摘要:
The present invention provides a method and a device for controlling contents of a user terminal having a touch screen, a recording medium therefor, and a user terminal having the same. The present invention relates to a method for controlling the contents of a user terminal having a touch screen, wherein, when a touch is detected on the touch screen while executing contents conversion, a part of the contents gets fixed on the basis of the detected location of the touch. Therefore, two or more contents can be easily compared using the fixed contents region as reference contents.
摘要:
The present invention provides a method and a device for controlling contents of a user terminal having a touch screen, a recording medium therefor, and a user terminal having the same. The present invention relates to a method for controlling the contents of a user terminal having a touch screen, wherein, when a touch is detected on the touch screen while executing contents conversion, a part of the contents gets fixed on the basis of the detected location of the touch. Therefore, two or more contents can be easily compared using the fixed contents region as reference contents.
摘要:
An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.
摘要:
Disclosed is a resist composition which has desirable physical properties such as sensitivity, resolution, residual film ratio and coating property, and forms a pattern having the desirable profile and depth of focus due to excellent light transmissivity during a semiconductor process and a flat panel display process using a short wavelength of 248 nm (KrF) or less, even though the resist composition is applied to a non-chemically amplified resist. The photoresist composition comprises a novolac-based resin A, a photosensitizer B, and a low molecular substance C having low absorbance. The low molecular substance having low absorbance has absorbance that is lower than absorbance of the novolac-based resin at one or more wavelengths of 248 nm, 193 nm, and 157 nm, and the photoresist composition is used at the wavelength of 248 nm or less.
摘要:
The present invention relates to a discharge sustaining electrode formed of a transparent electrode and a non-transparent electrode for a plasma display panel (PDP), and it is an object of the present invention to provide a method for an electrode which is well applicable to forming a non-transparent electrode using an Ag material and providing a good productivity and a certain contrast characteristic. The method for forming a bus electrode according to the present invention includes a first step for coating Ag paste including some black powder having different specific gravity particles and some Ag white powder on the transparent electrode, a second step for level-separating the black and white powders contained in the coated Ag paste based on a specific gravity difference for a certain time, and a third step for burning out a binder from the coated Ag paste to thereby implementing a firing process. Therefore, it is possible to implement a two-tier bus electrode structure based on one time paste printing operation to thereby decrease a formation process of an electrode.
摘要:
An ink composition, and a method of forming a pattern, a color filter and a method of manufacturing the color filter using the same. The ink composition includes a binder resin, a multifunctional monomer having an ethylenic unsaturated double bond, a coloring agent, a polymerization initiator containing a certain positive ion and a solvent. Therefore, the composition has excellent coating property and chemical resistance and also an improved adhesion to a printing member, and thus the ink composition may be useful in forming a precise micropattern using a roll printing method, particularly a reversed printing method.
摘要:
Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
摘要:
In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: wherein R1, R2 and R3 are independently H, C1-4 alkyl, C2-4 alkenyl, C3-8 cycloalkyl, or C6-12 aryl.
摘要:
Disclosed is a resist composition which has desirable physical properties such as sensitivity, resolution, residual film ratio and coating property, and forms a pattern having the desirable profile and depth of focus due to excellent light transmissivity during a semiconductor process and a flat panel display process using a short wavelength of 248 nm (KrF) or less, even though the resist composition is applied to a non-chemically amplified resist. The photoresist composition comprises a novolac-based resin A, a photosensitizer B, and a low molecular substance C having low absorbance. The low molecular substance having low absorbance has absorbance that is lower than absorbance of the novolac-based resin at one or more wavelengths of 248 nm, 193 nm, and 157 nm, and the photoresist composition is used at the wavelength of 248 nm or less.
摘要:
A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.