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    Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns
    5.
    发明授权
    Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns 失效
    含有机金属的降冰片烯单体，含有其聚合物的光致抗蚀剂，其制造方法和形成光致抗蚀剂图案的方法

    公开(公告)号：US06607867B1

    公开(公告)日：2003-08-19

    申请号：US09790632

    申请日：2001-02-23

    申请人： Jin-Baek Kim ,  Jae-Jun Lee ,  Jae-Sung Kang

    发明人： Jin-Baek Kim ,  Jae-Jun Lee ,  Jae-Sung Kang

    IPC分类号： G03F7004

    CPC分类号： G03F7/0395 ,  C07F7/081 ,  G03F7/0045 ,  G03F7/0758 ,  Y10S430/106

    摘要： The present invention relates to norbornene monomers with a novel functional group containing an organometal as shown in the following Formula (I) or (II), a photoresist containing its polymers, manufacturing method thereof, and a method of forming photoresist patterns. Unlike existing polymers for photoresist matrix, polymers made by norbornene monomers described in the present invention is a chemical amplification type induced by photosensitive acids and can result in difference in silicon content between the exposed area and unexposed area due to dissociation of side chain containing silicon. The difference in the silicon content results in different etch rate with respect to oxygen plasma which makes dry developing possible.

    摘要翻译： 本发明涉及具有如下式（I）或（II）所示的含有有机金属的新型官能团的降冰片烯单体，含有其聚合物的光致抗蚀剂，其制造方法和形成光致抗蚀剂图案的方法。不存在聚合物 对于光致抗蚀剂基质，由本发明中描述的降冰片烯单体制成的聚合物是由光敏酸诱导的化学放大型，并且由于含有侧链的解离导致曝光区域与未曝光区域之间的硅含量差异。 硅含量的差异导致相对于氧等离子体的不同蚀刻速率，这使得干式显影成为可能。

    Methods of forming a pattern using negative-type photoresist compositions
    6.
    发明申请
    Methods of forming a pattern using negative-type photoresist compositions 有权
    使用负型光致抗蚀剂组合物形成图案的方法

    公开(公告)号：US20100248134A1

    公开(公告)日：2010-09-30

    申请号：US12662076

    申请日：2010-03-30

    申请人： Kyoung-Mi Kim ,  Jin-Baek Kim ,  Ji-Young Park ,  Young-Ho Kim

    发明人： Kyoung-Mi Kim ,  Jin-Baek Kim ,  Ji-Young Park ,  Young-Ho Kim

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0758 ,  G03F7/0382 ,  G03F7/094 ,  H01L21/0271 ,  H01L21/3081 ,  H01L21/31144 ,  H01L27/10817 ,  H01L27/10852 ,  H01L27/10873 ,  H01L27/11546

    摘要： A method of forming a pattern and a negative-type photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymer, a photoacid generator, and a solvent, wherein the polymer includes an alkoxysilyl group as a side chain and is cross-linkable by an acid to be insoluble in a developer; curing a first portion of the photoresist film by exposing the first portion to light, the exposed first portion being cured by a cross-linking reaction of the alkoxysilyl groups therein; and providing a developer to the photoresist film to remove a second portion of the photoresist film that is not exposed to light, thereby forming a photoresist pattern on the substrate.

    摘要翻译： 一种形成图案和负型光致抗蚀剂组合物的方法，所述方法包括通过在其上涂覆光致抗蚀剂组合物在基底上形成光致抗蚀剂膜，所述光致抗蚀剂组合物包括聚合物，光致酸产生剂和溶剂，其中所述聚合物包括 作为侧链的烷氧基甲硅烷基，可以被不可溶于显影剂的酸交联; 通过将第一部分暴露于光来固化光致抗蚀剂膜的第一部分，暴露的第一部分通过其中的烷氧基甲硅烷基的交联反应固化; 以及向所述光致抗蚀剂膜提供显影剂以去除未曝光的所述光致抗蚀剂膜的第二部分，由此在所述基板上形成光致抗蚀剂图案。

    Illumination device and reflection type liquid crystal display device using the same
    7.
    发明授权
    Illumination device and reflection type liquid crystal display device using the same 有权
    照明装置和使用其的反射型液晶显示装置

    公开(公告)号：US07018085B2

    公开(公告)日：2006-03-28

    申请号：US10838036

    申请日：2004-05-03

    申请人： Keun-Woo Lee ,  Jin-Baek Kim

    发明人： Keun-Woo Lee ,  Jin-Baek Kim

    IPC分类号： F21V7/04

    CPC分类号： G02B6/0046 ,  G02B6/0028 ,  G02B6/0038 ,  G02B6/0041 ,  G02B6/0068 ,  G02F1/133603

    摘要： Disclosed are an illumination device capable of improving an optical efficiency of a light generated from a light source and a reflection type liquid crystal device using the, illumination device. Between at least one light source and a first light guiding plate, which is provided to uniformly project the light incident from a first side towards a second side, a second light guiding plate for projecting the incident light towards the first side of the first light guiding plate is provided. A distance between a light projecting portion of the second light guiding plate and a light reflecting portion opposite the light projecting portion becomes narrow as an amount of light flux of the light emitted from at least one light source decreases. Accordingly, the light efficiency can be improved by increasing the probability of variation in optical routes for the light generated from each light source, though the number of the light sources disposed at a side of the second light guiding plate is increased.

    摘要翻译： 公开了一种能够提高由光源产生的光的光学效率的照明装置和使用该照明装置的反射型液晶装置。 在至少一个光源和第一导光板之间设置有用于将从第一侧入射的光均匀地投射到第二侧的第一导光板，用于将入射光朝向第一导光体的第一侧突出的第二导光板 提供板。 随着从至少一个光源发射的光的光通量减少，第二导光板的光投射部分和与光投射部分相对的光反射部分之间的距离变窄。 因此，虽然设置在第二导光板一侧的光源的数量增加，但是通过增加从每个光源产生的光的光路径的变化的可能性，可以提高光效率。

    Light guiding plate, liquid crystal display device using the same, and method for displaying pictures thereof
    8.
    发明授权
    Light guiding plate, liquid crystal display device using the same, and method for displaying pictures thereof 有权
    导光板，使用其的液晶显示装置及其图像的显示方法

    公开(公告)号：US07312839B2

    公开(公告)日：2007-12-25

    申请号：US10763758

    申请日：2004-01-22

    申请人： Ik-Soo Lee ,  Jin-Baek Kim

    发明人： Ik-Soo Lee ,  Jin-Baek Kim

    IPC分类号： G02F1/1335

    CPC分类号： G02B6/0038 ,  G02B6/0031 ,  G02B6/005 ,  G02B6/0051 ,  G02B6/0071 ,  G02F1/133615 ,  G02F2001/133616

    摘要： A light guiding plate includes a light incident portion into which light is incident from a light source, a light reflecting pattern to reflect the light provided from the light incident portion, and a light transmitting surface to transmit the light reflected by the light reflecting pattern to a display panel. The light reflecting pattern includes light reflecting sections each of which has a first light reflecting plane that is inclined with respect to the light transmitting surface to face toward the light source, and a second light reflecting plane that is inclined with respect to the light transmitting surface and connected with an edge of the first light reflecting plane so that the light reflection sections each form a prism shape. The light reflecting sections respectively having the second light reflecting planes that are configured to have different areal sizes to control reflectivity of the respective light reflecting sections.

    摘要翻译： 导光板包括光入射部分，光从光源入射到其中，光反射图案反射从光入射部分提供的光;以及透光表面，用于将由光反射图案反射的光透射到 显示面板。 光反射图案包括光反射部分，每个光反射部分具有相对于透光表面倾斜以朝向光源的第一光反射面，以及相对于透光表面倾斜的第二光反射面 并且与第一光反射面的边缘连接，使得光反射部分各自形成棱镜形状。 分别具有被配置为具有不同面积尺寸的第二光反射面的光反射部分以控制各个光反射部分的反射率。

    Methods of forming a pattern using negative-type photoresist compositions
    9.
    发明授权
    Methods of forming a pattern using negative-type photoresist compositions 有权
    使用负型光致抗蚀剂组合物形成图案的方法

    公开(公告)号：US08377626B2

    公开(公告)日：2013-02-19

    申请号：US12662076

    申请日：2010-03-30

    申请人： Kyoung-Mi Kim ,  Jin-Baek Kim ,  Ji-Young Park ,  Young-Ho Kim

    发明人： Kyoung-Mi Kim ,  Jin-Baek Kim ,  Ji-Young Park ,  Young-Ho Kim

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/40

    CPC分类号： G03F7/0758 ,  G03F7/0382 ,  G03F7/094 ,  H01L21/0271 ,  H01L21/3081 ,  H01L21/31144 ,  H01L27/10817 ,  H01L27/10852 ,  H01L27/10873 ,  H01L27/11546

    摘要： A method of forming a pattern and a negative-type photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymer, a photoacid generator, and a solvent, wherein the polymer includes an alkoxysilyl group as a side chain and is cross-linkable by an acid to be insoluble in a developer; curing a first portion of the photoresist film by exposing the first portion to light, the exposed first portion being cured by a cross-linking reaction of the alkoxysilyl groups therein; and providing a developer to the photoresist film to remove a second portion of the photoresist film that is not exposed to light, thereby forming a photoresist pattern on the substrate.

    摘要翻译： 一种形成图案和负型光致抗蚀剂组合物的方法，所述方法包括通过在其上涂覆光致抗蚀剂组合物在基底上形成光致抗蚀剂膜，光致抗蚀剂组合物包括聚合物，光致酸产生剂和溶剂，其中聚合物包括 作为侧链的烷氧基甲硅烷基，可以被不可溶于显影剂的酸交联; 通过将第一部分暴露于光来固化光致抗蚀剂膜的第一部分，暴露的第一部分通过其中的烷氧基甲硅烷基的交联反应固化; 以及向所述光致抗蚀剂膜提供显影剂以去除未曝光的所述光致抗蚀剂膜的第二部分，由此在所述基板上形成光致抗蚀剂图案。

    Light guide plate, liquid crystal display device having the same, and method for displaying an image using the liquid crystal display device
    10.
    发明授权
    Light guide plate, liquid crystal display device having the same, and method for displaying an image using the liquid crystal display device 失效
    导光板，具有该导光板的液晶显示装置，以及使用该液晶显示装置显示图像的方法

    公开(公告)号：US07280172B2

    公开(公告)日：2007-10-09

    申请号：US10209249

    申请日：2002-07-31

    申请人： Ik-Soo Lee ,  Jin-Baek Kim

    发明人： Ik-Soo Lee ,  Jin-Baek Kim

    IPC分类号： G02F1/1335 ,  F21V7/04

    CPC分类号： G02B6/0031 ,  G02B6/0036 ,  G02B6/0038 ,  G02B6/0055 ,  G02B6/0071 ,  G02F1/133615 ,  G02F2001/133616 ,  Y10S385/901

    摘要： Disclosed are a light guide plate, a front illumination type liquid crystal display device using the same, and a method for displaying an image therein. A light reflection pattern is formed on a light reflection surface of the light guide plate so as to change an optical distribution and prevent the moiré phenomenon. The light reflection pattern prevents the light from being leaked through a side of the light guide plate, so an effective display area is not divided into a bright area, a boundary area, and a dark area. It is possible to change the optical distribution and to prevent the moiré phenomenon, so the liquid crystal display device can display an image with an improved brightness uniformity.

    摘要翻译： 公开了导光板，使用该导光板的前照明型液晶显示装置及其中显示图像的方法。 在导光板的光反射面上形成光反射图案，以改变光分布并防止波纹现象。 光反射图案防止光从导光板的一侧泄漏，因此有效显示区域不分为明亮区域，边界区域和暗区域。 可以改变光学分布并防止波纹现象，因此液晶显示装置可以显示具有改善的亮度均匀性的图像。