公开(公告)号：US20230112203A1

公开(公告)日：2023-04-13

申请号：US17934175

申请日：2022-09-21

Applicant: ILLUMINA, INC. ,  ILLUMINA SINGAPORE PTE. LTD.

Inventor： Boyan Boyanov ,  Craig Ciesla ,  Anthony Flannery ,  Gerald Kreindl ,  Rean Silke Musa ,  Darren Segale

IPC: G01N33/487 ,  C12Q1/6869 ,  G01N27/414 ,  B01L3/00

Abstract: Devices for sequencing biopolymers and methods of using the devices are disclosed. In one example, such a device has a nanopore, a plurality of wells and fluidic tunnels to allow a biopolymer to translocate in the device. In some embodiments, the device may include integrated electronics or micro-electromechanical systems, such as valves, bubble generators/annihilators or pressure pulse generators, to actively control fluidic/ionic/electric flows in the device.

公开(公告)号：US20230398503A1

公开(公告)日：2023-12-14

申请号：US18332593

申请日：2023-06-09

Applicant: ILLUMINA SINGAPORE PTE. LTD. ,  ILLUMINA, INC.

Inventor： Rajesh Kumar Sharma ,  Gerald Kreindl ,  Anthony Flannery

IPC: B01D69/12 ,  B01D71/02 ,  B01D67/00 ,  B01D61/42

CPC classification number: B01D69/12 ,  B01D71/022 ,  B01D67/0074 ,  B01D61/42 ,  B01D2325/0283 ,  B01D2325/04

Abstract: A nanopore sensing system includes a cis well, a trans well, and a metal based membrane positioned between the cis and trans wells so that a channel defined in the metal based membrane fluidically connects the cis and trans wells. The metal based membrane has a thickness ranging from about 1 nm to about 3 nm and is selected from the group consisting of a metal oxide, a metal sulfide, a metal nitride, a metal phosphide, a metal arsenide, a metal antimonide, a metal selenide, and a metal telluride.

公开(公告)号：US20240123448A1

公开(公告)日：2024-04-18

申请号：US18477468

申请日：2023-09-28

Applicant: ILLUMINA, INC.

Inventor： Jeffrey S. Fisher ,  Anthony Flannery ,  Sahngki Hong ,  Brinda Kodira Cariappa ,  Lewis J. Kraft

IPC: B01L3/00

CPC classification number: B01L3/502761 ,  B01L3/502707 ,  B01L2200/0647 ,  B01L2200/12

Abstract: An example of a flow cell includes a substrate and a reaction area defined in or over the substrate. The reaction area includes two angularly offset and non-perpendicular surfaces relative to a planar surface of the substrate, a polymeric hydrogel positioned over at least a portion of each of the two angularly offset and non-perpendicular surfaces; a first primer set attached to the polymeric hydrogel that is positioned over the portion of a first of the two angularly offset and non-perpendicular surfaces; and a second primer set attached to the polymeric hydrogel that is positioned over the portion of a second of the two angularly offset and non-perpendicular surfaces, wherein the first and second primer sets are orthogonal.

公开(公告)号：US20240293816A1

公开(公告)日：2024-09-05

申请号：US18574214

申请日：2022-06-30

Applicant: ILLUMINA, INC.

Inventor： Rean Silke Musa ,  Anthony Flannery ,  Boyan Boyanov ,  Nigel COBURN ,  Sharis MINASSIAN

IPC: B01L3/00 ,  C12Q1/6869

CPC classification number: B01L3/502761 ,  C12Q1/6869 ,  B01L2300/0645 ,  B01L2300/0829 ,  B01L2300/0893 ,  B01L2400/0427 ,  B01L2400/046

Abstract: Devices for sequencing biopolymers, methods of manufacturing the devices, and methods of using the devices are disclosed. In one example, such a device has a nanopore and a horizontal nanochannel. In some embodiments, the horizontal nanochannel may take a tortuous path. In some embodiments, such a device includes gas or air bubble generators or pressure pulse generators to block or unblock the horizontal nanochannel.

公开(公告)号：US20230137978A1

公开(公告)日：2023-05-04

申请号：US17739976

申请日：2022-05-09

Applicant: ILLUMINA, INC.

Inventor： Jeffrey S. Fisher ,  Anthony Flannery ,  Sahngki Hong ,  Brinda Kodira Cariappa ,  Lewis J. Kraft ,  Brian D. Mather

IPC: B01L3/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/00

Abstract: A metal film is formed over a resin layer including a plurality of multi-depth depressions (MDP) separated by interstitial regions, each MDP including a deep portion and an adjacent shallow portion. A sacrificial layer is formed over the metal film. The sacrificial layer and metal film are sequentially dry etched to expose a resin layer surface at the shallow portion and interstitial regions. Resin layer portions are removed i) at the shallow portion to form a depression region having a surface directly adjacent to a surface at the deep portion and ii) at the interstitial regions to form new interstitial regions surrounding the deep portion and the depression region. First functionalized layer is deposited over the metal film, depression region, and new interstitial regions. The metal film is removed from the deep portion. Second functionalized layer is deposited over the surface at the deep portion. New interstitial regions are polished.

公开(公告)号：US20230139821A1

公开(公告)日：2023-05-04

申请号：US17739964

申请日：2022-05-09

Applicant: ILLUMINA, INC.

Inventor： Jeffrey S. Fisher ,  Anthony Flannery ,  Sahngki Hong ,  Brinda Kodira Cariappa ,  Lewis J. Kraft

IPC: B01L3/00 ,  G03F7/039 ,  G03F7/038 ,  G03F7/00

Abstract: In an example method, a first functionalized layer is deposited over a resin layer including multi-depth depressions separated by interstitial regions, each depression including a deep portion and a shallow portion adjacent to the deep portion; a photoresist is deposited over the first functionalized layer; an ultraviolet light dosage is directed, through the resin layer, whereby a first photoresist portion generates an insoluble photoresist and a second photoresist portion becomes a soluble photoresist; the soluble photoresist is removed to expose a portion of the first functionalized layer; the portion of the first functionalized layer is removed to expose a portion of the resin layer; a second functionalized layer is deposited over the insoluble photoresist, and over the exposed portion of the resin layer; the insoluble photoresist is removed to expose the first functionalized layer; and the first functionalized layer or the second functionalized layer is removed from the interstitial regions.