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    BLOCK COPOLYMER
    2.
    发明申请
    BLOCK COPOLYMER 审中-公开

    公开(公告)号：US20170204216A1

    公开(公告)日：2017-07-20

    申请号：US15479705

    申请日：2017-04-05

    申请人： JSR CORPORATION

    发明人： Yuji NAMIE ,  Shinya Minegishi ,  Tomoki Nagai ,  Takuo Sone

    IPC分类号： C08F297/02 ,  H01L21/027 ,  G03F7/20

    CPC分类号： C08F297/026 ,  B81C1/00031 ,  B81C2201/0149 ,  C08L53/005 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/70 ,  H01L21/0273 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/32139

    摘要： A block copolymer includes a polystyrene block including a styrene unit, and a polyalkyl (meth)acrylate block including an alkyl (meth)acrylate unit. The block copolymer includes an organic group that is bound to at least one end of a main chain of the block copolymer and that comprises a hetero atom. A polymerization initiation end of the block copolymer includes a structure derived from an alkyl lithium. The organic group included in the block copolymer includes a nitrogen atom, a sulfur atom, a phosphorus atom, a tin atom, or a combination thereof, or is represented by formula (1). R1 represents a single bond or a divalent organic group having 1 to 30 carbon atoms; and R2 represents a hydrogen atom, an aliphatic linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, or the like.

    COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
    4.
    发明申请
    COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD 审中-公开
    用于形成图案的组合物和形成图案的方法

    公开(公告)号：US20150253671A1

    公开(公告)日：2015-09-10

    申请号：US14638610

    申请日：2015-03-04

    申请人： JSR CORPORATION

    发明人： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

    IPC分类号： G03F7/20 ,  G03F7/038

    CPC分类号： G03F7/038 ,  G03F7/0002 ,  G03F7/0388

    摘要： A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

    摘要翻译： 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包含其侧链中的可交联基团。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。

    COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
    5.
    发明申请
    COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD 审中-公开
    用于形成图案的组合物和形成图案的方法

    公开(公告)号：US20150253663A1

    公开(公告)日：2015-09-10

    申请号：US14638521

    申请日：2015-03-04

    申请人： JSR CORPORATION

    发明人： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

    IPC分类号： G03F7/038 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0002

    摘要： A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

    摘要翻译： 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组和酸产生剂。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包括侧链中的酸不稳定基团。 酸发生器在施加能量时产生酸。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。