NANOPORE SYSTEMS AND METHODS OF FABRICATION
    1.
    发明公开

    公开(公告)号:US20240319165A1

    公开(公告)日:2024-09-26

    申请号:US18575254

    申请日:2022-11-09

    Applicant: ILLUMINA, INC.

    CPC classification number: G01N33/48721

    Abstract: Systems for sequencing biopolymers and methods of manufacturing the systems are disclosed. In one example, such a system may include an application specific integrated circuit (ASIC) layer, a post array layer beneath the AISC layer, and a nanopore layer above the ASIC layer. The ASIC layer is formed by building active circuitry on a front side of a semiconductor wafer and polishing a back side of the semiconductor wafer. The post array layer is formed by etching a front side of a support substrate and the post array layer provides mechanical support to the ASIC layer. The nanopore layer contains membrane and nanopores. The membrane inhibits passage of water-soluble molecules and the nanopores permit passage of water-soluble molecules. In some embodiments, the system may have short through-substrate vias extending through the ASIC layer. In some embodiments, wafer bonding processes may be used when fabricating the system.

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