公开(公告)号：US11715622B2

公开(公告)日：2023-08-01

申请号：US17393932

申请日：2021-08-04

Applicant: KLA CORPORATION

Inventor： Gildardo Delgado ,  Vera (Guorong) Zhuang ,  John Savee ,  Evgeniia Butaeva ,  Gary V. Lopez Lopez ,  Grace Chen

IPC: H01J37/305 ,  H01J37/20 ,  H01J37/08

CPC classification number: H01J37/3053 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/3151 ,  H01J2237/3174

Abstract: A material recovery system for an optical component includes a reservoir containing gas and configured to supply a gas flow containing the gas. The material recovery system also includes an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam. The ion beam is configured to be directed to the optical component to remove at least a portion of a F-containing optical material degraded by exposure to VUV radiation, DUV radiation, and/or photo-contamination.

公开(公告)号：US20220066071A1

公开(公告)日：2022-03-03

申请号：US17393968

申请日：2021-08-04

Applicant: KLA CORPORATION

Inventor： Evgeniia Butaeva ,  Gildardo Delgado ,  Grace Chen ,  John Savee ,  Matthew Derstine ,  Vera (Guorong) Zhuang ,  Gary V. Lopez Lopez

IPC: G02B1/14 ,  C01F5/28

Abstract: An optical system includes a bulk material including a fluorine (F)-containing optical material. The bulk material is exposed to an environment at a pressure ranging from atmospheric to vacuum when the bulk material is under extreme ultra-violet (EUV), vacuum ultra-violet (VUV), deep ultra-violet (DUV) and/or UV radiation. The environment includes at least one type of gas or vapor. The at least one type of gas or vapor includes polar molecules.