公开(公告)号：US3790404A

公开(公告)日：1974-02-05

申请号：US3790404D

申请日：1972-06-19

Applicant: IBM

Inventor： GARNACHE R ,  GHATALIA A ,  MICHAUD R

IPC: C23F4/00 ,  B01J15/00 ,  C23C16/44 ,  C23C16/54 ,  C30B25/02 ,  C30B25/14 ,  C30B31/10 ,  C30B31/16 ,  H01L21/205 ,  H01L21/22 ,  H01L21/302 ,  H01L21/31 ,  C23C11/08

CPC classification number: C30B31/106 ,  C23C16/54 ,  C30B31/16 ,  Y10S438/935

Abstract: Apparatus for effecting uniform and continuous mass transport reactions, such as oxidation, diffusion, etching, etc., between a gaseous phase reactant and semiconductor substrates. The apparatus comprises a longitudinal process tube, which includes a reaction zone flanked on either side by a combination entranceexhaust section and an exit-exhaust section. Reactant gas is provided to the reaction zone at a fixed flow rate and allowed to escape from the reaction zone axially through the two exhaust zones. Accurate isolation of the reaction zone is accomplished by passing additional gases into the entrance and exit zones at a rate sufficient to cause some gas to flow into the reaction zone where it is carried away through the exhaust zones by the axially flowing reacting gas.

Abstract translation: 用于在气相反应物和半导体衬底之间进行均匀且连续的质量传递反应（例如氧化，扩散，蚀刻等）的装置。 该装置包括纵向处理管，其包括在两侧的组合进入排气段和出口排气段两侧的反应区。 以固定的流速将反应物气体提供给反应区，并允许轴向通过两个排气区从反应区逸出。 通过将额外的气体以足以使一些气体流入反应区域的速率将额外的气体通入入口和出口区域，其中通过轴向流动的反应气体将其输送通过排气区域来实现反应区域的精确隔离。