知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

14 条记录 (耗时 0.017 秒)

    Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
    1.
    发明授权
    Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus 失效
    电容高度计应用于电子束光刻设备的标线位置检测系统

    公开(公告)号：US4686531A

    公开(公告)日：1987-08-11

    申请号：US717426

    申请日：1985-03-29

    申请人： John R. Shambroom ,  Alan P. Sliski

    发明人： John R. Shambroom ,  Alan P. Sliski

    IPC分类号： G01B7/14 ,  G03F9/00 ,  G08C19/10 ,  H01J37/304

    CPC分类号： G03F9/7053 ,  G01B7/082 ,  G01B7/14 ,  H01J37/304

    摘要： A capacitance height gage for positioning the reticle of an electron beam lithography apparatus. The gage includes a hybrid circuit substrate carrying four measuring and two reference capacitor circuits. Each has a driven plate, the four measuring plates disposed opposite the object surface to be measured, and the two reference plates disposed on the top of the substrate. Two ground plates are disposed a predetermine distance from the reference driven plates. The object surface comprises the ground plate for the four measuring driven plates. The reference plates calibrate the measuring plates.

    摘要翻译： 一种用于定位电子束光刻设备的掩模版的电容高度计。 量具包括一个承载四个测量和两个参考电容电路的混合电路基板。 每个具有从动板，四个测量板与待测对象表面相对设置，并且两个参考板设置在基板的顶部。 两个接地板与基准从动板预定距离。 物体表面包括用于四个测量驱动板的接地板。 参考板校准测量板。

    Calibration apparatus for capacitance height gauges
    2.
    发明授权
    Calibration apparatus for capacitance height gauges 失效
    电容高度计校准装置

    公开(公告)号：US4539835A

    公开(公告)日：1985-09-10

    申请号：US589902

    申请日：1984-03-14

    申请人： John R. Shambroom ,  Alan P. Sliski

    发明人： John R. Shambroom ,  Alan P. Sliski

    IPC分类号： G01B3/00 ,  G01B7/06 ,  G01B7/14 ,  G01B11/14 ,  G01B21/16 ,  G03F9/00 ,  G03F9/02 ,  H01J37/304

    CPC分类号： G03F9/7053 ,  G01B7/082 ,  G01B7/14 ,  H01J37/304

    摘要： In an electron beam lithography apparatus a capacitance height gauge is used to determine the distance between a reticule and electron optics. In order to calibrate the capacitance gauge an optical interferometer, including a mirror are mounted on the same axis as the capacitance gauge. The mirror is moved a predetermined distance so that the movement distance measured by the capacitance gauge and the interferometer can be compared.

    摘要翻译： 在电子束光刻设备中，使用电容高度计来确定网格和电子光学器件之间的距离。 为了校准电容量规，包括反射镜的光学干涉仪安装在与电容量规相同的轴上。 反射镜移动预定距离，使得可以比较由电容量计和干涉仪测量的移动距离。

    Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
    3.
    发明授权
    Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus 失效
    电容高度计应用于电子束光刻设备的标线位置检测系统

    公开(公告)号：US4538069A

    公开(公告)日：1985-08-27

    申请号：US546760

    申请日：1983-10-28

    申请人： John R. Shambroom ,  Alan P. Sliski

    发明人： John R. Shambroom ,  Alan P. Sliski

    IPC分类号： G01B7/02 ,  G01B7/14 ,  G03F9/00 ,  H01J37/304

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G01B7/082 ,  G01B7/14 ,  G03F9/7053 ,  H01J37/304

    摘要： A method of calibrating a capacitance height gage for an electron beam lithography machine. The electron beam apparatus having the capacitance height gage to be calibrated is first mounted in a calibration fixture wherein the distance between the gage and a calibration reticle is adjusted using a laser interferometer. The electron beam is directed to a center high backscatter point, and then deflected to a predetermined high backscatter point. The capacitance gage readings and deflection voltages are measured to define a calibration plane. The electron beam apparatus is then repositioned to the lithography station having a reticle positioned below the electron beam. The distance to the reticle is measured with the capacitance gage, and the deflection of the electron beam during lithography operations is adjusted according to the variation of the reticle plane from the calibration plane.

    摘要翻译： 一种校准电子束光刻机的电容高度计的方法。 具有要校准的电容高度计的电子束装置首先安装在校准夹具中，其中使用激光干涉仪调节量具和校准掩模版之间的距离。 电子束被引导到中心高后向散射点，然后偏转到预定的高反向散射点。 测量电容量规读数和偏转电压以定义校准平面。 然后将电子束装置重新定位到具有位于电子束下方的掩模版的光刻站。 使用电容量测量到掩模版的距离，并且根据光罩平面与校准平面的变化来调节光刻操作期间的电子束的偏转。

    Electrode array system for measuring electrophysiological signals
    5.
    发明授权
    Electrode array system for measuring electrophysiological signals 有权
    用于测量电生理信号的电极阵列系统

    公开(公告)号：US06394953B1

    公开(公告)日：2002-05-28

    申请号：US09513760

    申请日：2000-02-25

    申请人： Philip H. Devlin ,  Rafael M. Cordero ,  Nassib G. Chamoun ,  John R. Shambroom ,  Charles Fendrock ,  Terrie L. McDaniel

    发明人： Philip H. Devlin ,  Rafael M. Cordero ,  Nassib G. Chamoun ,  John R. Shambroom ,  Charles Fendrock ,  Terrie L. McDaniel

    IPC分类号： A61B504

    CPC分类号： A61B5/04085 ,  A61B5/0478 ,  A61B5/4821 ,  A61B2560/045 ,  A61B2562/227

    摘要： An array of electrodes is constructed to allow the user to easily adjust to the correct size of the patient's head. The array is self-adhesive, pre-gelled and disposable. The array fits easily over the temple and forehead areas where EEG signals can be acquired by specially designed monitors for purposes of monitoring a number of bodily phenomena, including but not limited to, depth of anesthesia, and/or ischemia, and burst suppression. The array is connected to the monitor via a tab connector that is integral to the disposable device. The tab connector is insertible into a reusable connector that is part of a monitoring system.

    摘要翻译： 电极阵列被构造成允许使用者容易地适应患者头部的正确尺寸。 阵列是自粘的，预胶凝的和一次性的。 该阵列容易地适合于通过专门设计的监视器用于监视许多身体现象（包括但不限于麻醉深度和/或局部缺血）和突发抑制的脑电图信号可以获得的神经元和前额区域。 阵列通过与一次性设备成一体的接头连接器连接到监视器。 标签连接器可插入作为监控系统一部分的可重复使用的连接器。

    Monitor and method for acquiring and processing electrical signals relating to bodily functions
    7.
    发明授权
    Monitor and method for acquiring and processing electrical signals relating to bodily functions 失效
    用于获取和处理与身体功能相关的电气信号的监视器和方法

    公开(公告)号：US5368041A

    公开(公告)日：1994-11-29

    申请号：US961525

    申请日：1992-10-15

    申请人： John R. Shambroom

    发明人： John R. Shambroom

    IPC分类号： A61B5/00 ,  A61B5/0476 ,  G06F17/00 ,  G06F19/00 ,  A61B5/04

    CPC分类号： A61B5/6843 ,  A61B5/0006 ,  A61B5/0476 ,  G06F19/3406 ,  A61B5/7217 ,  Y10S128/901 ,  Y10S128/902

    摘要： A monitor which receives electrical signals from a human body includes a portable data acquisition module and a substantially stationary processing module. The EEG signals are acquired and converted to an oversampled stream of digital signals by a sigma-delta modulator located in the data acquisition module. The signals are then filtered by a decimation filter located in the processing module. Additional means are also provided to monitor the electrode leads to detect when the leads become unplugged. The monitor provides all power to the data acquisition module over a single twisted line which transmits data as well.

    摘要翻译： 从人体接收电信号的监视器包括便携式数据采集模块和基本固定的处理模块。 通过位于数据采集模块中的Σ-Δ调制器获取EEG信号并将其转换为过采样的数字信号流。 然后通过位于处理模块中的抽取滤波器对信号进行滤波。 还提供附加装置来监测电极引线以检测引线何时拔出。 显示器通过单个传输数据的双绞线向数据采集模块提供所有电源。