include performing sputtering using a sputtering assembly of an ion-assisted deposition system. The evaporation assembly may include an evaporating target and an evaporator configured to directly evaporate target material from the evaporating target onto a surface of the one or more samples. The sputtering assembly may include a sputtering target and a sputtering high energy ion source configured to sputter target material from the sputtering target onto a surface of the one or more samples. The method may include performing one or more post-deposition treatment processes.

公开(公告)号：US11217416B2

公开(公告)日：2022-01-04

申请号：US17029501

申请日：2020-09-23

Applicant: KLA CORPORATION

Inventor： Sergei Belousov ,  Andrey Knizhnik ,  Inna M. Iskandarova ,  Boris Potapkin ,  Katerina Ioakeimidi ,  Gildardo R. Delgado ,  Frances Hill ,  Gary V. Lopez Lopez ,  Miguel Gonzalez

IPC: H01J1/34 ,  G02B5/00

Abstract: A photocathode emitter includes a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure array is configured to operate at a wavelength from 193 nm to 430 nm. The plasmonic structure array can be made of aluminum. An electron beam can be generated from a light beam directed at the plasmonic structure array of the photocathode emitter.

公开(公告)号：US11715622B2

公开(公告)日：2023-08-01

申请号：US17393932

申请日：2021-08-04

Applicant: KLA CORPORATION

Inventor： Gildardo Delgado ,  Vera (Guorong) Zhuang ,  John Savee ,  Evgeniia Butaeva ,  Gary V. Lopez Lopez ,  Grace Chen

IPC: H01J37/305 ,  H01J37/20 ,  H01J37/08

CPC classification number: H01J37/3053 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/3151 ,  H01J2237/3174

Abstract: A material recovery system for an optical component includes a reservoir containing gas and configured to supply a gas flow containing the gas. The material recovery system also includes an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam. The ion beam is configured to be directed to the optical component to remove at least a portion of a F-containing optical material degraded by exposure to VUV radiation, DUV radiation, and/or photo-contamination.

公开(公告)号：US20220066071A1

公开(公告)日：2022-03-03

申请号：US17393968

申请日：2021-08-04

Applicant: KLA CORPORATION

Inventor： Evgeniia Butaeva ,  Gildardo Delgado ,  Grace Chen ,  John Savee ,  Matthew Derstine ,  Vera (Guorong) Zhuang ,  Gary V. Lopez Lopez

IPC: G02B1/14 ,  C01F5/28

Abstract: An optical system includes a bulk material including a fluorine (F)-containing optical material. The bulk material is exposed to an environment at a pressure ranging from atmospheric to vacuum when the bulk material is under extreme ultra-violet (EUV), vacuum ultra-violet (VUV), deep ultra-violet (DUV) and/or UV radiation. The environment includes at least one type of gas or vapor. The at least one type of gas or vapor includes polar molecules.

公开(公告)号：US11495428B2

公开(公告)日：2022-11-08

申请号：US16789650

申请日：2020-02-13

Applicant: KLA CORPORATION

Inventor： Katerina Ioakeimidi ,  Gildardo R. Delgado ,  Frances Hill ,  Gary V. Lopez Lopez ,  Miguel A. Gonzalez ,  Alan D. Brodie

IPC: H01J1/34 ,  H01J37/317 ,  G02B5/00

Abstract: A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure can serve as a spot-confining structure and an electrical underlayer for biasing the photocathode. The plasmonic structure can confine the incident light at subwavelength sizes.

公开(公告)号：US20200266019A1

公开(公告)日：2020-08-20

申请号：US16789650

申请日：2020-02-13

Applicant: KLA CORPORATION

Inventor： Katerina Ioakeimidi ,  Gildardo R. Delgado ,  Frances Hill ,  Gary V. Lopez Lopez ,  Miguel A. Gonzalez ,  Alan D. Brodie

IPC: H01J1/34 ,  H01J37/317 ,  G02B5/00

Abstract: A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure can serve as a spot-confining structure and an electrical underlayer for biasing the photocathode. The plasmonic structure can confine the incident light at subwavelength sizes.