Abstract:
A reaction device for chemical vapor deposition is disclosed. The reaction device includes a chamber, a susceptor, an inlet pipe unit and an outlet pipe. The susceptor is disposed within the chamber. The inlet pipe unit includes a plurality of feeding openings horizontally facing the peripheral area of the susceptor to input at least one reaction gas into the chamber. The at least one reaction gas is guided to move from the peripheral area of the susceptor and along a surface of the susceptor to reach the center of the susceptor. The outlet pipe includes a discharge opening whose position is corresponding to the center of the susceptor so as to discharge the reaction gas flowing to the center of the susceptor out of the chamber.
Abstract:
A micro-channel reaction apparatus includes a first mixing device and a first jetting device. The first mixing device includes a first inflow channel and a second inflow channel respectively used to direct a first fluid and a second fluid into the micro-channel reaction apparatus. The first jetting device includes a first tapering portion and a first flared portion, wherein one end of the first tapering portion is connected to the first inflow channel and the second inflow channel; another end of the first tapering portion is connected to the first flared portion; and the first tapering portion has a contract ratio of inner diameter ranging from 0.1 to 0.75.