Invention Grant
US07670748B2 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
有权
环化合物，光致抗蚀剂组合物和使用其形成光刻胶图案的方法
- Patent Title: Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
- Patent Title (中): 环化合物，光致抗蚀剂组合物和使用其形成光刻胶图案的方法
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Application No.: US11638590Application Date: 2006-12-14
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Publication No.: US07670748B2Publication Date: 2010-03-02
- Inventor: Kyoung-Mi Kim , Young-Ho Kim , Jin-Baek Kim , Tae-Hwan Oh
- Applicant: Kyoung-Mi Kim , Young-Ho Kim , Jin-Baek Kim , Tae-Hwan Oh
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2005-0123628 20051215
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
A photoresist composition includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound includes any one selected from the group consisting of moieties having chemical structures represented by the formulae (1), (2), (3) and (4) set forth herein, and at least one moiety having the chemical structure represented by the formula (9) set forth herein.
Public/Granted literature
- US20070141511A1 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same Public/Granted day:2007-06-21
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