On chip electrostatic discharge (ESD) event monitoring

    公开(公告)号:US09673116B2

    公开(公告)日:2017-06-06

    申请号:US13733954

    申请日:2013-01-04

    CPC classification number: H01L22/34 G01R31/002 G01R31/2884

    Abstract: An approach for monitoring electrostatic discharge (ESD) event of an integrated circuit. The approach includes a canary device for exhibiting an impedance shift when affected by an ESD pulse, wherein circuit drain of the canary device is connected to an input terminal of the circuit structure. The approach further includes circuit source and logic gates of the canary device, connected to a circuit drain of ESD transistor of the circuit structure, wherein circuit source of the ESD transistor is connected to an output terminal of the circuit structure. The approach further includes a logic gate of the ESD transistor, connected to an enable signal of the circuit structure, and wherein the enable signal is connected to the output terminal through a capacitor of the circuit structure. In addition, the enable signal is also connected to the input terminal through a resistor of the circuit structure.

    Lateral non-volatile storage cell

    公开(公告)号:US10109639B1

    公开(公告)日:2018-10-23

    申请号:US15618695

    申请日:2017-06-09

    Abstract: A method fabricates a lateral non-volatile storage cell. The lateral non-volatile storage cell includes a first transistor including a first transistor body formed on a dielectric layer. The first transistor includes a source region and drain region on opposite sides of the first transistor body. A second transistor is laterally adjacent to the first transistor and includes a second transistor body, parallel with the first transistor body, formed on the dielectric layer. A first layer of gate oxide of a first thickness is formed over the first transistor body, and a second layer of gate oxide of a second thickness is formed over a portion of the second transistor body. The first thickness and the second thickness are different. A floating gate is formed over the first layer of gate oxide, the second layer of gate oxide, and the dielectric layer.

    LATERAL NON-VOLATILE STORAGE CELL
    8.
    发明申请

    公开(公告)号:US20180358366A1

    公开(公告)日:2018-12-13

    申请号:US15807666

    申请日:2017-11-09

    CPC classification number: H01L27/1156 H01L27/11558 H01L27/1211 H01L29/42324

    Abstract: A method fabricates a lateral non-volatile storage cell. The lateral non-volatile storage cell includes a first transistor including a first transistor body formed on a dielectric layer. The first transistor includes a source region and drain region on opposite sides of the first transistor body. A second transistor is laterally adjacent to the first transistor and includes a second transistor body, parallel with the first transistor body, formed on the dielectric layer. A first layer of gate oxide of a first thickness is formed over the first transistor body, and a second layer of gate oxide of a second thickness is formed over a portion of the second transistor body. The first thickness and the second thickness are different. A floating gate is formed over the first layer of gate oxide, the second layer of gate oxide, and the dielectric layer.

    Lateral non-volatile storage cell

    公开(公告)号:US10153291B1

    公开(公告)日:2018-12-11

    申请号:US15807666

    申请日:2017-11-09

    CPC classification number: H01L27/1156 H01L27/11558 H01L27/1211 H01L29/42324

    Abstract: A method fabricates a lateral non-volatile storage cell. The lateral non-volatile storage cell includes a first transistor including a first transistor body formed on a dielectric layer. The first transistor includes a source region and drain region on opposite sides of the first transistor body. A second transistor is laterally adjacent to the first transistor and includes a second transistor body, parallel with the first transistor body, formed on the dielectric layer. A first layer of gate oxide of a first thickness is formed over the first transistor body, and a second layer of gate oxide of a second thickness is formed over a portion of the second transistor body. The first thickness and the second thickness are different. A floating gate is formed over the first layer of gate oxide, the second layer of gate oxide, and the dielectric layer.

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