公开(公告)号：US20230026970A1

公开(公告)日：2023-01-26

申请号：US17869117

申请日：2022-07-20

Applicant: JEOL Ltd.

Inventor： Keito Aibara ,  Tomohiro Nakamichi ,  Shigeyuki Morishita ,  Motofumi Saito ,  Ryusuke Sagawa ,  Fuminori Uematsu

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.

公开(公告)号：US11764029B2

公开(公告)日：2023-09-19

申请号：US17576016

申请日：2022-01-14

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita ,  Ryusuke Sagawa ,  Fuminori Uematsu ,  Tomohiro Nakamichi ,  Keito Aibara

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/26 ,  H01J2237/1534

Abstract: A method of measuring an aberration in an electron microscope includes: acquiring an image for measuring the aberration in the electron microscope; and measuring the aberration by using the image. In measuring the aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system of the electron microscope and an optical condition of the optical system.

公开(公告)号：US20220230838A1

公开(公告)日：2022-07-21

申请号：US17576016

申请日：2022-01-14

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita ,  Ryusuke Sagawa ,  Fuminori Uematsu ,  Tomohiro Nakamichi ,  Keito Aibara

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/10

Abstract: A method of measuring an aberration in an electron microscope includes: acquiring an image for measuring the aberration in the electron microscope; and measuring the aberration by using the image. In measuring the aberration, a direction of defocusing is specified based on a residual aberration that is uniquely determined by a configuration of an optical system of the electron microscope and an optical condition of the optical system.

公开(公告)号：US12255041B2

公开(公告)日：2025-03-18

申请号：US17869117

申请日：2022-07-20

Applicant: JEOL Ltd.

Inventor： Keito Aibara ,  Tomohiro Nakamichi ,  Shigeyuki Morishita ,  Motofumi Saito ,  Ryusuke Sagawa ,  Fuminori Uematsu

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.

公开(公告)号：US11842880B2

公开(公告)日：2023-12-12

申请号：US17671896

申请日：2022-02-15

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa ,  Shigeyuki Morishita ,  Fuminori Uematsu ,  Tomohiro Nakamichi ,  Keito Aibara

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/2487 ,  H01J2237/2802

Abstract: An aberration value estimator has a learned estimation model for estimating an aberration value set based on a Ronchigram. In a machine learning sub-system, a simulation is repeatedly executed while changing a simulation condition, and calculated Ronchigrams are generated in a wide variety and in a large number. By machine learning using the calculated Ronchigrams, the learned estimation model is generated.

公开(公告)号：US20220262595A1

公开(公告)日：2022-08-18

申请号：US17671896

申请日：2022-02-15

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa ,  Shigeyuki Morishita ,  Fuminori Uematsu ,  Tomohiro Nakamichi ,  Keito Aibara

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/26

Abstract: An aberration value estimator has a learned estimation model for estimating an aberration value set based on a Ronchigram. In a machine learning sub-system, a simulation is repeatedly executed while changing a simulation condition, and calculated Ronchigrams are generated in a wide variety and in a large number. By machine learning using the calculated Ronchigrams, the learned estimation model is generated.