Reaction device with peripheral-in and center-out design for chemical vapor deposition
    1.
    发明授权
    Reaction device with peripheral-in and center-out design for chemical vapor deposition 有权
    具有用于化学气相沉积的外围和中心设计的反应装置

    公开(公告)号:US09340875B2

    公开(公告)日:2016-05-17

    申请号:US14096390

    申请日:2013-12-04

    Abstract: A reaction device for chemical vapor deposition is disclosed. The reaction device includes a chamber, a susceptor, an inlet pipe unit and an outlet pipe. The susceptor is disposed within the chamber. The inlet pipe unit includes a plurality of feeding openings horizontally facing the peripheral area of the susceptor to input at least one reaction gas into the chamber. The at least one reaction gas is guided to move from the peripheral area of the susceptor and along a surface of the susceptor to reach the center of the susceptor. The outlet pipe includes a discharge opening whose position is corresponding to the center of the susceptor so as to discharge the reaction gas flowing to the center of the susceptor out of the chamber.

    Abstract translation: 公开了用于化学气相沉积的反应装置。 反应装置包括室,基座,入口管单元和出口管。 基座设置在室内。 入口管单元包括水平地面对基座的周边区域的多个供给开口,以将至少一个反应气体输入到室中。 引导至少一个反应气体从基座的周边区域和基座的表面移动以到达基座的中心。 出口管包括排出口,该排出口的位置对应于基座的中心,以便将流过基座中心的反应气体排出室外。

    Micro-channel reaction apparatus
    2.
    发明授权

    公开(公告)号:US10537869B1

    公开(公告)日:2020-01-21

    申请号:US16235728

    申请日:2018-12-28

    Abstract: A micro-channel reaction apparatus includes a first mixing device and a first jetting device. The first mixing device includes a first inflow channel and a second inflow channel respectively used to direct a first fluid and a second fluid into the micro-channel reaction apparatus. The first jetting device includes a first tapering portion and a first flared portion, wherein one end of the first tapering portion is connected to the first inflow channel and the second inflow channel; another end of the first tapering portion is connected to the first flared portion; and the first tapering portion has a contract ratio of inner diameter ranging from 0.1 to 0.75.

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